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公开(公告)号：US08828297B2
公开(公告)日：2014-09-09
申请号：US13290770
申请日：2011-11-07
CPC分类号： B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
摘要： Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
摘要翻译： 描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。 该方法可以用于直接图案化衬底和/或创建压印光刻模板或模具，其可以随后用于将纳米形图案直接复制到其它衬底中，例如形成功能性或牺牲抗蚀剂以形成功能纳米颗粒。
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公开(公告)号：US20120214066A1
公开(公告)日：2012-08-23
申请号：US13398442
申请日：2012-02-16
申请人： Michael N. Miller , Fen Wan , Vikramjit Singh , Darren D. Donaldson , Gerard M. Schmid , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人： Michael N. Miller , Fen Wan , Vikramjit Singh , Darren D. Donaldson , Gerard M. Schmid , Sidlgata V. Sreenivasan , Frank Y. Xu
CPC分类号： B82Y30/00 , H01M4/134 , H01M4/1395 , H01M4/386
摘要： A silicon nanowire array including a multiplicity of silicon nanowires extending from a silicon substrate. Cross-sectional shape of the silicon nanowires and spacing between the silicon nanowires can be selected to maximize the ratio of the surface area of the silicon nanowires to the volume of the nanowire array. Methods of forming the silicon nanowire array include a nanoimprint lithography process to form a template for the silicon nanowire array and an electroless etching process to etch the template formed by the nanoimprint lithography process.
摘要翻译： 一种硅纳米线阵列，包括从硅衬底延伸的多个硅纳米线。 可以选择硅纳米线的横截面形状和硅纳米线之间的间隔，以最大化硅纳米线的表面积与纳米线阵列的体积的比率。 形成硅纳米线阵列的方法包括形成硅纳米线阵列的模板的纳米压印光刻工艺和蚀刻由纳米压印光刻工艺形成的模板的无电蚀刻工艺。
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公开(公告)号：US20070131080A1
公开(公告)日：2007-06-14
申请号：US11298837
申请日：2005-12-09
申请人： Christina Moody , Atif Qureshi , Vikramjit Singh , Jarden Krager , Jennifer Porlier , Kristin Wood , Richard Crawford
发明人： Christina Moody , Atif Qureshi , Vikramjit Singh , Jarden Krager , Jennifer Porlier , Kristin Wood , Richard Crawford
IPC分类号： G10D1/08
CPC分类号： G10D3/08
摘要： A modular automated assistive guitar is described comprising a base assembly, a pick assembly, a strumming mechanism and a fretting mechanism which, in combination with a standard guitar or similar stringed musical instrument (e.g., banjo, steel guitar, ukulele), forms a musical device that can be played by an individual with a range of independence, cognitive and physical abilities. The base assembly accepts, positions, and secures a standard guitar. The pick assembly includes quick attach and spring-loaded features for attaching and detaching picks, in addition to flexibility for smooth interaction with the guitar strings. The strumming mechanism provides cyclic motion and speed control to create pleasant and variable rhythm from the mounted guitar. The fretting mechanism allows a user to change chords and tone. An unmodified, traditional guitar is preferably used in the musical device. The guitar is easily interchangeable with another guitar or other stringed instrument, at the convenience of the user. The modular automated assistive musical device, with or without the guitar, is compact, light, portable, and easily adjustable to different individual's needs, motor skills, and dexterity.
摘要翻译： 描述了一种模块化的自动辅助吉他，其包括基座组件，拾取组件，弹奏机构和微动机构，其结合标准吉他或类似弦乐器（例如班卓琴，钢吉他，ukulele），形成音乐 可以由具有一定程度的独立性，认知能力和身体素质的个人进行演奏的装置。 基座组件接受，定位和固定标准吉他。 拾音组件包括用于附接和分离拾音器的快速附接和弹簧加载功能，以及与吉他琴弦平滑相互作用的灵活性。 演奏机构提供循环运动和速度控制，从安装的吉他创建愉快和可变的节奏。 微动机构允许用户改变和弦和音调。 音乐装置中最好使用未经修改的传统吉他。 吉他可以方便地与另一种吉他或其他弦乐器互换，方便用户使用。 具有或不具有吉他的模块化自动辅助音乐装置是紧凑的，轻便的，便携的，并且可以根据不同的个人需求，运动技能和灵巧性而容易调节。
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4.发明申请NANOIMPRINT LITHOGRAPHY FORMATION OF FUNCTIONAL NANOPARTICLES USING DUAL RELEASE LAYERS 有权NANOIMPRINT LITHOGRAPHY使用双重释放层形成功能纳米颗粒公开(公告)号：US20120114559A1
公开(公告)日：2012-05-10
申请号：US13289601
申请日：2011-11-04
CPC分类号： G03F7/0002 , A61K9/51 , A61K9/5192 , B82Y5/00 , B82Y10/00 , B82Y15/00 , B82Y40/00 , Y10S977/701 , Y10S977/712 , Y10S977/713
摘要： Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.
