公开(公告)号：US20130114055A1

公开(公告)日：2013-05-09

申请号：US13393522

申请日：2011-07-26

Applicant: Sin Young Kim ,  Kyung Ki Hong ,  Hyuk Yoon ,  Won Cheul Ju ,  Yong II Cho ,  Moon Soo Park ,  Dong Ho Ko ,  Su Young Ryu

Inventor： Sin Young Kim ,  Kyung Ki Hong ,  Hyuk Yoon ,  Won Cheul Ju ,  Yong II Cho ,  Moon Soo Park ,  Dong Ho Ko ,  Su Young Ryu

IPC: G03F1/42 ,  G03B27/72

CPC classification number: G03F1/42 ,  G02B5/201 ,  G02F1/1303 ,  G02F1/133753 ,  G02F1/133788 ,  G03B27/72 ,  G03F7/0007 ,  G03F7/24

Abstract: A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.

Abstract translation: 提供了一种掩模和具有该掩模的滤光器制造装置。 光学滤波器制造装置包括卷绕处理中使用的卷，卷绕在卷上的基膜，产生用于曝光的光的光源，安装在光源的发射侧的偏光板和 使从光源产生的光偏振，以及在基膜上形成图案的掩模，并且包括打开以具有预定厚度和预定宽度的多个引导狭缝。 根据本发明，可以以均匀的光量照射基膜的整个表面。 因此，可以在基膜上均匀地形成图案，可以提高产品的质量，并且可以准确地实现基膜的特性。

公开(公告)号：US20150205143A1

公开(公告)日：2015-07-23

申请号：US13567751

申请日：2012-08-06

Applicant: Seung Hun CHAE ,  Kyung Ki Hong ,  Jung Hyun Yeo ,  Yong II Cho ,  Moon Soo Park ,  Sang Seop Kim

Inventor： Seung Hun CHAE ,  Kyung Ki Hong ,  Jung Hyun Yeo ,  Yong II Cho ,  Moon Soo Park ,  Sang Seop Kim

IPC: G02B27/26 ,  G02B5/30 ,  G02F1/1334

CPC classification number: G02B27/26 ,  G02B5/20 ,  G02B5/3016 ,  G02B5/3083 ,  G02B27/2214 ,  G02F1/1334 ,  G02F1/133509 ,  G02F1/133528 ,  G02F2001/133631 ,  G02F2001/133633

Abstract: Provided is an optical filter and a display device. In the optical filter, patterns of first and second regions therein may be stably maintained, and therefore the optical filter capable of ensuring excellent light division characteristics for a long time may be provided.

Abstract translation: 提供了一种滤光器和显示装置。 在滤光器中，可以稳定地保持其中的第一和第二区域的图案，因此可以提供能够长时间确保优异的光分离特性的滤光器。

公开(公告)号：US20130143007A1

公开(公告)日：2013-06-06

申请号：US13356463

申请日：2012-01-23

Applicant: Sin Young KIM ,  Kyung Ki Hong ,  Hyuk Yoon ,  Won Cheul Ju ,  Yong II Cho ,  Moon Soo Park ,  Dong Ho Ko ,  Su Young Ryu

Inventor： Sin Young KIM ,  Kyung Ki Hong ,  Hyuk Yoon ,  Won Cheul Ju ,  Yong II Cho ,  Moon Soo Park ,  Dong Ho Ko ,  Su Young Ryu

IPC: G03F1/00 ,  B32B3/10 ,  G03F7/24 ,  G03B27/42 ,  G03F1/52 ,  G03F7/20

CPC classification number: G03F1/52 ,  G03F1/00 ,  G03F1/50 ,  Y10T428/24802

Abstract: A light irradiation apparatus and a method of manufacture a photo-aligning layer are disclosed. A mask included in a light irradiation apparatus according to one embodiment is configured to irradiate the light having straightness at a high level of illumination to a subject that is apart from the mask with a certain distance. A photo-aligning layer with a desired alignment pattern can be fabricated using the mask.

Abstract translation: 公开了光照射装置和制造光取向层的方法。 包括在根据一个实施例的光照射装置中的掩模被配置为将具有高水平照明的直线度的光以一定距离照射到离开掩模的被摄体。 可以使用掩模制造具有期望的对准图案的光取向层。