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1.发明授权公开(公告)号：US09086521B2
公开(公告)日：2015-07-21
申请号：US14007472
申请日：2012-03-29
CPC分类号： G02B5/0221 , F21V3/049 , F21V5/002 , G02B5/0278 , G02B5/0294
摘要： Light transmissive structures include a light transmissive substrate that includes optical microstructures. The optical microstructures have a geometric feature that is configured to reduce glare in light transmitted through the light transmissive structure. Moreover, the plurality of optical microstructures also have a geometric feature that is configured to vary randomly and/or pseudorandomly across the light transmissive substrate so as to diffuse light transmitted through the light transmissive structure. Related fabrication methods are also described.
摘要翻译： 透光结构包括包含光学微结构的透光基底。 光学微结构具有几何特征，其被配置为减少透射通过透光结构的光的眩光。 此外，多个光学微结构还具有被配置为跨透光基板随机和/或伪随机变化以便扩散透过透光结构的光的几何特征。 还描述了相关的制造方法。
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2.发明申请公开(公告)号：US20140022783A1
公开(公告)日：2014-01-23
申请号：US14007472
申请日：2012-03-29
CPC分类号： G02B5/0221 , F21V3/049 , F21V5/002 , G02B5/0278 , G02B5/0294
摘要： Light transmissive structures include a light transmissive substrate that includes optical microstructures. The optical microstructures have a geometric feature that is configured to reduce glare in light transmitted through the light transmissive structure. Moreover, the plurality of optical microstructures also have a geometric feature that is configured to vary randomly and/or pseudorandomly across the light transmissive substrate so as to diffuse light transmitted through the light transmissive structure. Related fabrication methods are also described.
摘要翻译： 透光结构包括包含光学微结构的透光基底。 光学微结构具有几何特征，其被配置为减少透射通过透光结构的光的眩光。 此外，多个光学微结构还具有被配置为跨透光基板随机和/或伪随机变化以便扩散透过透光结构的光的几何特征。 还描述了相关的制造方法。
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公开(公告)号：US20100039808A1
公开(公告)日：2010-02-18
申请号：US12506915
申请日：2009-07-21
CPC分类号： G09F13/0409 , G02B3/0043 , G02B3/005 , G02B5/0263 , G02F1/133604 , G02F2001/133607
摘要： A diffuser is configured to diffuse radiation from multiple light sources. The diffuser includes a substrate having optical structures that exhibit both microvariations and macrovariations along the substrate. For example, an array of microlenses may be provided that include at least one feature that varies as a function of the spacing between the light sources. Lighting systems using these diffusers may also be provided.
摘要翻译： 扩散器被配置成扩散来自多个光源的辐射。 漫射器包括具有光学结构的衬底，其具有沿衬底的微变化和宏观变化。 例如，可以提供包括随着光源之间的间隔而变化的至少一个特征的微透镜阵列。 也可以提供使用这些扩散器的照明系统。
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公开(公告)号：US08974069B2
公开(公告)日：2015-03-10
申请号：US12506915
申请日：2009-07-21
IPC分类号： G09F13/04 , G02B3/00 , G02B5/02 , G02F1/1335
CPC分类号： G09F13/0409 , G02B3/0043 , G02B3/005 , G02B5/0263 , G02F1/133604 , G02F2001/133607
摘要： A diffuser is configured to diffuse radiation from multiple light sources. The diffuser includes a substrate having optical structures that exhibit both microvariations and macrovariations along the substrate. For example, an array of microlenses may be provided that include at least one feature that varies as a function of the spacing between the light sources. Lighting systems using these diffusers may also be provided.
摘要翻译： 扩散器被配置成扩散来自多个光源的辐射。 漫射器包括具有光学结构的衬底，其具有沿衬底的微变化和宏观变化。 例如，可以提供包括随着光源之间的间隔而变化的至少一个特征的微透镜阵列。 也可以提供使用这些扩散器的照明系统。
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5.发明授权Methods for fabricating optical microstructures by imaging a radiation sensitive layer sandwiched between outer layers 有权通过成像夹在外层之间的辐射敏感层来制造光学微结构的方法公开(公告)号：US07425407B1
公开(公告)日：2008-09-16
申请号：US11465358
申请日：2006-08-17
CPC分类号： G03F7/0015 , G02B3/0025 , G02B3/0031 , G02B5/1852 , G02B5/1857 , G03F7/0005 , G03F7/161 , Y10S430/146
摘要： Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.
