CRYSTALLIZED GLASS, HIGH-FREQUENCY SUBSTRATE, AND METHOD FOR MANUFACTURING CRYSTALLIZED GLASS

    公开(公告)号:US20230034469A1

    公开(公告)日:2023-02-02

    申请号:US17936146

    申请日:2022-09-28

    Applicant: AGC Inc.

    Abstract: The present invention relates to a crystallized glass including a crystalline phase consisting of Ba—Si—O, in which the crystallized glass includes Li, and crystallinity of Li-based crystals contained in the crystalline phase is 20% or lower as represented by weight %, a high-frequency substrate including the crystallized glass, and a manufacturing method for a crystallized glass including a crystalline phase consisting of Ba—Si—O, the method including: obtaining an amorphous glass by melt-shaping a material containing BaO and SiO2; and crystallizing the amorphous glass by holding the amorphous glass at a treatment temperature of 600° C. or higher and lower than 1,000° C.

    SULFIDE SOLID ELECTROLYTE AND METHOD FOR MANUFACTURING SAME

    公开(公告)号:US20240266598A1

    公开(公告)日:2024-08-08

    申请号:US18619305

    申请日:2024-03-28

    Applicant: AGC Inc.

    CPC classification number: H01M10/0562 H01M10/0525 H01M2300/008

    Abstract: The sulfide solid electrolyte of the present invention includes: an argyrodite crystal phase including Li, P, S, and Ha, in which the Ha is one or more halogen elements including at least Cl, a content ratio represented by [Ha]/[P] (atomic ratio) is 1.3 or more, where [P] is a content of the P and [Ha] is a total content of the Ha, and in a 35Cl-NMR spectrum, an area intensity ratio represented by SB/SA is 3.5 or more, where SA is an area intensity of a peak observed at 0 ppm to 30 ppm and SB is an area intensity of a peak observed at −150 ppm to 0 ppm, or a peak is observed at −150 ppm to 0 ppm and no peak is observed at 0 ppm to 30 ppm.

    METHOD FOR MANUFACTURING HIGH SILICATE GLASS SUBSTRATE, HIGH SILICATE GLASS SUBSTRATE AND POROUS GLASS

    公开(公告)号:US20230093194A1

    公开(公告)日:2023-03-23

    申请号:US18060058

    申请日:2022-11-30

    Applicant: AGC Inc.

    Abstract: A method for producing a high silicate glass substrate, includes: (1) obtaining a glass precursor containing, as represented by mol % based on oxides, 60% to 75% of SiO2, 0% to 15% of Al2O3, 15% to 30% of B2O3, 0% to 3% of P2O5, and 1% to 10% in total of at least one selected from R2O and R′O; (2) applying first heat treatment to the glass precursor to cause phase separation so as to obtain a phase-separated glass; (3) applying acid treatment to the phase-separated glass to make the phase-separated glass porous so as to obtain a porous glass; (4) drying the porous glass so that a rate of change in mass reaches 10% to 50%; and (5) applying second heat treatment to the porous glass to sinter the porous glass so as to obtain a high silicate glass substrate.

    CHEMICALLY STRENGTHENED GLASS
    7.
    发明申请

    公开(公告)号:US20190062204A1

    公开(公告)日:2019-02-28

    申请号:US16171556

    申请日:2018-10-26

    Applicant: AGC INC.

    Abstract: The present invention relates to a chemically strengthened glass, in which CT1 and CT5 satisfy CT5/CT1≤0.85, the CT1 satisfies CT1>−38.7×ln(t/1000)+48.2 [MPa] and an internal energy density rE satisfies rE≤23.3×t/1000+15 [kJ/m2]. CS is a surface compressive stress value [MPa], σ (x) is a compressive stress value [MPa] at a position x in a depth direction, DOL is a compressive stress depth [μm], and t is a sheet thickness [μm].

Patent Agency Ranking