公开(公告)号：US06960552B2

公开(公告)日：2005-11-01

申请号：US10254665

申请日：2002-09-26

申请人： Kenji Otsuka ,  Youji Nawa ,  Tomohisa Ikeda ,  Koshi Ochi

发明人： Kenji Otsuka ,  Youji Nawa ,  Tomohisa Ikeda ,  Koshi Ochi

IPC分类号： B01D39/06 ,  B01D53/86 ,  B01J21/04 ,  B01J23/10 ,  B01J35/00 ,  B01J23/00 ,  A62D3/00 ,  B01D47/00 ,  B01J23/02 ,  B01J23/08

CPC分类号： B01J23/10 ,  B01D53/86 ,  B01D53/8662 ,  B01D2255/204 ,  B01D2255/206 ,  B01D2255/2092 ,  B01D2257/2066 ,  B01J21/04 ,  B01J35/0006 ,  Y02C20/30

摘要： There are disclosed a decompositionally treating agent for fluorocarbons which comprises an aluminum compound and a lanthanoid compound as effective ingredients; a decompositionally treating agent for fluorocarbons which comprises an aluminum compound, a lanthanoid compound and an alkaline earth metal compound as effective ingredients; and a decompositionally treating method for fluorocarbons which comprises decomposing a fluorocarbon by bringing a fluorocarbon-containing gas into contact under heating with a decompositionally treating agent mentioned above or by bringing the above gas into contact under heating with a decompositionally treating agent comprising aluminum oxide as an effective ingredient and thereafter with a decompositionally treating agent comprising a lanthanoid oxide and an alkaline earth metal oxide. It is made possible by the above agent and method to decompose the fluorocarbons contained in an exhaust gas exhausted from a semiconductor manufacturing industry and the like at a decomposition rate of at least 99.9% at a relatively low decomposition temperature of 1000° C. or lower without deactivating the agent in a short time, or exhausting a corrosive gas such as hydrogen fluoride in the atmosphere.

摘要翻译： 公开了一种碳氟化合物的分解处理剂，其包含铝化合物和镧系化合物作为有效成分; 一种碳氟化合物的分解处理剂，其包含铝化合物，镧系元素化合物和碱土金属化合物作为有效成分; 以及碳氟化合物的分解处理方法，其包括通过在上述分解处理剂的加热下使含碳氟化合物的气体接触而使含碳氟化合物分解，或者通过在加热下将上述气体与包含氧化铝的分解处理剂接触来分解碳氟化合物 然后用含有镧系元素氧化物和碱土金属氧化物的分解处理剂。 通过上述试剂和方法可以在1000℃或更低的相对较低的分解温度下分解从半导体制造业等排出的废气中所含的碳氟化合物的分解速率至少为99.9％ 而不会在短时间内使试剂失活，或在大气中排出诸如氟化氢的腐蚀性气体。

公开(公告)号：US06447576B1

公开(公告)日：2002-09-10

申请号：US09671139

申请日：2000-09-28

申请人： Kenji Otsuka ,  Yutaka Amijima ,  Ryuji Hasemi ,  Youji Nawa

发明人： Kenji Otsuka ,  Yutaka Amijima ,  Ryuji Hasemi ,  Youji Nawa

IPC分类号： B01D5302

CPC分类号： B01J20/28057 ,  B01D53/02 ,  B01D53/46 ,  B01D2257/706 ,  B01J20/0237 ,  B01J20/06 ,  C23C16/4412

摘要： A cleaning agent and a cleaning process for cleaning a harmful gas containing, as a harmful component, an organometallic compound represented by the general formula: Rm—M—Hn wherein R is alkyl; M is As, P, S, Se or Te; and m and n are each positive integer satisfying the relation: m+n=valence of M are described. The cleaning agent contains, as an effective component, copper (II) oxide or a mixture of copper (II) oxide and manganese dioxide. The copper (II) oxide has a BET specific surface area of 10 m2/g or greater which is extremely larger than that of copper (II) oxide conventionally used as the effective component of known cleaning agents. With such an extremely large BET specific surface area, the cleaning agent strongly and stably adsorbs the harmful organometallic compound, thereby efficiently cleaning the harmful gas without causing desorption of the adsorbed organometallic compound.

