公开(公告)号：US06429400B1

公开(公告)日：2002-08-06

申请号：US09667437

申请日：2000-09-22

申请人： Yasushi Sawada ,  Keiichi Yamazaki ,  Yoshitami Inoue ,  Sachiko Okazaki ,  Masuhiro Kogoma

发明人： Yasushi Sawada ,  Keiichi Yamazaki ,  Yoshitami Inoue ,  Sachiko Okazaki ,  Masuhiro Kogoma

IPC分类号： B23K1000

CPC分类号： H01J37/32366 ,  H05H1/2406 ,  H05H2001/2443

摘要： A plasma processing apparatus for performing plasma processing of an article, comprising: a central electrode; a tubular outer electrode which is provided so as to surround the central electrode; a tubular reaction pipe which is disposed between the central electrode and the outer electrode so as to electrically insulate the central electrode and the outer electrode from each other; a gas supply device for supplying a plasma producing gas to a discharge space defined between the central electrode and the outer electrode in the reaction pipe; an AC power source for applying an AC voltage between the central electrode and the outer electrode; wherein not only the plasma producing gas is supplied to the discharge space by the gas supply device but the AC voltage is applied between the central electrode and the outer electrode by the AC power source so as to generate a glow discharge in the discharge space under atmospheric pressure such that a plasma jet is blown to the article from a blow-off outlet of the reaction pipe; and a cooling device for cooling the central electrode and the outer electrode.

摘要翻译： 一种用于执行制品的等离子体处理的等离子体处理装置，包括：中心电极; 设置成围绕中心电极的管状外电极; 管状反应管，其设置在所述中心电极和所述外部电极之间，以使所述中心电极和所述外部电极彼此电绝缘; 气体供给装置，用于将等离子体产生气体供给到在反应管中的中心电极和外部电极之间限定的放电空间; 用于在中心电极和外部电极之间施加AC电压的AC电源; 其中不仅通过气体供应装置将等离子体产生气体供应到放电空间，而且通过AC电源将AC电压施加在中心电极和外部电极之间，以便在大气中的放电空间中产生辉光放电 压力使得等离子体射流从反应管的吹出口吹送到制品; 以及用于冷却中心电极和外部电极的冷却装置。

公开(公告)号：US5143748A

公开(公告)日：1992-09-01

申请号：US783022

申请日：1991-10-25

申请人： Hiroyuki Ishikawa ,  Hiroaki Usui ,  Yasushi Sawada ,  Satiko Okazaki ,  Masuhiro Kogoma

发明人： Hiroyuki Ishikawa ,  Hiroaki Usui ,  Yasushi Sawada ,  Satiko Okazaki ,  Masuhiro Kogoma

IPC分类号： B01J19/08 ,  B27K5/00

CPC分类号： B27K5/0055 ,  B27K3/0214 ,  H05H2240/10 ,  H05H2245/123

摘要： A surface treatment process for improving surface properties of a timber as to wetness by exposing the timber to a plasma mixture of an inert gas and a reactive gas at a near atmospheric pressure. Prior to being exposed to the plasma mixture, the timber is treated to reduce a moisture content below a fiber saturation point of the timber so as to eliminate free moisture from the fibers of the timber which would otherwise lead to unstable plasma and therefore detract an uniform improvement over substantially the entire surface expected at the subsequent exposure to the plasma mixture. Thus, the plasma treatment can be effected in the absence of the free moisture to obtain a desired surface improvement uniformly across the surface of the timber, which gives an enhanced practicability of improving the surface properties of the timber, in addition to that the plasma mixture is generated at near the atmospheric pressures readily available without requiring substantial vacuum generating equipments.

摘要翻译： 一种用于通过将木材暴露于接近大气压下的惰性气体和反应性气体的等离子体混合物来改善木材表面性能的表面处理方法。 在暴露于等离子体混合物之前，木材被处理以减少低于木材的纤维饱和点的水分含量，以消除木材纤维中的游离水分，否则会导致不稳定的等离子体，因此损害均匀 在随后暴露于等离子体混合物中预期的基本上整个表面的改进。 因此，等离子体处理可以在没有游离水分的情况下进行，以在木材的表面上均匀地获得期望的表面改进，这提高了改进木材表面性能的实用性，除了等离子体混合物 在大气压附近产生，而不需要大量的真空发生设备。

