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Patent Agency Ranking
公开(公告)号：US4880492A
公开(公告)日：1989-11-14
申请号：US96583
申请日：1987-09-15
Applicant: Dietrich Erdmann , Max E. Van Ghemen , Ludwig Pohl , Herbert Schumann , Uwe Hartmann , Wilfried Wassermann , Meino Heyen , Holger Jurgensen
Inventor： Dietrich Erdmann , Max E. Van Ghemen , Ludwig Pohl , Herbert Schumann , Uwe Hartmann , Wilfried Wassermann , Meino Heyen , Holger Jurgensen
Abstract: In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
Abstract translation: 在通过气相沉积制造薄膜和外延层的方法中，使用分子内稳定的有机金属化合物作为金属源。
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公开(公告)号：US07351678B2
公开(公告)日：2008-04-01
申请号：US10491917
申请日：2002-09-11
Applicant: Kartin Köhler , Herbert Schumann , Birgit Corinna Wassermann , Wilfried Wassermann , Katharina Lange , Sebastian Dechert , Markus Hummert , Stefan Schutte , Walter Kaminsky , Andrea Eisenhardt , Björn Heuer , Andre Laban
Inventor： Kartin Köhler , Herbert Schumann , Birgit Corinna Wassermann , Wilfried Wassermann , Katharina Lange , Sebastian Dechert , Markus Hummert , Stefan Schutte , Walter Kaminsky , Andrea Eisenhardt , Björn Heuer , Andre Laban
IPC: B01J31/14 , B01J31/00 , B01J31/18 , C07F5/00 , C07F5/06 , C08F4/52 , C08F4/658 , C08F10/00 , C08F10/06
CPC classification number: C07F5/066
Abstract: The invention relates to the use of nitrogenous aluminium organyl complexes of general formula (I) as co-catalysts in heterogeneous polymerisation reactions of propene. In said formula: R, R′, R1 and R1′ independently of one another represent branched or unbranched C1-C7 alkyl, cycloalkyl, alkenyl, cycloalkenyl, aryl or alkynyl; R2 represents unsubstituted, monoalkylated or polyalkylated and/or monofluorinated or polyfluorinated aromatic hydrocarbons from group (II); R3 and R4 independently of one another represent CH2, CF2 oder C(R1)2; m stands for 0, 1 or 2; n stands for 0, 1 or 2; o stands for 0 or 1, all independently of one another. Said systems exhibit improved characteristics in terms of activity and stereoselectivity in comparison to conventional co-catalysts such as AlEt3 and can act simultaneously as co-catalysts and stereoselectivity promoters
Abstract translation: 本发明涉及在丙烯的非均相聚合反应中使用通式（I）的含氮有机络合物作为助催化剂。 在所述式中：R 1，R 2，R 1和R 1彼此独立地表示支链或非支链C 1 -C 3 烷基，环烷基，烯基，环烯基，芳基或炔基; R 2表示来自（II）组的未取代的单烷基化或多烷基化和/或单氟化或多氟化芳族烃; R 3和R 4彼此独立地表示CH 2，CF 2，C（R 0） 2＆lt; 2＆gt;; m代表0,1或2; n代表0,1或2; o代表0或1，彼此独立。 与常规助催化剂如AlE 3 3 3相比，所述体系在活性和立体选择性方面表现出改善的特性，并且可以同时作为助催化剂和立体选择性促进剂
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公开(公告)号：US5259915A
公开(公告)日：1993-11-09
申请号：US856795
申请日：1992-03-24
Applicant: Ludwig Pohl , Herbert Schumann , Wilfried Wassermann , Uwe Hartmann , Thomas Seuss
Inventor： Ludwig Pohl , Herbert Schumann , Wilfried Wassermann , Uwe Hartmann , Thomas Seuss
CPC classification number: C07F9/5045 , C07F5/00 , C07F5/062 , C07F5/066 , C07F9/703 , C07F9/908 , Y10S526/943
Abstract: The invention relates to organometallic compounds of the elements aluminum, gallium and indium which are two-fold intramolecularly stabilized, and to the use thereof for the production of thin films and epitaxial layers by deposition from the liquid or solid phase.
Abstract translation: 本发明涉及元素铝，镓和铟元素分子内稳定的有机金属化合物，以及其用于通过从液相或固相沉积制备薄膜和外延层的用途。
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公开(公告)号：US5149853A
公开(公告)日：1992-09-22
申请号：US789518
申请日：1991-11-08
Applicant: Dietrich Erdmann , Max E. Van Ghemen , Ludwig Pohl , Herbert Schumann , Uwe Hartmann , Wilfried Wassermann , Meino Heyen , Holger Jurgensen
Inventor： Dietrich Erdmann , Max E. Van Ghemen , Ludwig Pohl , Herbert Schumann , Uwe Hartmann , Wilfried Wassermann , Meino Heyen , Holger Jurgensen
Abstract: In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
Abstract translation: 在通过气相沉积制造薄膜和外延层的方法中，使用分子内稳定的有机金属化合物作为金属源。
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公开(公告)号：US5112432A
公开(公告)日：1992-05-12
申请号：US389197
申请日：1989-08-03
Applicant: Dietrich Erdmann , Max E. Van Ghemen , Ludwig Pohl , Herbert Schumann , Uwe Hartmann , Wilfried Wassermann , Meino Heyen , Holger Jurgensen
Inventor： Dietrich Erdmann , Max E. Van Ghemen , Ludwig Pohl , Herbert Schumann , Uwe Hartmann , Wilfried Wassermann , Meino Heyen , Holger Jurgensen
Abstract: In a process for the production of thin films and epitaxial layers by gas-phase deposition, intramolecularly stabilized organometallic compounds are employed as a source of metal.
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