摘要翻译： 一种清洁剂和清洁方法，用于清洗含有由以下通式表示的有机金属化合物作为有害成分的有害气体：其中R是烷基; M为As，P，S，Se或Te; m和n分别为满足关系式的正整数：m + n = M的化合价。 清洁剂含有氧化铜（II）或氧化铜（II）和二氧化锰的混合物作为有效成分。 氧化铜（II）具有10m 2 / g以上的BET比表面积，其比通常用作已知清洁剂的有效成分的铜（II）氧化物的BET比表面积大得多。 通过这样一个非常大的BET比表面积，清洗剂强烈稳定地吸附有害的有机金属化合物，从而有效地清洗有害气体而不引起吸附的有机金属化合物的解吸附。

公开(公告)号：US06638489B2

公开(公告)日：2003-10-28

申请号：US09956808

申请日：2001-09-21

申请人： Kenji Otsuka ,  Yukichi Takamatsu ,  Youji Nawa ,  Kazuaki Tonari

发明人： Kenji Otsuka ,  Yukichi Takamatsu ,  Youji Nawa ,  Kazuaki Tonari

IPC分类号： A62D300

CPC分类号： B01D53/72

摘要： There are disclosed a process for cleaning a harmful gas which comprises bringing the harmful gas containing as a harmful component, an organosilicon compound represented by the general formula: CH2CH—SiR3, CH2CH—Si(OR)3, CH2CHCH2—SiR3 or CH2CHCH2—Si(OR)3, wherein R indicates a saturated hydrocarbon group or an aromatic compound group, into contact with a cleaning agent comprising activated carbon adhesively incorporated with at least one species selected from the group consisting of bromine, iodine, a metal bromide and a metal iodide in which the metal is exemplified by copper, lithium, sodium, potassium, magnesium, calcium, strontium, manganese, iron, cobalt, nickel, zinc, aluminum and tin; and a cleaning agent comprising the same. The cleaning process and the cleaning agent enable to practically clean a harmful gas which is exhausted from a semiconductor manufacturing process and the like by the use of a dry cleaning process.

摘要翻译： 公开了一种清洁有害气体的方法，该方法包括使含有有害成分的有害气体，由通式：CH 2 CH-SiR 3，CH 2 CH-Si（OR）3，CH 2 CHCH 2 -SiR 3或CH 2 CHCH 2 -Si表示的有机硅化合物 （OR）3，其中R表示饱和烃基或芳族化合物基团，与包含活性炭的清洁剂接触，所述活性炭与至少一种选自溴，碘，金属溴化物和金属的物质粘合 碘化物，其中金属以铜，锂，钠，钾，镁，钙，锶，锰，铁，钴，镍，锌，铝和锡为例; 和包含该清洁剂的清洁剂。 清洁处理和清洁剂能够通过使用干洗方法几乎清洁从半导体制造工艺等排出的有害气体。

公开(公告)号：US5756060A

公开(公告)日：1998-05-26

申请号：US740855

申请日：1996-11-04

申请人： Kenji Otsuka ,  Satoshi Arakawa ,  Youji Nawa

发明人： Kenji Otsuka ,  Satoshi Arakawa ,  Youji Nawa

IPC分类号： B01D53/34 ,  B01D53/68 ,  B01D53/86

CPC分类号： B01D53/68 ,  B01D53/8659

摘要： A process for cleaning a harmful gas which comprises bringing a harmful gas containing a halogen gas and/or a halogen compound gas such as hydrogen fluoride, hydrogen chloride, tungsten hexafluoride, silicon tetrafluoride and boron trifluoride into contact with a cleaning agent comprising metal oxides composed principally of copper (II) oxide and manganese (IV) oxide that are spreadingly and adhesively incorporated with sodium formate so as to remove a harmful component from the harmful gas. According to the cleaning process of the present invention, it is possible to remove harmful components from the harmful gas in extremely high efficiency at ordinary temperature, dispensing with heating or cooling irrespective of the concentration of the harmful components. The cleaning capacity of the cleaning agent is favorably maintained without deterioration even when the harmful gas is in a dry state. Furthermore, the cleaning agent can remove the harmful gas in safety without a fear of causing fire or elimination of the harmful component therefrom. The cleaning process is highly useful and significant in that it is well suited for cleaning exhaust gases from a semiconductor manufacturing process as well as an emergency countermeasure against the leakage of harmful gas from a gas cylinder.

