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公开(公告)号：US07413503B2
公开(公告)日：2008-08-19
申请号：US11269635
申请日：2005-11-09
申请人： Yoshinori Tabata , Keiko Kitamura
发明人： Yoshinori Tabata , Keiko Kitamura
IPC分类号： B24B1/00
CPC分类号： B24B13/02
摘要： An elastic polishing tool that comes into contact with a surface to be polished of a lens and rotates to polish the surface, includes: an elastic polishing body which has a cylindrical shape and whose shape can be changed according to the surface to be polished; and a polishing pad that is adhered to one surface of the elastic polishing body opposite to the surface to be polished of the lens, wherein the polishing pad has a diameter larger than the length of an arc of the elastic polishing body in a cross section including a rotation axis of the elastic polishing tool.
摘要翻译： 一种弹性抛光工具，其与透镜的待抛光表面接触并旋转以磨光该表面，包括：弹性抛光体，其具有圆柱形形状，并且其形状可根据待抛光表面而改变; 以及抛光垫，其粘附到所述弹性抛光体的与所述透镜的待抛光表面相对的一个表面上，其中所述抛光垫的直径大于所述弹性抛光体的弧的长度，所述截面包括： 弹性抛光工具的旋转轴线。
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公开(公告)号：US07372546B2
公开(公告)日：2008-05-13
申请号：US11127800
申请日：2005-05-12
CPC分类号： G02B26/0816 , G02B27/648 , G03H1/04 , G03H2001/0417 , G03H2001/0473 , G03H2222/18
摘要： In order to adjust the optical axis of a light beam L1 in an exposure apparatus, on a support body in an XYZ three-dimensional coordinate system are mounted: a first mirror 10 having a reflective surface M1 obtained by rotating a plane parallel to the XY plane around an axis 11 parallel to the Y axis by an angle of α; and a second mirror 20 having a reflective surface M2 obtained by rotating a plane parallel to the XZ plane around an axis 21 parallel to the X axis by an angle of β. There are provided: position adjustment means for moving the entire support body having the two mirrors parallel to the XY plane; and angle adjustment means for adjusting the angle of the second mirror 20. The incident light L1 is reflected on the reflective surfaces M1 and M2 to be output as an outgoing light L3, where it is possible to perform an optical axis adjustment concerning position and angle by controlling the position adjustment means and the angle adjustment means.
摘要翻译： 为了调节曝光装置中的光束L 1的光轴，安装在XYZ三维坐标系中的支撑体上：具有通过使平面平行旋转的平面旋转而获得的反射面M 1的第一反射镜10 围绕平行于Y轴的轴线11的XY平面以α的角度; 以及第二反射镜20，其具有通过使平行于XZ平面的平面围绕平行于X轴的轴线21旋转β的角度而获得的反射表面M 2。 提供了用于使具有平行于XY平面的两个反射镜的整个支撑体移动的位置调整装置; 以及用于调节第二反射镜20的角度的角度调节装置。 入射光L 1在反射面M 1，M 2上被反射，作为输出光L 3输出，通过控制位置调整装置和角度调整，能够对位置和角度进行光轴调整 手段。
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公开(公告)号：US20060099889A1
公开(公告)日：2006-05-11
申请号：US11269635
申请日：2005-11-09
申请人： Yoshinori Tabata , Keiko Kitamura
发明人： Yoshinori Tabata , Keiko Kitamura
CPC分类号： B24B13/02
摘要： An elastic polishing tool that comes into contact with a surface to be polished of a lens and rotates to polish the surface, includes: an elastic polishing body which has a cylindrical shape and whose shape can be changed according to the surface to be polished; and a polishing pad that is adhered to one surface of the elastic polishing body opposite to the surface to be polished of the lens, wherein the polishing pad has a diameter larger than the length of an arc of the elastic polishing body in a cross section including a rotation axis of the elastic polishing tool.
