公开(公告)号：US5824824A

公开(公告)日：1998-10-20

申请号：US742323

申请日：1996-11-01

申请人： Yoichi Osawa ,  Satoshi Watanabe ,  Kaysuya Takemura ,  Shigehiro Nagura ,  Akinobu Tanaka ,  Yoshio Kawai

发明人： Yoichi Osawa ,  Satoshi Watanabe ,  Kaysuya Takemura ,  Shigehiro Nagura ,  Akinobu Tanaka ,  Yoshio Kawai

IPC分类号： C07C381/12 ,  G03F7/004 ,  C07C319/00

CPC分类号： G03F7/0045 ,  C07C381/12 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

摘要： The invention provides a novel sulfonium salt having at least one acid labile group attached to a phenyl group in a molecule and a C.sub.2 -C.sub.20 alkylsulfonate or arylsulfonate anion whose alkyl or aryl has as a substituent an electron withdrawing group such as fluorine and nitro group. The novel sulfonium salt is effective for increasing the dissolution contrast between exposed and unexposed areas. Upon exposure, it generates a substituted alkyl or arylsulfonic acid which is a weak acid, minimizing the influence of side reaction and deactivation during PEB step. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.

摘要翻译： 本发明提供了一种新的锍盐，其具有至少一个与分子中的苯基连接的酸不稳定基团，和其烷基或芳基具有诸如氟和硝基的吸电子基团的取代基的C 2 -C 20烷基磺酸盐或芳基磺酸根阴离子。 新型锍盐对于增加曝光和未曝光区域之间的溶解度对比是有效的。 暴露后，产生弱酸的取代烷基或芳基磺酸，使PEB步骤中副反应和失活的影响最小化。 锍盐可用于化学放大的正性抗蚀剂组合物，其具有精细的图案化并具有高分辨率。

公开(公告)号：US5705702A

公开(公告)日：1998-01-06

申请号：US713257

申请日：1996-09-12

申请人： Yoichi Osawa ,  Satoshi Watanabe ,  Junji Shimada ,  Toshinobu Ishihara

发明人： Yoichi Osawa ,  Satoshi Watanabe ,  Junji Shimada ,  Toshinobu Ishihara

IPC分类号： C07C381/12 ,  C07C331/00

CPC分类号： C07C381/12

摘要： By reacting an aryl Grignard reagent of the following general formula (1) with thionyl chloride and then reacting the reaction product with a triorganosilyl sulfonate or triorganohalide of the general formula (2): (R.sup.6).sub.3 SiY wherein R.sup.6, which may be the same or different, is a monovalent hydrocarbon group and Y is a substituted or unsubstituted alkylsulfonate or arylsulfonate or halogen atom, there is prepared a triarylsulfonium salt of the following general formula (3). ##STR1## In the formulae, each of R.sup.1 to R.sup.5, which may be the same or different, is a hydrogen atom or a monovalent organic group, especially alkyl, aryl, alkoxy, aryloxy, dialkylamino, dialkylaminoalkyl, alkylthio or arylthio group and X is a bromine or chlorine atom.

摘要翻译： 通过使下列通式（1）的芳基格氏试剂与亚硫酰氯反应，然后使反应产物与通式（2）：（R6）3 SiY的三有机甲硅烷基磺酸酯或三有机卤化物反应，其中R6可以相同或 不同的是一价烃基，Y是取代或未取代的烷基磺酸酯或芳基磺酸酯或卤素原子，制备下列通式（3）的三芳基锍盐。 （1）式（3）式中，R 1〜R 5可以相同或不同，为氢原子或一价有机基团，特别是烷基，芳基，烷氧基，芳氧基，二烷基氨基 ，二烷基氨基烷基，烷硫基或芳硫基，X是溴或氯原子。

公开(公告)号：US5880169A

公开(公告)日：1999-03-09

申请号：US742324

申请日：1996-11-01

申请人： Yoichi Osawa ,  Satoshi Watanabe ,  Katsuya Takemura ,  Shigehiro Nagura ,  Akinobu Tanaka ,  Yoshio Kawai

发明人： Yoichi Osawa ,  Satoshi Watanabe ,  Katsuya Takemura ,  Shigehiro Nagura ,  Akinobu Tanaka ,  Yoshio Kawai

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/038

CPC分类号： G03F7/0045

摘要： The invention provides a novel sulfonium salt having at least one acid labile group attached to a phenyl group in a molecule and a normal, branched or cyclic C.sub.1 -C.sub.20 alkylsulfonate anion. The novel sulfonium salt is effective for increasing the dissolution contrast between exposed and unexposed areas. Upon exposure, it generates an alkylsulfonic acid which is a weak acid, minimizing the influence of side reaction and deactivation during PEB step. The sulfonium salt is useful in a chemically amplified positive resist composition which lends itself to fine patterning and features high resolution.

摘要翻译： 本发明提供了一种新的锍盐，其具有至少一个与分子中的苯基连接的酸不稳定基团以及正，支链或环状的C 1 -C 20烷基磺酸根阴离子。 新型锍盐对于增加曝光和未曝光区域之间的溶解度对比是有效的。 暴露后，产生弱酸的烷基磺酸，使PEB步骤中副反应和失活的影响最小化。 锍盐可用于化学放大的正性抗蚀剂组合物，其具有精细的图案化并具有高分辨率。