公开(公告)号：US06489585B1

公开(公告)日：2002-12-03

申请号：US09627405

申请日：2000-07-27

申请人： Kosuke Nakamura ,  Yasushi Sawada ,  Hiroaki Kitamura ,  Yoshitami Inoue

发明人： Kosuke Nakamura ,  Yasushi Sawada ,  Hiroaki Kitamura ,  Yoshitami Inoue

IPC分类号： B23K1000

CPC分类号： H01J37/32009 ,  H01J37/32559

摘要： A plasma treatment apparatus includes two or more pairs of electrodes for plasma generation, a treatment chamber for accommodating the electrodes, gas supply unit for supplying a plasma-generation gas such as rare gas into the chamber, and a power supply. A pulse-like or AC voltage is applied between the electrodes to generate dielectric barrier discharge plasma of the gas in the vicinity of atmospheric pressure, so that an object placed between the electrodes is treated by the plasma. At least one of the electrodes is provided with a tubular electrode substrate and a protection layer formed by heat-fusion coating a glass-based material on at least an outer surface exposed to plasma of the tubular electrode substrate.

摘要翻译： 等离子体处理装置包括用于等离子体生成的两对或更多对电极，用于容纳电极的处理室，用于向室供应诸如稀有气体的等离子体产生气体的气体供给单元和电源。 在电极之间施加脉冲状或交流电压，以在大气压附近产生气体的电介质势垒放电等离子体，使得放置在电极之间的物体被等离子体处理。 至少一个电极设置有管状电极基板和通过在暴露于管状电极基板的等离子体的至少外表面上热熔涂覆玻璃基材料形成的保护层。

公开(公告)号：US06424091B1

公开(公告)日：2002-07-23

申请号：US09421291

申请日：1999-10-20

申请人： Yasushi Sawada ,  Kosuke Nakamura ,  Hiroaki Kitamura ,  Yoshitami Inoue

发明人： Yasushi Sawada ,  Kosuke Nakamura ,  Hiroaki Kitamura ,  Yoshitami Inoue

IPC分类号： H01J724

CPC分类号： H01J37/32009 ,  H01J37/32348 ,  H01J37/32541 ,  H01J37/32559 ,  H01J37/32724 ,  H05H1/2406

摘要： A plasma treatment apparatus capable of efficiently performing a plasma treatment to a large area of an object while preventing the occurrence of streamer discharge is provided. The apparatus includes at least one pair of electrodes, gas supply unit for supplying a gas for plasma generation to a discharge space defined between the electrodes, and an electric power supply for applying an AC voltage between the electrodes to generate plasma of the gas for plasma generation in the discharge space. At least one of the pair of electrodes has a dielectric layer at an outer surface thereof. At least one of the pair of electrodes has a curved surface jutting into the discharge space. It is preferred that the electrodes are of a cylindrical structure. In this case, it is particularly preferred that the plasma treatment apparatus further includes a coolant supply unit for supplying a coolant to the interior of the electrodes to reduce an electrode temperature during the plasma treatment.

摘要翻译： 提供能够有效地对物体的大面积进行等离子体处理的等离子体处理装置，同时防止流光放电的发生。 该装置包括至少一对电极，用于将等离子体产生的气体供应到在电极之间限定的放电空间的气体供给单元和用于在电极之间施加AC电压的电源，以产生等离子体气体的等离子体 一代在放电空间。 该对电极中的至少一个在其外表面具有介电层。 所述一对电极中的至少一个具有突出到放电空间的弯曲表面。 电极优选为圆柱形结构。 在这种情况下，特别优选的是，等离子体处理装置还包括用于向电极内部供应冷却剂以在等离子体处理期间降低电极温度的冷却剂供应单元。

公开(公告)号：US20060042545A1

公开(公告)日：2006-03-02

申请号：US10529861

申请日：2004-05-26

申请人： Tetsuji Shibata ,  Keiichi Yamazaki ,  Noriyuki Taguchi ,  Yasushi Sawada

发明人： Tetsuji Shibata ,  Keiichi Yamazaki ,  Noriyuki Taguchi ,  Yasushi Sawada

IPC分类号： C23C16/00

CPC分类号： H01J37/32009 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32541 ,  H01J2237/3325

摘要： A plasma treatment apparatus is provided, which enables to increase a treatment area and provide good treatment uniformity. This apparatus comprises a pair of electrode plates having a plurality of through holes and an insulating plate having a plurality of through holes. The insulating plate is disposed between the electrode plates such that positions of the through holes of the electrode plates correspond to the positions of the through holes of the insulating plate. A plurality of discharge spaces are formed by the through holes of the electrode plates and the through holes of the insulating plate. By applying a voltage between the electrode plates, while supplying a plasma generation gas into the discharge spaces, plasmas are generated simultaneously in the discharge spaces, and sprayed on an object to efficiently perform a large-area, uniform plasma treatment.

