公开(公告)号：US20110019170A1

公开(公告)日：2011-01-27

申请号：US12896580

申请日：2010-10-01

申请人： Yasunaga Kayama ,  Dai Arai

发明人： Yasunaga Kayama ,  Dai Arai

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70716

摘要： A projection exposure apparatus has a substrate table on which a substrate is mounted that can be moved holding the substrate, a position measuring system that measures positional information of the substrate table, and a correction unit that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate.

摘要翻译： 投影曝光装置具有：基板台，安装有基板的基板，可移动地保持基板;位置测量系统，其测量基板台的位置信息;以及修正单元，其校正至少基板中发生的位置偏差 或由于液体的供应引起的基板台。 在这种情况下，校正单元校正由于液体供应而在至少基板或基板台中发生的位置偏差。 因此，在基板上进行使用液浸法的高精度的曝光。

公开(公告)号：US20070064212A1

公开(公告)日：2007-03-22

申请号：US11603986

申请日：2006-11-24

申请人： Yasunaga Kayama ,  Dai Arai

发明人： Yasunaga Kayama ,  Dai Arai

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70716

摘要： A projection exposure apparatus (100) has a substrate table (30) on which a substrate (W) is mounted that can be moved holding the substrate, a position measuring system (18 and others) that measures positional information of the substrate table, and a correction unit (19) that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate.

公开(公告)号：US06879375B1

公开(公告)日：2005-04-12

申请号：US09713215

申请日：2000-11-16

申请人： Yasunaga Kayama

发明人： Yasunaga Kayama

IPC分类号： G03F7/22 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/52 ,  G03B27/32 ,  F16M13/00 ,  G01B11/00

CPC分类号： G03F7/70691 ,  G03F7/70833 ,  G03F7/709

摘要： An exposure apparatus that exposes a pattern of a mask onto a substrate is provided with a projection system that projects the pattern onto a substrate, a holder that holds the projection system, a detector that detects information concerning displacement (e.g., oscillation) of the projection system, an actuator that is arranged in the holder, and a driver that drives the actuator corresponding to the detection results of the detector. Therefore, when, for example, displacement caused by vibration is generated in the holder of the projection system, the detector detects information concerning this displacement and outputs this information to the driver. By driving the actuator with the driver, the actuator controls displacement generated in the holder by canceling the detected displacement. This improves positioning accuracy and pattern projection accuracy of the exposure apparatus by controlling displacement caused by oscillation generated in the projection system.

摘要翻译： 将掩模图案曝光在基板上的曝光装置设置有将图案投影到基板上的投影系统，保持投影系统的保持器，检测关于投影的位移（例如振荡）的信息的检测器 系统，布置在保持器中的致动器以及与检测器的检测结果对应的驱动器的驱动器。 因此，当在投影系统的保持器中产生例如由振动引起的位移时，检测器检测关于该位移的信息，并将该信息输出给驾驶员。 通过用驱动器驱动致动器，致动器通过取消检测到的位移来控制在保持器中产生的位移。 这通过控制由投影系统产生的振荡引起的位移来提高曝光装置的定位精度和图案投影精度。

公开(公告)号：US20070081133A1

公开(公告)日：2007-04-12

申请号：US10582488

申请日：2004-12-14

申请人： Yasunaga Kayama ,  Dai Arai

发明人： Yasunaga Kayama ,  Dai Arai

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70775 ,  G03F7/70341 ,  G03F7/70783 ,  G03F9/7011 ,  G03F9/7026

摘要： A projection exposure apparatus (100) has a substrate table (30) on which a substrate (W) is mounted that can be moved holding the substrate, a position measuring system (18 and others) that measures positional information of the substrate table, and a correction unit (19) that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate.

摘要翻译： 投影曝光装置（100）具有：基板（30），其上安装有可移动的基板（W），保持基板;位置测量系统（18等），其测量基板台的位置信息;以及 校正单元（19），其校正由于液体的供应而在至少基板或基板台中发生的位置偏差。 在这种情况下，校正单元校正由于液体供应而在至少基板或基板台中发生的位置偏差。 因此，在基板上进行使用液浸法的高精度的曝光。