摘要翻译： 一种清洁有害气体的方法，包括使含有卤素气体和/或卤素化合物气体如氟化氢，氯化氢，六氟化钨，四氟化硅和三氟化硼的有害气体与包含金属氧化物的清洗剂接触 主要是氧化铜（II）和氧化锰（IV），它们与甲酸钠扩散并粘合并入，以便从有害气体中除去有害成分。 根据本发明的清洗方法，可以在常温下以非常高的效率从有害气体中除去有害成分，而不管有害成分的浓度如何，分配加热或冷却。 即使当有害气体处于干燥状态时，清洁剂的清洁能力也被有利地保持而不劣化。 此外，清洁剂可以安全地除去有害气体，而不用担心引起火灾或从中消除有害成分。 清洁过程是非常有用和重要的，因为它非常适合于清洁半导体制造过程中的废气以及应对措施，防止来自气瓶的有害气体的泄漏。

公开(公告)号：US5935540A

公开(公告)日：1999-08-10

申请号：US61976

申请日：1998-04-17

申请人： Kenji Otsuka ,  Youji Nawa

发明人： Kenji Otsuka ,  Youji Nawa

IPC分类号： B01D53/86 ,  B01J8/00 ,  B01D53/54 ,  B01D53/68

CPC分类号： B01D53/8659

摘要： There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gas containing at least one member selected from the group consisting of nitrogen fluorides, tungsten fluorides, silicon fluorides, hydrogen fluoride and fluorine, especially nitrogen trifluoride into contact with a cleaning agent comprising stannous oxide as an effective ingredient at a temperature of 200.degree. C. at the lowest. The above process makes it possible to clean the harmful gas in a high performance at a relatively low temperature without by-producing a harmful gas or a gas with a fear of causing environmental pollution.

摘要翻译： 公开了一种清洁有害气体的方法，该方法包括将含有选自氮氟化物，氟化钨，氟化硅，氟化氢和氟，特别是三氟化氮中的至少一种的有害气体与清洗剂接触 在200℃的最低温度下，将氧化亚锡作为有效成分。 上述方法使得可以在相对低的温度下高效地清洁有害气体，而不会产生有害气体或担心产生环境污染的气体。

公开(公告)号：US06579509B1

公开(公告)日：2003-06-17

申请号：US09716401

申请日：2000-11-21

申请人： Kenji Otsuka ,  Naoki Muranaga ,  Satoshi Arakawa ,  Tomohisa Ikeda

发明人： Kenji Otsuka ,  Naoki Muranaga ,  Satoshi Arakawa ,  Tomohisa Ikeda

IPC分类号： A62D300

CPC分类号： B01D53/8668 ,  B01D2251/102

摘要： Disclosed is a method for cleaning of the harmful gas, the method comprising mixing harmful gas, discharged from reaction processes using organic metal compounds as the reaction raw materials, with oxygen or air and thereafter bringing the mixture into contact with a catalyst obtained by carrying a noble metal on an inorganic support, a catalyst comprising at least one metal oxide selected from vanadium oxide, chromium oxide, manganese oxide, iron oxide, copper oxide, silver oxide, cobalt oxide and nickel oxide or a catalyst obtained by carrying the metal oxide on an inorganic support, at temperatures between 100° C. and 800° C. to clean the harmful gas. Disclosed also is an apparatus used in the method. The invention ensures that harmful components can be purified in an efficient manner without discharging organic compounds and a large amount of carbon dioxide after the harmful gas is purified, requiring no aftertreatment.

