公开(公告)号：US08881996B2

公开(公告)日：2014-11-11

申请号：US12883433

申请日：2010-09-16

申请人： Taeho Kim ,  Boong Kim ,  Youngju Jeong

发明人： Taeho Kim ,  Boong Kim ,  Youngju Jeong

IPC分类号： B05B9/00 ,  H01L21/67

CPC分类号： H01L21/67051

摘要： Provided is a single wafer processing apparatus for cleaning a substrate. The apparatus includes a substrate support member including a spin head to place a substrate thereon, a processing bowl disposed to surround the spin head and adapted to collect a processing fluid scattering from the substrate, and a swing nozzle unit adapted to inject the processing fluid to the substrate placed on the spin head by rotating in a swinging motion, wherein the swing nozzle unit includes a nozzle part including a nozzle body constituted by an inner resin pipe supplying an inner path where a processing fluid supply tube is disposed, a metal pipe disposed to surround the inner resin pipe, and an outer resin pipe disposed to surround the metal pipe, and a nozzle driver adapted to rotate the nozzle part in a θ-axis direction and move the nozzle part up and down in a z-axis direction.

摘要翻译： 提供了用于清洁基板的单个晶片处理装置。 该装置包括：衬底支撑构件，其包括用于在其上放置衬底的旋转头，处理碗，其布置成围绕旋转头并适于收集来自衬底的处理流体散射;以及摆动喷嘴单元，其适于将处理流体喷射到 所述旋转喷嘴单元包括喷嘴部，所述喷嘴部包括由供给设置有处理液供给管的内部路径的内部树脂管构成的喷嘴主体，所述喷嘴部配置在所述喷嘴部 围绕内部树脂管，以及设置成围绕金属管的外部树脂管，以及喷嘴驱动器，其适于使所述喷嘴部沿所述方向旋转，并且使所述喷嘴部在z轴方向上下移动 。

公开(公告)号：US20110068200A1

公开(公告)日：2011-03-24

申请号：US12883433

申请日：2010-09-16

申请人： Taeho KIM ,  Boong Kim ,  Youngju Jeong

发明人： Taeho KIM ,  Boong Kim ,  Youngju Jeong

IPC分类号： B05B1/00

CPC分类号： H01L21/67051

摘要： Provided is a single wafer processing apparatus for cleaning a substrate. The apparatus includes a substrate support member including a spin head to place a substrate thereon, a processing bowl disposed to surround the spin head and adapted to collect a processing fluid scattering from the substrate, and a swing nozzle unit adapted to inject the processing fluid to the substrate placed on the spin head by rotating in a swinging motion, wherein the swing nozzle unit includes a nozzle part including a nozzle body constituted by an inner resin pipe supplying an inner path where a processing fluid supply tube is disposed, a metal pipe disposed to surround the inner resin pipe, and an outer resin pipe disposed to surround the metal pipe, and a nozzle driver adapted to rotate the nozzle part in a Θ-axis direction and move the nozzle part up and down in a z-axis direction.

摘要翻译： 提供了用于清洁基板的单个晶片处理装置。 该装置包括：衬底支撑构件，其包括用于在其上放置衬底的旋转头，处理碗，其布置成围绕旋转头并适于收集来自衬底的处理流体散射;以及摆动喷嘴单元，其适于将处理流体喷射到 所述旋转喷嘴单元包括喷嘴部，所述喷嘴部包括由供给设置有处理液供给管的内部路径的内部树脂管构成的喷嘴主体，所述喷嘴部配置在所述喷嘴部 以及围绕金属管的外侧树脂管和围绕金属管的外部树脂管，以及喷嘴驱动器，其适于使喷嘴部在θ轴方向旋转，并使喷嘴部在z轴方向上下移动。