公开(公告)号：US20120170015A1

公开(公告)日：2012-07-05

申请号：US13496141

申请日：2010-07-29

Applicant: Andrei Mikhailovich Yakunin ,  Maarten Van Kampen ,  Vadim Iourievich Timoshkov

Inventor： Andrei Mikhailovich Yakunin ,  Maarten Van Kampen ,  Vadim Iourievich Timoshkov

IPC: G03B27/72 ,  F21V9/06 ,  B44C1/22

CPC classification number: G03F7/70958 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70941

Abstract: A spectral purity filter includes a substrate, a plurality of apertures through the substrate, and a plurality of walls. The walls define the plurality of apertures through the substrate. The spectral purity filter also includes a first layer formed on the substrate to reflect radiation of a first wavelength, and a second layer formed on the first layer to prevent oxidation of the first layer. The apertures are constructed and arranged to be able to transmit at least a portion of radiation of a second wavelength therethrough.

Abstract translation: 光谱纯度滤光器包括基板，通过基板的多个孔，以及多个壁。 这些壁通过基底限定多个孔。 光谱纯度滤光片还包括形成在基板上以反射第一波长的辐射的第一层，以及形成在第一层上以防止第一层氧化的第二层。 孔被构造和布置成能够透过第二波长的至少一部分辐射。

公开(公告)号：US09329503B2

公开(公告)日：2016-05-03

申请号：US13698171

申请日：2011-04-06

Applicant: Vadim Iourievich Timoshkov ,  Jan Bernard Plechelmus van Schoot ,  Antonius Theodorus Wilhelmus Kempen ,  Andrei Mikhailovich Yakunin ,  Edgar Alberto Osorio Oliveros

Inventor： Vadim Iourievich Timoshkov ,  Jan Bernard Plechelmus van Schoot ,  Antonius Theodorus Wilhelmus Kempen ,  Andrei Mikhailovich Yakunin ,  Edgar Alberto Osorio Oliveros

IPC: G03B27/70 ,  G03F7/20 ,  B82Y10/00 ,  C23C14/48 ,  C23C14/58 ,  G21K1/06

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  C23C14/48 ,  C23C14/586 ,  G21K1/062

Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.

Abstract translation: 提供了包括第一材料（84）和硅层（82）的层的多层反射镜（80）。 第一材料层和硅层形成一叠层。 硅层的暴露区域包括被设置为改善暴露的硅区域的鲁棒性的修改。

公开(公告)号：US20130057840A1

公开(公告)日：2013-03-07

申请号：US13698171

申请日：2011-04-06

Applicant: Vadim Iourievich Timoshkov ,  Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmu Kempen ,  Andrei Mikhailovich Yakunin ,  Edgar Alberto Osorio Oliveros

Inventor： Vadim Iourievich Timoshkov ,  Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmu Kempen ,  Andrei Mikhailovich Yakunin ,  Edgar Alberto Osorio Oliveros

IPC: G02B1/10 ,  C23C14/14 ,  G03B27/70

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  C23C14/48 ,  C23C14/586 ,  G21K1/062

Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.

Abstract translation: 提供了包括第一材料（84）和硅层（82）的层的多层反射镜（80）。 第一材料层和硅层形成一叠层。 硅层的暴露区域包括被设置为改善暴露的硅区域的鲁棒性的修改。