公开(公告)号：US06499222B1

公开(公告)日：2002-12-31

申请号：US09240414

申请日：1999-01-29

申请人： Hung-Ju Chien ,  Ying-Hsiang Chen ,  Wen-Kung Cheng ,  Yin-Lang Wang

发明人： Hung-Ju Chien ,  Ying-Hsiang Chen ,  Wen-Kung Cheng ,  Yin-Lang Wang

IPC分类号： G01B314

CPC分类号： G01B3/14

摘要： A template for measuring the edge width on a disk that is not covered by a coating layer on a top surface of the disk and a method for using such template are disclosed. The template is made of a substantially transparent sheet that has a contour substantially the same as the contour of the disk to be measured. A series of marks are provided on a top surface of the sheet along a peripheral edge of the sheet at numerous predetermined distances from the peripheral edge. The marks may be provided in scribed thin lines, or the marks may be provided in scribed thin lines that are color coded for easier identification purpose. The present invention novel template can be most suitably used on a silicon wafer of any size. However, it can also be used on a disk of any shape or contour to produce the same desirable result.

摘要翻译： 公开了一种用于测量不被盘顶表面上的涂层覆盖的盘上的边缘宽度的模板以及使用该模板的方法。 该模板由基本上透明的片材制成，其具有与要测量的盘的轮廓基本相同的轮廓。 沿着片材的周边边缘以距离周边边缘多个预定距离的方式，在片材的顶表面上提供一系列标记。 标记可以以划线的细线提供，或者标记可以以划线的细线提供，其颜色编码以便于识别目的。 本发明的新型模板可以最适用于任何尺寸的硅晶片。 然而，它也可以用于任何形状或轮廓的盘上以产生相同的期望结果。

公开(公告)号：US06604257B1

公开(公告)日：2003-08-12

申请号：US09309057

申请日：1999-05-10

申请人： Ming-Yi Lee ,  Ying-Hsiang Chen

发明人： Ming-Yi Lee ,  Ying-Hsiang Chen

IPC分类号： B08B9027

CPC分类号： H02M3/3385

摘要： The present invention discloses an apparatus and method for cleaning an exhaust conduit that has chemical substances deposited on its inside wall by utilizing a shaft that has a plurality of scraping elements mounted thereto capable of making vertically or radially oscillating motions inside the exhaust conduit such that the chemical substances can be dislodged from the inside wall and the exhaust conduit can be effectively cleaned. The apparatus may optionally include fluid nozzles provided in the shaft for dispensing a cleaning fluid during the cleaning process to further enhance the efficiency. The apparatus may further include a vacuum device for effectively removing the debris dislodged from the inside wall during such cleaning process.

摘要翻译： 本发明公开了一种用于清洁排气管道的装置和方法，该排气管道具有通过利用安装有多个刮板元件的轴而沉积在其内壁上的化学物质，其能够在排气管道内部进行垂直或径向摆动的运动， 化学物质可以从内壁移出，排气管可以被有效地清洁。 该设备可以可选地包括设置在轴中的流体喷嘴，用于在清洁过程中分配清洁流体以进一步提高效率。 该装置还可以包括真空装置，用于在这种清洁过程中有效地去除从内壁排出的碎屑。

公开(公告)号：US5954078A

公开(公告)日：1999-09-21

申请号：US822246

申请日：1997-03-20

申请人： Lien-Hsiang Chiang ,  Ying-Hsiang Chen

发明人： Lien-Hsiang Chiang ,  Ying-Hsiang Chen

IPC分类号： H01L21/00 ,  F16K21/00 ,  B05C7/00 ,  F16K31/02

CPC分类号： H01L21/67075 ,  Y10S118/10 ,  Y10T137/0324 ,  Y10T137/0391 ,  Y10T137/7306 ,  Y10T137/7313 ,  Y10T137/7316 ,  Y10T137/86187 ,  Y10T137/86196 ,  Y10T137/86356

摘要： A buffer tank and pre-wetting apparatus prevent a liquid chemical waste from crystalizing on the inside walls of a drain pipe that carries the waste to a waste tank. The pre-wetting apparatus includes a pre-wetting tank with an overflow pipe that leads to the waste tank drain pipe. A water supply is connected to fill the pre-wetting tank to the rim of the overflow pipe and then overflow to wet the inside walls of the drain pipe before waste from the buffer tank is transferred through the overflow pipe and to the drain pipe and the waste tank.

