Embedded dual coil fabrication process
    2.
    发明授权
    Embedded dual coil fabrication process 失效
    嵌入式双线圈制造工艺

    公开(公告)号:US06338939B1

    公开(公告)日:2002-01-15

    申请号:US09645163

    申请日:2000-08-24

    IPC分类号: G11B517

    摘要: A read/write head is provided with an embedded planar dual coil write structure. The head includes generally parallel shield, shield/pole, and pole layers. The shield/pole layer abuts a generally coplanar planarization layer in one embodiment. A circuitous recess is defined in the shield/pole and planarization layer, spanning the junction twice and encircling a central hub of adjoining shield/pole and planarization layer material. A write structure is located in the recess, with the shield/pole layer, planarization layer, and embedded write structure forming a substantially flat surface for building the pole layer. The write structure includes first and second substantially co-planar multi-turn flat coils, where turns of the first write coil are interspersed with turns of the second write coil. The first and second write coils reside in the circuitous recess, winding around the central hub. An insulating material separates the first and second coils.

    摘要翻译: 读/写头具有嵌入式平面双线圈写结构。 头部包括大致平行的屏蔽,屏蔽/极和极层。 在一个实施例中,屏蔽/极层邻接大致共面的平坦化层。 在屏蔽/极和平坦化层中限定了一个迂回的凹槽,跨越结两次并围绕相邻的屏蔽/极和平坦化层材料的中心毂。 写入结构位于凹部中,屏蔽/极层,平坦化层和嵌入式写入结构形成用于构建极层的基本上平坦的表面。 该写入结构包括第一和第二基本上共面的多匝扁平线圈,其中第一写入线圈的匝与第二写入线圈的匝分散。 第一和第二写入线圈驻留在迂回凹部中,围绕中心毂绕过。 绝缘材料分离第一和第二线圈。

    Embedded dual coil planar structure
    3.
    发明授权
    Embedded dual coil planar structure 失效
    嵌入式双线圈平面结构

    公开(公告)号:US06191918B1

    公开(公告)日:2001-02-20

    申请号:US09178377

    申请日:1998-10-23

    IPC分类号: G11B5147

    摘要: A read/write head is provided with an embedded planar dual coil write structure. The head includes generally parallel shield, shield/pole, and pole layers. The shield/pole layer abuts a generally coplanar planarization layer in one embodiment. A circuitous recess is defined in the shield/pole and planarization layer, spanning the junction twice and encircling a central hub of adjoining shield/pole and planarization layer material. A write structure is located in the recess, with the shield/pole layer, planarization layer, and embedded write structure forming a substantially flat surface for building the pole layer. The write structure includes first and second substantially co-planar multi-turn flat coils, where turns of the first write coil are interspersed with turns of the second write coil. The first and second write coils reside in the circuitous recess, winding around the central hub. An insulating material separates the first and second coils.

    摘要翻译: 读/写头具有嵌入式平面双线圈写结构。 头部包括大致平行的屏蔽,屏蔽/极和极层。 在一个实施例中,屏蔽/极层邻接大致共面的平坦化层。 在屏蔽/极和平坦化层中限定了一个迂回的凹槽,跨越结两次并围绕相邻的屏蔽/极和平坦化层材料的中心毂。 写入结构位于凹部中,屏蔽/极层,平坦化层和嵌入式写入结构形成用于构建极层的基本上平坦的表面。 该写入结构包括第一和第二基本上共面的多匝扁平线圈,其中第一写入线圈的匝与第二写入线圈的匝分散。 第一和第二写入线圈驻留在迂回凹部中,围绕中心毂绕过。 绝缘材料分离第一和第二线圈。