公开(公告)号：US06447576B1

公开(公告)日：2002-09-10

申请号：US09671139

申请日：2000-09-28

申请人： Kenji Otsuka ,  Yutaka Amijima ,  Ryuji Hasemi ,  Youji Nawa

发明人： Kenji Otsuka ,  Yutaka Amijima ,  Ryuji Hasemi ,  Youji Nawa

IPC分类号： B01D5302

CPC分类号： B01J20/28057 ,  B01D53/02 ,  B01D53/46 ,  B01D2257/706 ,  B01J20/0237 ,  B01J20/06 ,  C23C16/4412

摘要： A cleaning agent and a cleaning process for cleaning a harmful gas containing, as a harmful component, an organometallic compound represented by the general formula: Rm—M—Hn wherein R is alkyl; M is As, P, S, Se or Te; and m and n are each positive integer satisfying the relation: m+n=valence of M are described. The cleaning agent contains, as an effective component, copper (II) oxide or a mixture of copper (II) oxide and manganese dioxide. The copper (II) oxide has a BET specific surface area of 10 m2/g or greater which is extremely larger than that of copper (II) oxide conventionally used as the effective component of known cleaning agents. With such an extremely large BET specific surface area, the cleaning agent strongly and stably adsorbs the harmful organometallic compound, thereby efficiently cleaning the harmful gas without causing desorption of the adsorbed organometallic compound.

摘要翻译： 一种清洁剂和清洁方法，用于清洗含有由以下通式表示的有机金属化合物作为有害成分的有害气体：其中R是烷基; M为As，P，S，Se或Te; m和n分别为满足关系式的正整数：m + n = M的化合价。 清洁剂含有氧化铜（II）或氧化铜（II）和二氧化锰的混合物作为有效成分。 氧化铜（II）具有10m 2 / g以上的BET比表面积，其比通常用作已知清洁剂的有效成分的铜（II）氧化物的BET比表面积大得多。 通过这样一个非常大的BET比表面积，清洗剂强烈稳定地吸附有害的有机金属化合物，从而有效地清洗有害气体而不引起吸附的有机金属化合物的解吸附。

公开(公告)号：US5756060A

公开(公告)日：1998-05-26

申请号：US740855

申请日：1996-11-04

申请人： Kenji Otsuka ,  Satoshi Arakawa ,  Youji Nawa

发明人： Kenji Otsuka ,  Satoshi Arakawa ,  Youji Nawa

IPC分类号： B01D53/34 ,  B01D53/68 ,  B01D53/86

CPC分类号： B01D53/68 ,  B01D53/8659

摘要： A process for cleaning a harmful gas which comprises bringing a harmful gas containing a halogen gas and/or a halogen compound gas such as hydrogen fluoride, hydrogen chloride, tungsten hexafluoride, silicon tetrafluoride and boron trifluoride into contact with a cleaning agent comprising metal oxides composed principally of copper (II) oxide and manganese (IV) oxide that are spreadingly and adhesively incorporated with sodium formate so as to remove a harmful component from the harmful gas. According to the cleaning process of the present invention, it is possible to remove harmful components from the harmful gas in extremely high efficiency at ordinary temperature, dispensing with heating or cooling irrespective of the concentration of the harmful components. The cleaning capacity of the cleaning agent is favorably maintained without deterioration even when the harmful gas is in a dry state. Furthermore, the cleaning agent can remove the harmful gas in safety without a fear of causing fire or elimination of the harmful component therefrom. The cleaning process is highly useful and significant in that it is well suited for cleaning exhaust gases from a semiconductor manufacturing process as well as an emergency countermeasure against the leakage of harmful gas from a gas cylinder.

摘要翻译： 一种清洁有害气体的方法，包括使含有卤素气体和/或卤素化合物气体如氟化氢，氯化氢，六氟化钨，四氟化硅和三氟化硼的有害气体与包含金属氧化物的清洗剂接触 主要是氧化铜（II）和氧化锰（IV），它们与甲酸钠扩散并粘合并入，以便从有害气体中除去有害成分。 根据本发明的清洗方法，可以在常温下以非常高的效率从有害气体中除去有害成分，而不管有害成分的浓度如何，分配加热或冷却。 即使当有害气体处于干燥状态时，清洁剂的清洁能力也被有利地保持而不劣化。 此外，清洁剂可以安全地除去有害气体，而不用担心引起火灾或从中消除有害成分。 清洁过程是非常有用和重要的，因为它非常适合于清洁半导体制造过程中的废气以及应对措施，防止来自气瓶的有害气体的泄漏。