摘要翻译： 一种弹性抛光工具，其与透镜的待抛光表面接触并旋转以磨光该表面，包括：弹性抛光体，其具有圆柱形形状，并且其形状可根据待抛光表面而改变; 以及抛光垫，其粘附到所述弹性抛光体的与所述透镜的待抛光表面相对的一个表面上，其中所述抛光垫的直径大于所述弹性抛光体的弧的长度，所述截面包括： 弹性抛光工具的旋转轴线。
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公开(公告)号：US20060072092A1
公开(公告)日：2006-04-06
申请号：US11127800
申请日：2005-05-12
IPC分类号： G03B27/52
CPC分类号： G02B26/0816 , G02B27/648 , G03H1/04 , G03H2001/0417 , G03H2001/0473 , G03H2222/18
摘要： In order to adjust the optical axis of a light beam L1 in an exposure apparatus, on a support body in an XYZ three-dimensional coordinate system are mounted: a first mirror 10 having a reflective surface M1 obtained by rotating a plane parallel to the XY plane around an axis 11 parallel to the Y axis by an angle of α; and a second mirror 20 having a reflective surface M2 obtained by rotating a plane parallel to the XZ plane around an axis 21 parallel to the X axis by an angle of β. There are provided: position adjustment means for moving the entire support body having the two mirrors parallel to the XY plane; and angle adjustment means for adjusting the angle of the second mirror 20. The incident light L1 is reflected on the reflective surfaces M1 and M2 to be output as an outgoing light L3, where it is possible to perform an optical axis adjustment concerning position and angle by controlling the position adjustment means and the angle adjustment means.
摘要翻译： 为了调节曝光装置中的光束L 1的光轴，安装在XYZ三维坐标系中的支撑体上：具有通过使平面平行旋转的平面旋转而获得的反射面M 1的第一反射镜10 围绕平行于Y轴的轴线11的XY平面以α的角度; 以及第二反射镜20，其具有通过使平行于XZ平面的平面围绕平行于X轴的轴线21旋转β的角度而获得的反射表面M 2。 提供了用于使具有平行于XY平面的两个反射镜的整个支撑体移动的位置调整装置; 以及用于调节第二反射镜20的角度的角度调节装置。入射光L 1在反射表面M 1和M 2上被反射，作为出射光L 3输出，在那里可以执行光轴调节 通过控制位置调节装置和角度调节装置来关于位置和角度。
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公开(公告)号：US06872120B2
公开(公告)日：2005-03-29
申请号：US09958568
申请日：2001-02-16
摘要： A lens surface shape is created by a near-finish surface forming rough-cutting step of creating a near-finish surface shape analogous to a lens surface shape based on a prescription of a spectacle lens from a spectacle lens base material 11 by numerically controlled cutting, and a finish-cutting step of creating the lens surface shape based on the prescription of the spectacle lens from the near-finish surface shape by numerically controlled cutting. According to this method of producing a spectacle lens, all kinds of spectacle lenses including an inner surface progressive power lens can be produced with high productivity.A complex curved surface can be mirror-polished by a polishing tool, which includes an elastic sheet 41 having a curved surface, wherein a workpiece is polished by applying a pressure to the inner surface side of the elastic sheet 41, to stretch the elastic sheet 41 and bring the outer surface side of the elastic sheet 41 into contact with the workpiece.
