公开(公告)号：US06429400B1

公开(公告)日：2002-08-06

申请号：US09667437

申请日：2000-09-22

申请人： Yasushi Sawada ,  Keiichi Yamazaki ,  Yoshitami Inoue ,  Sachiko Okazaki ,  Masuhiro Kogoma

发明人： Yasushi Sawada ,  Keiichi Yamazaki ,  Yoshitami Inoue ,  Sachiko Okazaki ,  Masuhiro Kogoma

IPC分类号： B23K1000

CPC分类号： H01J37/32366 ,  H05H1/2406 ,  H05H2001/2443

摘要： A plasma processing apparatus for performing plasma processing of an article, comprising: a central electrode; a tubular outer electrode which is provided so as to surround the central electrode; a tubular reaction pipe which is disposed between the central electrode and the outer electrode so as to electrically insulate the central electrode and the outer electrode from each other; a gas supply device for supplying a plasma producing gas to a discharge space defined between the central electrode and the outer electrode in the reaction pipe; an AC power source for applying an AC voltage between the central electrode and the outer electrode; wherein not only the plasma producing gas is supplied to the discharge space by the gas supply device but the AC voltage is applied between the central electrode and the outer electrode by the AC power source so as to generate a glow discharge in the discharge space under atmospheric pressure such that a plasma jet is blown to the article from a blow-off outlet of the reaction pipe; and a cooling device for cooling the central electrode and the outer electrode.

摘要翻译： 一种用于执行制品的等离子体处理的等离子体处理装置，包括：中心电极; 设置成围绕中心电极的管状外电极; 管状反应管，其设置在所述中心电极和所述外部电极之间，以使所述中心电极和所述外部电极彼此电绝缘; 气体供给装置，用于将等离子体产生气体供给到在反应管中的中心电极和外部电极之间限定的放电空间; 用于在中心电极和外部电极之间施加AC电压的AC电源; 其中不仅通过气体供应装置将等离子体产生气体供应到放电空间，而且通过AC电源将AC电压施加在中心电极和外部电极之间，以便在大气中的放电空间中产生辉光放电 压力使得等离子体射流从反应管的吹出口吹送到制品; 以及用于冷却中心电极和外部电极的冷却装置。

公开(公告)号：US06489585B1

公开(公告)日：2002-12-03

申请号：US09627405

申请日：2000-07-27

申请人： Kosuke Nakamura ,  Yasushi Sawada ,  Hiroaki Kitamura ,  Yoshitami Inoue

发明人： Kosuke Nakamura ,  Yasushi Sawada ,  Hiroaki Kitamura ,  Yoshitami Inoue

IPC分类号： B23K1000

CPC分类号： H01J37/32009 ,  H01J37/32559

摘要： A plasma treatment apparatus includes two or more pairs of electrodes for plasma generation, a treatment chamber for accommodating the electrodes, gas supply unit for supplying a plasma-generation gas such as rare gas into the chamber, and a power supply. A pulse-like or AC voltage is applied between the electrodes to generate dielectric barrier discharge plasma of the gas in the vicinity of atmospheric pressure, so that an object placed between the electrodes is treated by the plasma. At least one of the electrodes is provided with a tubular electrode substrate and a protection layer formed by heat-fusion coating a glass-based material on at least an outer surface exposed to plasma of the tubular electrode substrate.

摘要翻译： 等离子体处理装置包括用于等离子体生成的两对或更多对电极，用于容纳电极的处理室，用于向室供应诸如稀有气体的等离子体产生气体的气体供给单元和电源。 在电极之间施加脉冲状或交流电压，以在大气压附近产生气体的电介质势垒放电等离子体，使得放置在电极之间的物体被等离子体处理。 至少一个电极设置有管状电极基板和通过在暴露于管状电极基板的等离子体的至少外表面上热熔涂覆玻璃基材料形成的保护层。

公开(公告)号：US06424091B1

公开(公告)日：2002-07-23

申请号：US09421291

申请日：1999-10-20

申请人： Yasushi Sawada ,  Kosuke Nakamura ,  Hiroaki Kitamura ,  Yoshitami Inoue

发明人： Yasushi Sawada ,  Kosuke Nakamura ,  Hiroaki Kitamura ,  Yoshitami Inoue

IPC分类号： H01J724

CPC分类号： H01J37/32009 ,  H01J37/32348 ,  H01J37/32541 ,  H01J37/32559 ,  H01J37/32724 ,  H05H1/2406

摘要： A plasma treatment apparatus capable of efficiently performing a plasma treatment to a large area of an object while preventing the occurrence of streamer discharge is provided. The apparatus includes at least one pair of electrodes, gas supply unit for supplying a gas for plasma generation to a discharge space defined between the electrodes, and an electric power supply for applying an AC voltage between the electrodes to generate plasma of the gas for plasma generation in the discharge space. At least one of the pair of electrodes has a dielectric layer at an outer surface thereof. At least one of the pair of electrodes has a curved surface jutting into the discharge space. It is preferred that the electrodes are of a cylindrical structure. In this case, it is particularly preferred that the plasma treatment apparatus further includes a coolant supply unit for supplying a coolant to the interior of the electrodes to reduce an electrode temperature during the plasma treatment.

摘要翻译： 提供能够有效地对物体的大面积进行等离子体处理的等离子体处理装置，同时防止流光放电的发生。 该装置包括至少一对电极，用于将等离子体产生的气体供应到在电极之间限定的放电空间的气体供给单元和用于在电极之间施加AC电压的电源，以产生等离子体气体的等离子体 一代在放电空间。 该对电极中的至少一个在其外表面具有介电层。 所述一对电极中的至少一个具有突出到放电空间的弯曲表面。 电极优选为圆柱形结构。 在这种情况下，特别优选的是，等离子体处理装置还包括用于向电极内部供应冷却剂以在等离子体处理期间降低电极温度的冷却剂供应单元。