摘要翻译： 可以使用至少一个纳米压印光刻步骤形成功能纳米颗粒。 在一个实施例中，牺牲材料可以使用压印光刻工艺在多层衬底上图案化，包括可移除层之间的一个或多个功能层。 至少一个功能层包括诸如药物组合物或成像剂的功能材料。 可以将图案进一步蚀刻到多层基板中。 然后可以去除功能材料的至少一部分以提供暴露柱的冠表面。 去除可移除的层从图案化结构释放柱以形成功能性纳米颗粒，例如药物或成像剂载体。
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公开(公告)号：US20120112385A1
公开(公告)日：2012-05-10
申请号：US13290770
申请日：2011-11-07
CPC分类号： B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
摘要： Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
摘要翻译： 描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。 该方法可以用于直接图案化衬底和/或创建压印光刻模板或模具，其可以随后用于将纳米形图案直接复制到其它衬底中，例如形成功能性或牺牲抗蚀剂以形成功能纳米颗粒。
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公开(公告)号：US07285709B2
公开(公告)日：2007-10-23
申请号：US11298837
申请日：2005-12-09
申请人： Christina Kay White , Atif Muzaffar Qureshi , Vikramjit Singh , Jarden Ellison Krager , Jennifer Elizabeth Porlier , Kristin Lee Wood , Richard Haygood Crawford, Jr.
发明人： Christina Kay White , Atif Muzaffar Qureshi , Vikramjit Singh , Jarden Ellison Krager , Jennifer Elizabeth Porlier , Kristin Lee Wood , Richard Haygood Crawford, Jr.
CPC分类号： G10D3/08
摘要： A modular automated assistive guitar is described comprising a base assembly, a pick assembly, a strumming mechanism and a fretting mechanism which, in combination with a standard guitar or similar stringed musical instrument (e.g., banjo, steel guitar, ukulele), forms a musical device that can be played by an individual with a range of independence, cognitive and physical abilities. The base assembly accepts, positions, and secures a standard guitar. The pick assembly includes quick attach and spring-loaded features for attaching and detaching picks, in addition to flexibility for smooth interaction with the guitar strings. The strumming mechanism provides cyclic motion and speed control to create pleasant and variable rhythm from the mounted guitar. The fretting mechanism allows a user to change chords and tone. An unmodified, traditional guitar is preferably used in the musical device. The guitar is easily interchangeable with another guitar or other stringed instrument, at the convenience of the user. The modular automated assistive musical device, with or without the guitar, is compact, light, portable, and easily adjustable to different individual's needs, motor skills, and dexterity.
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公开(公告)号：US08961800B2
公开(公告)日：2015-02-24
申请号：US12854359
申请日：2010-08-11
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.
摘要翻译： 可以使用至少一个纳米光刻步骤形成功能性纳米颗粒。 在一个实施例中，牺牲材料可以使用压印光刻系统在多层衬底上图案化。 该图案可以进一步蚀刻到多层基板中。 然后将功能材料沉积在多层基底上并固化。 然后可以去除功能材料的至少一部分以提供暴露柱的冠表面。 支柱可以从多层底物形成功能纳米颗粒中去除。
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8.发明授权Nanoimprint lithography formation of functional nanoparticles using dual release layers 有权使用双层释放层的纳米压印光刻形成功能性纳米粒子公开(公告)号：US08916200B2
公开(公告)日：2014-12-23
申请号：US13289601
申请日：2011-11-04
CPC分类号： G03F7/0002 , A61K9/51 , A61K9/5192 , B82Y5/00 , B82Y10/00 , B82Y15/00 , B82Y40/00 , Y10S977/701 , Y10S977/712 , Y10S977/713
摘要： Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.
摘要翻译： 可以使用至少一个纳米压印光刻步骤形成功能纳米颗粒。 在一个实施例中，牺牲材料可以使用压印光刻工艺在多层衬底上图案化，包括可移除层之间的一个或多个功能层。 至少一个功能层包括诸如药物组合物或成像剂的功能材料。 可以将图案进一步蚀刻到多层基板中。 然后可以去除功能材料的至少一部分以提供暴露柱的冠表面。 去除可移除的层从图案化结构释放柱以形成功能性纳米颗粒，例如药物或成像剂载体。
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公开(公告)号：US20110049096A1
公开(公告)日：2011-03-03
申请号：US12854359
申请日：2010-08-11
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y30/00 , B82Y40/00
摘要： Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.
摘要翻译： 可以使用至少一个纳米光刻步骤形成功能纳米颗粒。 在一个实施例中，牺牲材料可以使用压印光刻系统在多层衬底上图案化。 该图案可以进一步蚀刻到多层基板中。 然后将功能材料沉积在多层基底上并固化。 然后可以去除功能材料的至少一部分以提供暴露柱的冠表面。 支柱可以从多层底物形成功能纳米颗粒中去除。
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