摘要翻译： 提供了一种能够增加处理面积并提供良好的处理均匀性的等离子体处理装置。 该装置包括具有多个通孔的一对电极板和具有多个通孔的绝缘板。 绝缘板设置在电极板之间，使得电极板的通孔的位置对应于绝缘板的通孔的位置。 多个放电空间由电极板的通孔和绝缘板的通孔形成。 通过在电极板之间施加电压，在将等离子体产生气体供应到放电空间中的同时，在放电空间中同时产生等离子体，并喷射到物体上以有效地进行大面积均匀的等离子体处理。

公开(公告)号：US07543546B2

公开(公告)日：2009-06-09

申请号：US10529861

申请日：2004-05-26

申请人： Tetsuji Shibata ,  Keiichi Yamazaki ,  Noriyuki Taguchi ,  Yasushi Sawada

发明人： Tetsuji Shibata ,  Keiichi Yamazaki ,  Noriyuki Taguchi ,  Yasushi Sawada

IPC分类号： C23C16/00

CPC分类号： H01J37/32009 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32541 ,  H01J2237/3325

摘要： A plasma treatment apparatus is provided, which enables to increase a treatment area and provide good treatment uniformity. This apparatus comprises a pair of electrode plates having a plurality of through holes and an insulating plate having a plurality of through holes. The insulating plate is disposed between the electrode plates such that positions of the through holes of the electrode plates correspond to the positions of the through holes of the insulating plate. A plurality of discharge spaces are formed by the through holes of the electrode plates and the through holes of the insulating plate. By applying a voltage between the electrode plates, while supplying a plasma generation gas into the discharge spaces, plasmas are generated simultaneously in the discharge spaces, and sprayed on an object to efficiently perform a large-area, uniform plasma treatment.

摘要翻译： 提供了一种能够增加处理面积并提供良好的处理均匀性的等离子体处理装置。 该装置包括具有多个通孔的一对电极板和具有多个通孔的绝缘板。 绝缘板设置在电极板之间，使得电极板的通孔的位置对应于绝缘板的通孔的位置。 多个放电空间由电极板的通孔和绝缘板的通孔形成。 通过在电极板之间施加电压，在将等离子体产生气体供应到放电空间中的同时，在放电空间中同时产生等离子体，并喷射到物体上以有效地进行大面积均匀的等离子体处理。

公开(公告)号：US06670766B2

公开(公告)日：2003-12-30

申请号：US09863474

申请日：2001-05-24

申请人： Keiichi Yamazaki ,  Yukiko Inooka ,  Yasushi Sawada ,  Noriyuki Taguchi ,  Yoshiyuki Nakazono ,  Akio Nakano

发明人： Keiichi Yamazaki ,  Yukiko Inooka ,  Yasushi Sawada ,  Noriyuki Taguchi ,  Yoshiyuki Nakazono ,  Akio Nakano

IPC分类号： H01J724

CPC分类号： H01J37/32357

摘要： A plasma treatment apparatus and a plasma treatment method having the capability of uniformly treating an object with plasma at a high treatment speed. This apparatus includes a tubular vessel having a laterally elongated cross section, a pair of electrodes arranged such that electric flux lines develop substantially in an axial direction of the tubular vessel when one of an AC voltage and a pulse voltage is applied between the electrodes, a gas supply for supplying a streamer generation gas into the tubular vessel, a power source for applying the voltage between the electrodes to generate plural streamers of the gas in the tubular vessel, and a plasma uniformity mechanism for making the plural streamers uniform in a lateral direction of the laterally elongated cross section of the tubular vessel to provide the plasma from one end of the tubular vessel.

摘要翻译： 一种等离子体处理装置和等离子体处理方法，其具有以高处理速度等离子体均匀地处理物体的能力。 该装置包括具有横向细长横截面的管状容器，一对电极被布置为使得当在电极之间施加AC电压和脉冲电压之一时，电流线基本上沿管状容器的轴向方向显影，a 用于向管状容器供应流光产生气体的气体供给源，用于在电极之间施加电压的电源，以在管状容器中产生多个气流拖缆;以及等离子体均匀性机构，用于使多个拖缆在横向方向上均匀 的管状容器的横向细长的横截面以从管状容器的一端提供等离子体。

公开(公告)号：US06465964B1

公开(公告)日：2002-10-15

申请号：US09694324

申请日：2000-10-24

申请人： Noriyuki Taguchi ,  Yasushi Sawada ,  Keiichi Yamazaki ,  Yoshiyuki Nakazono ,  Yukiko Inooka ,  Kazuya Kitayama

