公开(公告)号：US5472502A

公开(公告)日：1995-12-05

申请号：US114820

申请日：1993-08-30

申请人： William T. Batchelder

发明人： William T. Batchelder

IPC分类号： G03F7/16 ,  B05D1/00 ,  H01L21/00 ,  H01L21/027 ,  B05C11/02

CPC分类号： H01L21/6715 ,  B05D1/005

摘要： An apparatus and method are provided for controlling the rate of drying of a high-viscosity chemical applied to a substantially flat surface of a spinning article. The rate of drying of the chemical is controlled by controlling the saturation level of a solvent in the local atmosphere in which the article is spinning, i.e., in the air space adjacent to the surface of the article. By spinning the article in a solvent-laden vapor, the evaporation of solvent from the chemical is slowed and therefore the rate at which the chemical dries and thickens is also slowed. Spreading of the chemical may also be facilitated and premature drying of the chemical may be avoided by applying to the surface of the article a thin layer of the solvent prior to application of the chemical.

摘要翻译： 提供了一种用于控制施加到纺丝制品的基本平坦的表面上的高粘度化学品的干燥速率的装置和方法。 通过控制制品旋转的局部气氛中的溶剂的饱和水平，即在与制品表面相邻的空气空间中来控制化学品的干燥速度。 通过在含溶剂的蒸气中纺制物品，化学品中溶剂的蒸发减慢，因此化学品干燥和变稠的速度也会减慢。 也可以促进化学品的扩散，并且可以通过在施用化学品之前向制品的表面施加薄层的溶剂来避免化学品的过早干燥。

公开(公告)号：US5766824A

公开(公告)日：1998-06-16

申请号：US508028

申请日：1995-07-27

申请人： William T. Batchelder ,  Michael L. Parodi ,  Michael R. Biche

发明人： William T. Batchelder ,  Michael L. Parodi ,  Michael R. Biche

IPC分类号： G03F7/16 ,  G03F7/30 ,  H01L21/00 ,  H01L21/027 ,  H01L21/687 ,  G03F7/00

CPC分类号： G03F7/30 ,  G03F7/168 ,  G03F7/3021 ,  H01L21/67109 ,  H01L21/67167 ,  H01L21/67184 ,  H01L21/67225 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/6875

摘要： A substrate photolithography system includes a substrate handling robot that pivots about a fixed point and transfers substrates between photoresist coater, a developer, and a heating/cooling unit, all of which are clustered about the robot. The end effector of the robot is capable of both vertical and lateral movement so that individual modules of the heating/cooling unit may be stacked. For heating/cooling, the substrate is placed in the heating/cooling unit in close proximity to a hotplate/chillplate and a thermally conductive, non-reactive gas, such as helium, is introduced into the airspace between the substrate and the hotplate/chillplate. The thermally conductive, non-reactive gas, is preheated/precooled before introduction into the airspace between the substrate and the hotplate/chillplate when the gas passes through a bore in the hotplate/chillplate. Additionally, the substrate is automatically aligned in a milled recession in the hotplate surface for future handling.

摘要翻译： 基板光刻系统包括基板处理机器人，该基板处理机器人围绕固定点枢转并且在光致抗蚀剂涂布机，显影剂和加热/冷却单元之间传送基板，所有这些都围绕机器人聚集。 机器人的末端执行器能够垂直和横向移动，从而可以堆叠加热/冷却单元的各个模块。 对于加热/冷却，将基板放置在靠近加热板/冷却板的加热/冷却单元中，并且将导热的非反应性气体（例如氦）引入到基板和加热板/冷却板之间的空间中 。 导热的非反应性气体在气体通过加热板/冷却板中的孔之前被引入基板和加热板/冷却板之间的空气空间之前被预热/预冷却。 此外，基板在加热板表面的铣削凹陷中自动对准，以便将来处理。

公开(公告)号：US5885661A

公开(公告)日：1999-03-23

申请号：US507797

申请日：1995-07-26

申请人： William T. Batchelder

发明人： William T. Batchelder

IPC分类号： B05D1/00 ,  G03F7/16 ,  H01L21/00 ,  B05D1/02 ,  B05B5/025

CPC分类号： H01L21/6715 ,  B05D1/002 ,  G03F7/162 ,  G03F7/164

摘要： An apparatus and method are provided for efficiently and effectively coating a substantially flat surface, i.e., a substrate, with a high-viscosity chemical such as photoresist. The chemical is dispensed through a piezo electrically controlled droplet jet cartridge on to the surface. The thickness of the chemical coating is controlled by controlling the rate at which chemical is dispensed through the droplet jet cartridge. A number of droplet jet cartridges are aligned such that gaps in chemical dispensed by one droplet jet cartridge are filled by chemical dispensed by other droplet jet cartridges. An array of droplet jet cartridges which spans the width of the surface moves across the surface to coat the surface with chemical in a single pass. To coat a circular surface, the surface is spun while a droplet jet cartridge is moved from the center of the surface to the outer edge of the surface. Chemical is dispensed on to the surface in a helical pattern.

摘要翻译： 提供了一种用高效和有效地涂覆基本上平坦的表面（即基底）的设备和方法，其中包括高粘度化学物质如光致抗蚀剂。 化学品通过压电电控液滴喷射墨盒分配到表面上。 化学涂层的厚度通过控制通过液滴喷射筒分配化学品的速率来控制。 将多个液滴喷射墨盒对齐，使得由一个液滴喷射墨盒分配的化学物质中的间隙被其它液滴喷射墨盒分配的化学物体填充。 跨越表面宽度的一列液滴喷射墨盒穿过表面移动，以一次通过化学品涂覆表面。 为了涂覆圆形表面，当液滴喷射筒从表面的中心移动到表面的外边缘时，表面被旋转。 化学品以螺旋形式分配到表面上。

公开(公告)号：US4647172A

公开(公告)日：1987-03-03

申请号：US735397

申请日：1985-05-17

申请人： William T. Batchelder ,  John A. Piatt ,  Kenneth M. Sautter

发明人： William T. Batchelder ,  John A. Piatt ,  Kenneth M. Sautter

IPC分类号： G03F7/30 ,  G03D5/04 ,  H01L21/306

CPC分类号： G03F7/3028 ,  Y10S438/948

摘要： In the resist development method disclosed herein, the spin development of a resist coating on the surface of a semiconductor wafer is monitored by measuring light scattered back from the wafer surface from an incandescent source. During development, the sensed light level oscillates due to optical fringing caused by the thinning of the resist layer in the exposed areas and the fringe generated oscillation essentially stops when the development breaks through in the exposed areas. By comparing sample data obtained from the sensed light level with template data representing a known or characteristic behavior, a control point corresonding to the last fringe may be determined. Development is then terminated a calculated time after the control point.

摘要翻译： 在本文公开的抗蚀剂显影方法中，通过从白炽源测量从晶片表面散射的光来监测半导体晶片表面上的抗蚀剂涂层的自旋显影。 在显影期间，由于曝光区域中的抗蚀剂层变薄引起的光学边缘，感测到的光水平振荡，并且当曝光区域中的显影突破时，边缘产生的振荡基本上停止。 通过将从感测到的光级获得的样本数据与表示已知或特征行为的模板数据进行比较，可以确定与最后边缘相对应的控制点。 控制点后的计算时间开始终止。