摘要翻译： 透镜表面形状通过近似完成的表面形成粗切割步骤产生，其基于通过数控切割从眼镜镜片基材11制备的眼镜镜片的处方，产生类似于镜片表面形状的近似表面形状 以及基于通过数控切割从近成品表面形状基于眼镜镜片的处方产生透镜表面形状的精切割步骤。 根据该眼镜镜片的制造方法，能够以高生产率制造各种具有内表面渐进屈光力镜片的眼镜镜片。复曲面可以通过研磨工具进行镜面抛光，该抛光工具包括：弹性片41， 弯曲表面，其中通过向弹性片41的内表面侧施加压力来抛光工件，以拉伸弹性片41并使弹性片41的外表面侧与工件接触。
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公开(公告)号：US20080297750A1
公开(公告)日：2008-12-04
申请号：US12082949
申请日：2008-04-15
CPC分类号： G02B26/0816 , G02B27/648 , G03H1/04 , G03H2001/0417 , G03H2001/0473 , G03H2222/18
摘要： In order to adjust the optical axis of a light beam L1 in an exposure apparatus, on a support body in an XYZ three-dimensional coordinate system are mounted: a first mirror 10 having a reflective surface M1 obtained by rotating a plane parallel to the XY plane around an axis 11 parallel to the Y axis by an angle of α; and a second mirror 20 having a reflective surface M2 obtained by rotating a plane parallel to the XZ plane around an axis 21 parallel to the X axis by an angle of β. There are provided: position adjustment means for moving the entire support body having the two mirrors parallel to the XY plane; and angle adjustment means for adjusting the angle of the second mirror 20. The incident light L1 is reflected on the reflective surfaces M1 and M2 to be output as an outgoing light L3, where it is possible to perform an optical axis adjustment concerning position and angle by controlling the position adjustment means and the angle adjustment means.
摘要翻译： 为了调节曝光装置中的光束L1的光轴，安装在XYZ三维坐标系中的支撑体上，具有通过使平行于XY的平面旋转而获得的反射面M1的第一反射镜10 平行于Y轴的轴线11以α的角度平面; 以及具有反射面M2的第二反射镜20，该反射面M2通过将平行于XZ平面的平面围绕平行于X轴的轴线21旋转β而获得。 提供了用于使具有平行于XY平面的两个反射镜的整个支撑体移动的位置调整装置; 以及用于调整第二反射镜20的角度的角度调节装置。入射光L1在反射表面M1和M2上被反射，作为出射光L3输出，在那里可以执行关于位置和角度的光轴调节 通过控制位置调节装置和角度调节装置。
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公开(公告)号：US07839488B2
公开(公告)日：2010-11-23
申请号：US12082949
申请日：2008-04-15
CPC分类号： G02B26/0816 , G02B27/648 , G03H1/04 , G03H2001/0417 , G03H2001/0473 , G03H2222/18
摘要： In order to adjust the optical axis of a light beam L1 in an exposure apparatus, on a support body in an XYZ three-dimensional coordinate system are mounted: a first mirror 10 having a reflective surface M1 obtained by rotating a plane parallel to the XY plane around an axis 11 parallel to the Y axis by an angle of α; and a second mirror 20 having a reflective surface M2 obtained by rotating a plane parallel to the XZ plane around an axis 21 parallel to the X axis by an angle of β. There are provided: position adjustment means for moving the entire support body having the two mirrors parallel to the XY plane; and angle adjustment means for adjusting the angle of the second mirror 20. The incident light L1 is reflected on the reflective surfaces M1 and M2 to be output as an outgoing light L3, where it is possible to perform an optical axis adjustment concerning position and angle by controlling the position adjustment means and the angle adjustment means.
摘要翻译： 为了调节曝光装置中的光束L1的光轴，安装在XYZ三维坐标系中的支撑体上，具有通过使平行于XY的平面旋转而获得的反射面M1的第一反射镜10 平面于与Y轴平行的轴线11为α; 以及第二反射镜20，其具有通过使平行于XZ平面的平面围绕平行于X轴的轴线21旋转角度＆bgr而获得的反射面M2。 提供了用于使具有平行于XY平面的两个反射镜的整个支撑体移动的位置调整装置; 以及用于调整第二反射镜20的角度的角度调节装置。入射光L1在反射表面M1和M2上被反射，作为出射光L3输出，在那里可以执行关于位置和角度的光轴调节 通过控制位置调节装置和角度调节装置。
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