公开(公告)号：US06638489B2

公开(公告)日：2003-10-28

申请号：US09956808

申请日：2001-09-21

申请人： Kenji Otsuka ,  Yukichi Takamatsu ,  Youji Nawa ,  Kazuaki Tonari

发明人： Kenji Otsuka ,  Yukichi Takamatsu ,  Youji Nawa ,  Kazuaki Tonari

IPC分类号： A62D300

CPC分类号： B01D53/72

摘要： There are disclosed a process for cleaning a harmful gas which comprises bringing the harmful gas containing as a harmful component, an organosilicon compound represented by the general formula: CH2CH—SiR3, CH2CH—Si(OR)3, CH2CHCH2—SiR3 or CH2CHCH2—Si(OR)3, wherein R indicates a saturated hydrocarbon group or an aromatic compound group, into contact with a cleaning agent comprising activated carbon adhesively incorporated with at least one species selected from the group consisting of bromine, iodine, a metal bromide and a metal iodide in which the metal is exemplified by copper, lithium, sodium, potassium, magnesium, calcium, strontium, manganese, iron, cobalt, nickel, zinc, aluminum and tin; and a cleaning agent comprising the same. The cleaning process and the cleaning agent enable to practically clean a harmful gas which is exhausted from a semiconductor manufacturing process and the like by the use of a dry cleaning process.

摘要翻译： 公开了一种清洁有害气体的方法，该方法包括使含有有害成分的有害气体，由通式：CH 2 CH-SiR 3，CH 2 CH-Si（OR）3，CH 2 CHCH 2 -SiR 3或CH 2 CHCH 2 -Si表示的有机硅化合物 （OR）3，其中R表示饱和烃基或芳族化合物基团，与包含活性炭的清洁剂接触，所述活性炭与至少一种选自溴，碘，金属溴化物和金属的物质粘合 碘化物，其中金属以铜，锂，钠，钾，镁，钙，锶，锰，铁，钴，镍，锌，铝和锡为例; 和包含该清洁剂的清洁剂。 清洁处理和清洁剂能够通过使用干洗方法几乎清洁从半导体制造工艺等排出的有害气体。

公开(公告)号：US06960552B2

公开(公告)日：2005-11-01

申请号：US10254665

申请日：2002-09-26

申请人： Kenji Otsuka ,  Youji Nawa ,  Tomohisa Ikeda ,  Koshi Ochi

发明人： Kenji Otsuka ,  Youji Nawa ,  Tomohisa Ikeda ,  Koshi Ochi

IPC分类号： B01D39/06 ,  B01D53/86 ,  B01J21/04 ,  B01J23/10 ,  B01J35/00 ,  B01J23/00 ,  A62D3/00 ,  B01D47/00 ,  B01J23/02 ,  B01J23/08

CPC分类号： B01J23/10 ,  B01D53/86 ,  B01D53/8662 ,  B01D2255/204 ,  B01D2255/206 ,  B01D2255/2092 ,  B01D2257/2066 ,  B01J21/04 ,  B01J35/0006 ,  Y02C20/30

摘要： There are disclosed a decompositionally treating agent for fluorocarbons which comprises an aluminum compound and a lanthanoid compound as effective ingredients; a decompositionally treating agent for fluorocarbons which comprises an aluminum compound, a lanthanoid compound and an alkaline earth metal compound as effective ingredients; and a decompositionally treating method for fluorocarbons which comprises decomposing a fluorocarbon by bringing a fluorocarbon-containing gas into contact under heating with a decompositionally treating agent mentioned above or by bringing the above gas into contact under heating with a decompositionally treating agent comprising aluminum oxide as an effective ingredient and thereafter with a decompositionally treating agent comprising a lanthanoid oxide and an alkaline earth metal oxide. It is made possible by the above agent and method to decompose the fluorocarbons contained in an exhaust gas exhausted from a semiconductor manufacturing industry and the like at a decomposition rate of at least 99.9% at a relatively low decomposition temperature of 1000° C. or lower without deactivating the agent in a short time, or exhausting a corrosive gas such as hydrogen fluoride in the atmosphere.