摘要翻译： 公开了一种清洁有害气体的方法，该方法包括将有机金属化合物作为反应原料的反应过程排出的有害气体与氧气或空气混合，然后使混合物与通过携带 在无机载体上的贵金属，包含选自氧化钒，氧化铬，氧化锰，氧化铁，氧化铜，氧化银，氧化钴和氧化镍中的至少一种金属氧化物的催化剂或通过将金属氧化物载带 无机载体，在100℃和800℃之间的温度下，以清洁有害气体。 还公开了一种在该方法中使用的装置。 本发明可确保有害成分在有害气体净化后不会排出有机化合物和大量二氧化碳，而不会有效地进行净化，不需要后处理。

公开(公告)号：US06749819B2

公开(公告)日：2004-06-15

申请号：US09907946

申请日：2001-07-19

申请人： Kenji Otsuka ,  Satoshi Arawaka ,  Takashi Kasaya ,  Tomohisa Ikeda

发明人： Kenji Otsuka ,  Satoshi Arawaka ,  Takashi Kasaya ,  Tomohisa Ikeda

IPC分类号： C01B3120

CPC分类号： C23C16/4402 ,  C01C1/024 ,  Y02P20/52

摘要： There are disclosed a process for purifying ammonia which comprises bringing crude ammonia into contact with a catalyst comprising manganese oxide as an effective ingredient to remove oxygen and/or carbon dioxide that are contained as impurities in the ammonia, and a process for purifying ammonia which comprises bringing crude ammonia into contact with a catalyst comprising manganese oxide as an effective ingredient, and thereafter with a synthetic zeolite having a pore diameter in the range of 4 to 10 Å to remove at least one impurity selected from the group consisting of oxygen, carbon dioxide and moisture that are contained in the crude ammonia. It is made possible by the above process to remove impurities to an extremely low concentration from crude ammonia available on the market for industrial use and crude ammonia from a gallium nitride compound semi-conductor without decomposition of ammonia to generate hydrogen.

摘要翻译： 公开了一种净化氨的方法，其包括使粗氨与包含氧化锰的催化剂作为有效成分接触，以除去作为氨中的杂质的氧和/或二氧化碳，以及净化氨的方法，其包括 使粗氨与包含氧化锰作为有效成分的催化剂接触，然后用孔直径在4至的范围内的合成沸石除去选自氧，二氧化碳中的至少一种杂质 和含有在粗氨中的水分。 通过上述方法可以将工业用市场上可得到的粗氨和来自氮化镓化合物半导体的粗氨的杂质从不分解氨分解而产生氢气去除极低浓度。

公开(公告)号：US07868984B2

公开(公告)日：2011-01-11

申请号：US11958774

申请日：2007-12-18

申请人： Hongyong Zhang ,  Yoshiharu Hirakata ,  Kenji Otsuka ,  Shunpei Yamazaki ,  Hideaki Kuwabara

发明人： Hongyong Zhang ,  Yoshiharu Hirakata ,  Kenji Otsuka ,  Shunpei Yamazaki ,  Hideaki Kuwabara

IPC分类号： G02F1/1368 ,  G02F1/139 ,  G02F1/1343

CPC分类号： G02F1/134363 ,  G02F1/136286 ,  G02F2001/136295

摘要： In a liquid crystal display device, gate lines and common lines are first concurrently formed, and after an interlayer film is formed, a pixel electrode, common electrodes, and source lines are formed at the same time. By this, a electrode pattern can be made simple and manufacturing steps are simplified. Further, wiring lines and electrode disposed in the layer closest to a liquid crystal layer are made the pixel electrode, common electrodes and source lines, and the shapes thereof are made simple.

摘要翻译： 在液晶显示装置中，首先同时形成栅极线和公共线，并且在形成层间膜之后，同时形成像素电极，公共电极和源极线。 由此，可以使电极图案简单，并且简化制造步骤。 此外，布置在最靠近液晶层的层中的布线和电极被制成像素电极，公共电极和源极线，并且其形状变得简单。

公开(公告)号：US20100313754A1

公开(公告)日：2010-12-16

申请号：US12525990

申请日：2007-12-18

申请人： Eiji Okada ,  Jun Yoshihara ,  Futoshi Ikoma ,  Noboru Takemasa ,  Tatsunori Tayama ,  Kenji Otsuka

发明人： Eiji Okada ,  Jun Yoshihara ,  Futoshi Ikoma ,  Noboru Takemasa ,  Tatsunori Tayama ,  Kenji Otsuka