发明人： Noriyuki Taguchi ,  Yasushi Sawada ,  Keiichi Yamazaki ,  Yoshiyuki Nakazono ,  Yukiko Inooka ,  Kazuya Kitayama

IPC分类号： H01J724

CPC分类号： H05H1/2406 ,  H05H2001/2456

摘要： A plasma treatment apparatus can generate atmospheric pressure plasma with reliability by help of an ignition electrode to facilitate starting the apparatus without using an expensive impedance matching device. The apparatus comprises a plasma-generation chamber having an aperture from which the plasma blows out, a gas supply unit for supplying a gas for plasma generation into the chamber, a pair of electrodes, a power source for applying an AC electric field between the electrodes to maintain the plasma in the chamber, a pulse generator for providing a pulse voltage, and the ignition electrode for applying the pulse voltage to the gas supplied in the chamber to generate the plasma.

摘要翻译： 等离子体处理装置可以通过点火电极的可靠性产生大气压等离子体，以便于在不使用昂贵的阻抗匹配装置的情况下启动装置。 该装置包括具有等离子体吹出的孔的等离子体生成室，用于将用于等离子体产生的气体供应到室中的气体供给单元，一对电​​极，用于在电极之间施加AC电场的电源 以维持腔室中的等离子体，用于提供脉冲电压的脉冲发生器和用于将脉冲电压施加到在腔室中供应的气体以产生等离子体的点火电极。

公开(公告)号：US06731874B2

公开(公告)日：2004-05-04

申请号：US10172811

申请日：2002-06-14

申请人： Hideaki Tsushima ,  Shigeki Kitajima ,  Yasushi Sawada

发明人： Hideaki Tsushima ,  Shigeki Kitajima ,  Yasushi Sawada

IPC分类号： H04B1008

CPC分类号： H04B10/0731 ,  H01S3/10015 ,  H01S3/1301 ,  H04Q11/0001 ,  H04Q11/0005 ,  H04Q11/0062 ,  H04Q2011/0039 ,  H04Q2011/0049 ,  H04Q2011/0069 ,  H04Q2011/0083

摘要： An optical transmission apparatus, an optical repeater using the optical transmission apparatus, and an optical cross-connect equipment for controlling switches depending on supervisory information, comprising: a doped fiber for amplifying an optical signal of wavelength Od; a wavelength multiplexer for outputting a pumping light to the doped fiber; a wavelength multiplexer for multiplexing an amplified optical signal and a supervisory optical signal to as to output it to an optical fiber at downstream side; a pumping and supervisory light source; an optical coupler for distributing the light from the light source at a ratio of N:1 to the wavelength multiplexers; and a driver for controlling the light source by adding the supervisory information and a direct current signal.

摘要翻译： 光传输装置，使用该光传输装置的光中继器，以及根据监控信息控制开关的光交叉连接设备，包括：用于放大波长为λ的光信号的掺杂光纤; 波长多路复用器，用于向掺杂光纤输出泵浦光; 用于将放大的光信号和监视光信号复用以将其输出到下游侧的光纤的波长多路复用器; 泵浦和监控光源; 光耦合器，用于将来自光源的光以N:1的比率分配给波长多路复用器; 以及通过添加监视信息和直流信号来控制光源的驱动器。

公开(公告)号：US4985225A

公开(公告)日：1991-01-15

申请号：US273761

申请日：1988-08-22

申请人： Noboru Hashimoto ,  Yasushi Sawada ,  Hiroyoshi Yoden ,  Shigehito Deki ,  Hisamitsu Takahashi

发明人： Noboru Hashimoto ,  Yasushi Sawada ,  Hiroyoshi Yoden ,  Shigehito Deki ,  Hisamitsu Takahashi

IPC分类号： C01B21/072

CPC分类号： C01B21/0726 ,  C01P2004/62 ,  C01P2006/10 ,  C01P2006/32

摘要： A process for producing aluminum nitride powders is disclosed, which comprises mixing a water-soluble aluminum-containing compound or an aluminum alkoxide and a water-soluble carbon-containing compound and/or a water-soluble nitrogen-containing compound, with water; drying the mixture to obtain a solid; and calcining the solid in a nitrogen-containing non-oxidative atmosphere. According to the process of the invention, high-purity uniform aluminum nitride fine powders can be obtained rapidly and inexpensively.

摘要翻译： 公开了一种制备氮化铝粉末的方法，其包括将水溶性含铝化合物或烷氧基铝与水溶性含碳化合物和/或水溶性含氮化合物与水混合; 干燥混合物得到固体; 并将固体在含氮非氧化性气氛中煅烧。 根据本发明的方法，可以快速且廉价地获得高纯度均匀的氮化铝细粉。