摘要翻译： 通过在成像平台上成像包括夹在一对外层之间的辐射敏感层的微结构母板来形成微结构，以限定辐射敏感层中的微结构。 然后去除至少一个外层。 开发了在辐射敏感层中定义的微结构。 夹在一对外层之间的辐射敏感层可以制成网，以提供微结构母板坯。
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6.发明申请METHODS FOR FABRICATING OPTICAL MICROSTRUCTURES BY IMAGING A RADIATION SENSITIVE LAYER SANDWICHED BETWEEN OUTER LAYERS 有权通过成像在外层之间形成辐射敏感层的方法来制造光学微结构公开(公告)号：US20080233519A1
公开(公告)日：2008-09-25
申请号：US11465358
申请日：2006-08-17
CPC分类号： G03F7/0015 , G02B3/0025 , G02B3/0031 , G02B5/1852 , G02B5/1857 , G03F7/0005 , G03F7/161 , Y10S430/146
摘要： Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.
摘要翻译： 通过在成像平台上成像包括夹在一对外层之间的辐射敏感层的微结构母板来形成微结构，以限定辐射敏感层中的微结构。 然后去除至少一个外层。 开发了在辐射敏感层中定义的微结构。 夹在一对外层之间的辐射敏感层可以制成网，以提供微结构母板坯。
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7.发明授权Methods for mastering microstructures through a substrate using negative photoresist 有权通过使用负性光致抗蚀剂的底物来掌握微结构的方法公开(公告)号：US07867695B2
公开(公告)日：2011-01-11
申请号：US10661917
申请日：2003-09-11
IPC分类号： G02B27/72
CPC分类号： G02B3/0025 , B82Y10/00 , B82Y40/00 , G02B5/1857 , G03F7/0002 , G03F7/0005 , G03F7/0007 , G03F7/0015 , G03F7/2053 , G03F7/24
摘要： Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
摘要翻译： 通过将诸如激光束的辐射束通过对激光束透明的衬底照射到衬底上的负光致抗蚀剂层中来制造微结构。 可以随后显影负性光致抗蚀剂层以提供用于光学和/或机械微结构的母版。 还公开了相关系统，微结构产品和微结构主体。
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8.发明授权Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers 有权通过成像夹在外层之间的辐射敏感层来制造微结构的方法公开(公告)号：US07192692B2
公开(公告)日：2007-03-20
申请号：US10661974
申请日：2003-09-11
IPC分类号： G03F7/20
CPC分类号： G03F7/0015 , G02B3/0025 , G02B3/0031 , G02B5/1852 , G02B5/1857 , G03F7/0005 , G03F7/161 , Y10S430/146
摘要： Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.
摘要翻译： 通过在成像平台上成像包括夹在一对外层之间的辐射敏感层的微结构母板来形成微结构，以限定辐射敏感层中的微结构。 然后去除至少一个外层。 开发了在辐射敏感层中定义的微结构。 夹在一对外层之间的辐射敏感层可以制成网，以提供微结构母板坯。
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9.发明授权Methods for mastering microstructures through a substrate using negative photoresist 有权通过使用负性光致抗蚀剂的底物来掌握微结构的方法公开(公告)号：US08263318B2
公开(公告)日：2012-09-11
申请号：US12958153
申请日：2010-12-01
IPC分类号： G02B27/72
CPC分类号： G02B3/0025 , B82Y10/00 , B82Y40/00 , G02B5/1857 , G03F7/0002 , G03F7/0005 , G03F7/0007 , G03F7/0015 , G03F7/2053 , G03F7/24
摘要： Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
摘要翻译： 通过将诸如激光束的辐射束通过对激光束透明的衬底照射到衬底上的负光致抗蚀剂层中来制造微结构。 可以随后显影负性光致抗蚀剂层以提供用于光学和/或机械微结构的母版。 还公开了相关系统，微结构产品和微结构主体。
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10.发明申请METHODS FOR MASTERING MICROSTRUCTURES THROUGH A SUBSTRATE USING NEGATIVE PHOTORESIST 有权通过使用负离子光栅的基板来实现微结构的方法公开(公告)号：US20110070547A1
公开(公告)日：2011-03-24
申请号：US12958153
申请日：2010-12-01
IPC分类号： G03F7/20
CPC分类号： G02B3/0025 , B82Y10/00 , B82Y40/00 , G02B5/1857 , G03F7/0002 , G03F7/0005 , G03F7/0007 , G03F7/0015 , G03F7/2053 , G03F7/24
摘要： Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
摘要翻译： 通过将诸如激光束的辐射束通过对激光束透明的衬底照射到衬底上的负光致抗蚀剂层中来制造微结构。 可以随后显影负性光致抗蚀剂层以提供用于光学和/或机械微结构的母版。 还公开了相关系统，微结构产品和微结构主体。
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