摘要翻译： 公开了一种碳氟化合物的分解处理剂，其包含铝化合物和镧系化合物作为有效成分; 一种碳氟化合物的分解处理剂，其包含铝化合物，镧系元素化合物和碱土金属化合物作为有效成分; 以及碳氟化合物的分解处理方法，其包括通过在上述分解处理剂的加热下使含碳氟化合物的气体接触而使含碳氟化合物分解，或者通过在加热下将上述气体与包含氧化铝的分解处理剂接触来分解碳氟化合物 然后用含有镧系元素氧化物和碱土金属氧化物的分解处理剂。 通过上述试剂和方法可以在1000℃或更低的相对较低的分解温度下分解从半导体制造业等排出的废气中所含的碳氟化合物的分解速率至少为99.9％ 而不会在短时间内使试剂失活，或在大气中排出诸如氟化氢的腐蚀性气体。

公开(公告)号：US5935540A

公开(公告)日：1999-08-10

申请号：US61976

申请日：1998-04-17

申请人： Kenji Otsuka ,  Youji Nawa

发明人： Kenji Otsuka ,  Youji Nawa

IPC分类号： B01D53/86 ,  B01J8/00 ,  B01D53/54 ,  B01D53/68

CPC分类号： B01D53/8659

摘要： There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gas containing at least one member selected from the group consisting of nitrogen fluorides, tungsten fluorides, silicon fluorides, hydrogen fluoride and fluorine, especially nitrogen trifluoride into contact with a cleaning agent comprising stannous oxide as an effective ingredient at a temperature of 200.degree. C. at the lowest. The above process makes it possible to clean the harmful gas in a high performance at a relatively low temperature without by-producing a harmful gas or a gas with a fear of causing environmental pollution.

摘要翻译： 公开了一种清洁有害气体的方法，该方法包括将含有选自氮氟化物，氟化钨，氟化硅，氟化氢和氟，特别是三氟化氮中的至少一种的有害气体与清洗剂接触 在200℃的最低温度下，将氧化亚锡作为有效成分。 上述方法使得可以在相对低的温度下高效地清洁有害气体，而不会产生有害气体或担心产生环境污染的气体。

公开(公告)号：US5833882A

公开(公告)日：1998-11-10

申请号：US866961

申请日：1997-06-02

申请人： Takashi Shimada ,  Youji Nawa

发明人： Takashi Shimada ,  Youji Nawa

IPC分类号： G01N31/22 ,  G01N21/77 ,  G01N21/80 ,  G08B17/117

CPC分类号： G01N31/223

摘要： A detecting agent for detecting at least one member selected from the group consisting of halogen gases and acidic gases which is contained in a gas, wherein the detecting agent comprises a discoloring component which comprises a hydroxide of a transition metal and Congo Red. Halogen gases and acidic gases which are contained in hydrogen, nitrogen, argon, or helium can be detected under a dry condition with a high sensitivity in accordance with the present invention.

摘要翻译： 一种用于检测选自由气体中包含的卤素气体和酸性气体组成的组中的至少一种的检测剂，其中所述检测剂包括包含过渡金属的氢氧化物和刚果红的变色组分。 可以在根据本发明的高灵敏度的干燥条件下检测氢，氮，氩或氦中所含的卤素气体和酸性气体。

公开(公告)号：US5665313A

公开(公告)日：1997-09-09

申请号：US511681

申请日：1995-08-07

申请人： Takashi Shimada ,  Masako Yamakawa ,  Youji Nawa

发明人： Takashi Shimada ,  Masako Yamakawa ,  Youji Nawa

IPC分类号： G01N31/22 ,  G01N33/52

CPC分类号： G01N31/224 ,  Y10T436/16 ,  Y10T436/172307

摘要： A detecting agent for hydride gases (arsine, phosphine, silane, diborane, selenium hydride etc.) which comprises at least one member selected from molybdic acid, a salt thereof, a molybdenum-containing acid (molybdophosphoric acid, etc.) and a salt thereof, and optionally a cupric salt each as a discoloring component being supported on an inorganic carrier (silica, alumina, silica-alumina, zirconia, etc.). The above detecting agent can detect the above hydride gases contained in the exhaust gas discharged from a semiconductor manufacturing process, with high accuracy, selectivity and sensitivity at a high discoloring rate without being influenced by other gases such as hydrogen gas.

摘要翻译： 含有选自钼酸，其盐，含钼酸（钼磷酸等）中的至少一种的氢化物气体（胂，膦，硅烷，乙硼烷，硒化氢等）的检测剂 和任选的作为褪色成分负载在无机载体（二氧化硅，氧化铝，二氧化硅 - 氧化铝，氧化锆等）上的铜盐）。 上述检测剂可以在高变色条件下以高精度，选择性和灵敏度从半导体制造工艺中排出的废气中所含的上述氢化物气体，而不受诸如氢气等其它气体的影响。