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公开(公告)号：US08427631B2
公开(公告)日：2013-04-23
申请号：US12947825
申请日：2010-11-17
Applicant: Hsiang-Chih Hsiao , Ta-Wen Liao , Chi-Min Yang , Shan-Fang Chen , Ya-Ping Chang , Chi-Hung Yang , Chung-Yuan Liao
Inventor： Hsiang-Chih Hsiao , Ta-Wen Liao , Chi-Min Yang , Shan-Fang Chen , Ya-Ping Chang , Chi-Hung Yang , Chung-Yuan Liao
CPC classification number: G03F7/20 , G02F1/133526 , G02F1/134309 , G03B27/58 , G03F1/14 , G03F7/70208 , Y10T428/24802
Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
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2.发明申请EXPOSURE APPARATUS, METHOD OF FORMING PATTERNED LAYER, METHOD OF FORMING PATTERNED PHOTORESIST LAYER, ACTIVE DEVICE ARRAY SUBSTRATE AND PATTERNED LAYER 有权曝光装置，形成图案的方法，形成图案光栅层的方法，主动装置阵列和图案层公开(公告)号：US20110223393A1
公开(公告)日：2011-09-15
申请号：US12947825
申请日：2010-11-17
Applicant: Hsiang-Chih Hsiao , Ta-Wen Liao , Chi-Min Yang , Shan-Fang Chen , Ya-Ping Chang , Chi-Hung Yang , Chung-Yuan Liao
Inventor： Hsiang-Chih Hsiao , Ta-Wen Liao , Chi-Min Yang , Shan-Fang Chen , Ya-Ping Chang , Chi-Hung Yang , Chung-Yuan Liao
CPC classification number: G03F7/20 , G02F1/133526 , G02F1/134309 , G03B27/58 , G03F1/14 , G03F7/70208 , Y10T428/24802
Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
Abstract translation: 提供了一种曝光装置，其适用于在层上曝光光致抗蚀剂层以形成多个带状曝光图案。 曝光装置包括光源，透镜组和掩模。 透镜组设置在光致抗蚀剂层和光源之间，并且包括彼此平行的多个条状透镜，其中任何两个相邻带状透镜之间的重叠区域被定义为透镜连接区域，而除透镜之外的其它区域 连接区域被定义为透镜区域。 掩模设置在光致抗蚀剂层和透镜组之间，并且包括多个屏蔽图案，其中屏蔽图案的轮廓对应于带状暴露图案，每个屏蔽图案具有带状开口和条形开口的延伸方向 基本上平行于屏蔽图案的延伸方向。
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