摘要翻译： 缓冲罐和预润湿装置防止液体化学废物在将废物运送到废水箱的排水管的内壁上结晶化。 预润湿装置包括具有溢流管的预润湿槽，其通向废液箱排放管。 连接水源，将预润湿槽填充到溢流管的边缘，然后在从缓冲罐的废物通过溢流管和排水管转移到溢流管之前溢出以润湿排水管的内壁 废水箱

公开(公告)号：US5915398A

公开(公告)日：1999-06-29

申请号：US876913

申请日：1997-06-16

申请人： Ying-Hsiang Chen ,  Chwan-Der Lee

发明人： Ying-Hsiang Chen ,  Chwan-Der Lee

IPC分类号： B01D53/14 ,  B08B3/00 ,  B08B3/02

CPC分类号： B08B3/006 ,  B01D53/14

摘要： A cleaning station for cleaning parts from apparatus that itself uses a water spray to clean a toxic gas. The cleaning station has a tray and a sink for holding a part to be spray cleaned and the sink is connected to drain the spray water into the drain system of the gas cleaning apparatus.

摘要翻译： 用于清洁本身使用喷水清洁有毒气体的设备的清洁站。 清洁站具有用于保持要喷雾清洁的部件的托盘和水槽，并且所述水槽被连接以将喷射水排放到气体清洁设备的排水系统中。

公开(公告)号：US5697839A

公开(公告)日：1997-12-16

申请号：US679912

申请日：1996-07-15

申请人： Ying-Hsiang Chen ,  Wei-Yao Chien ,  Deh-Hsiung Peng ,  Yung-Mao Hsu

发明人： Ying-Hsiang Chen ,  Wei-Yao Chien ,  Deh-Hsiung Peng ,  Yung-Mao Hsu

IPC分类号： B08B15/02

CPC分类号： B08B15/026

摘要： An apparatus for venting hazardous effluents from process equipment used in the manufacture of semiconductors, which is part of a larger ventilating system, is a "see-thru" transparent chamber which performs the function of a hood, and can be mounted on any one of the conventional semiconductor processing equipment. Because it is transparent, the operator can easily determine when to clean the hood. This is important from the point of view of not exposing the work piece in the processing equipment to effluent contaminants. Usually, the effluents are hazardous to health. Hence, the apparatus is equipped with a pair of gloves which are an integral part of an access door to the hood, and is used to manipulate remotely cleaning tools that are kept inside said hood: remote in the sense that the operator is never exposed to the hazardous effluents inside the chamber hood, and yet is easily capable of using the cleaning tools inside the hood by means of the pair gloves that are an integral part of the hood. The throughput of the manufacturing line is favorably affected since cleaning can be accomplished without stopping the process taking place in the semiconductor manufacturing line.

摘要翻译： 用于制造半导体的工艺设备中排放危险废液的装置是作为较大通风系统的一部分的“透明”透明室，其执行罩的功能，并且可以安装在任何一个 传统的半导体加工设备。 因为它是透明的，操作者可以很容易地确定何时清洁罩。 从处理设备中的工件不会暴露于污染物的观点来看，这一点很重要。 通常，流出物对健康有害。 因此，该装置配备有一对手套，这些手套是通向发动机盖的入口门的组成部分，并且用于操纵保持在所述罩内的远程清洁工具：远离操作者从未暴露于 腔室罩内的危险废液，但是通过作为罩的组成部分的成对手套，能够容易地使用罩内的清洁工具。 生产线的生产能力受到影响，因为可以在不停止在半导体生产线中发生的工艺的情况下完成清洁。