IPC分类号： B01D53/22

CPC分类号： B01D71/022 ,  B01D53/228 ,  B01D67/0044 ,  B01D67/0069 ,  B01D67/0072 ,  B01D69/02 ,  B01D2256/16 ,  B01D2257/102 ,  B01D2257/502 ,  B01D2257/504 ,  B01D2257/7022 ,  B01D2257/80 ,  B01D2325/06 ,  C01B3/32 ,  C01B3/505 ,  C01B2203/0233 ,  C01B2203/0244 ,  C01B2203/025 ,  C01B2203/0266 ,  C01B2203/0405 ,  C01B2203/0465 ,  C01B2203/047 ,  C01B2203/0475 ,  C01B2203/048 ,  C01B2203/0495 ,  C01B2203/1211 ,  C01B2203/1217 ,  C01B2203/1235 ,  Y02C10/10 ,  Y02P20/152

摘要： Provided are a method of efficient separation/purification of hydrogen from a hydrogen-containing gas that contains, in addition to hydrogen, at least one component of water, carbon monoxide, carbon dioxide, methane and nitrogen in an amount of at least 1% where the hydrogen permeability is kept high; a hydrogen separation membrane for use in the method; and a hydrogen purification apparatus.The hydrogen purification method for separation/purification of hydrogen from a hydrogen-containing gas that contains at least one component of water, carbon monoxide, carbon dioxide, methane and nitrogen in an amount of at least 1% is characterized by using a hydrogen separation membrane produced by adhering fine particles of palladium to the surface of a palladium alloy membrane; the hydrogen separation membrane is for use for the method; and the hydrogen purification apparatus comprises the membrane.

摘要翻译： 提供了一种从含氢气体中有效地分离/纯化氢气的方法，除了氢以外还含有至少1％的水，一氧化碳，二氧化碳，甲烷和氮的至少一种组分，其含量至少为1％，其中 氢气渗透率保持较高; 用于该方法的氢分离膜; 和氢气净化装置。 用于从含有至少1％的水，一氧化碳，二氧化碳，甲烷和氮的至少一种组分的含氢气体中分离/纯化氢的氢气纯化方法的特征在于使用氢分离膜 通过将钯的细颗粒附着到钯合金膜的表面上而产生; 氢分离膜用于该方法; 并且氢气净化装置包括膜。

公开(公告)号：US20090196696A1

公开(公告)日：2009-08-06

申请号：US12159174

申请日：2006-12-13

申请人： Kenji Otsuka ,  Osamu Asano

发明人： Kenji Otsuka ,  Osamu Asano

IPC分类号： B23B39/24

CPC分类号： B23B45/02 ,  B23B2260/062 ,  B23B2260/122 ,  B23B2270/32 ,  B25H1/0071 ,  G05B19/4062 ,  G05B2219/37285 ,  G05B2219/37342 ,  G05B2219/42286 ,  G05B2219/42289 ,  G05B2219/45127 ,  Y10S388/937 ,  Y10T408/14

摘要： It is an object of the present invention to prevent recurrence of an overload condition after occurrence of the overload condition, thereby improving operability and safety in a drilling device. A motor 12 for rotating a drill is connected to an AC power source 10 through a motor control unit 28, a current detector 30, and a power switch 36. A magnet 16 is also connected to the AC power source 10 through the power switch 36 and a full-wave rectifier 18. The motor control unit 28 rotationally drives the motor on the basis of a signal sent from a main control unit according to a state in which a motor start switch 38 is on. The main control unit 14 controls the motor control unit 28 to gradually reduce a supply voltage to the motor 12 when the motor 12 becomes overloaded, to gradually increase the voltage to the normal power supply condition when the overload condition is vanished, and to stop power supply to the motor 12 if the overload condition continues for a predetermined period.

摘要翻译： 本发明的目的是防止在发生过载状态之后再次发生过载状况，从而提高了钻井装置的可操作性和安全性。 用于旋转钻机的电动机12通过电动机控制单元28，电流检测器30和电源开关36连接到AC电源10.磁体16还通过电源开关36连接到AC电源10 和全波整流器18.电动机控制单元28根据电动机启动开关38接通的状态，基于从主控制单元发送的信号旋转驱动电动机。 主控制单元14控制电动机控制单元28，当电动机12变得过载时，逐渐降低对电动机12的供电电压，当过载状况消失时，电压逐渐升高到正常供电状态，并停止供电 如果过载状态持续一段预定时间，则供给电动机12。