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公开(公告)号:US11807572B2
公开(公告)日:2023-11-07
申请号:US17138118
申请日:2020-12-30
Applicant: AGC INC.
Inventor: Misa Inamoto , Satoru Tomeno , Yuki Aoshima
IPC: C03C19/00 , C03C17/34 , G02F1/1333 , G06F1/16
CPC classification number: C03C19/00 , C03C17/3417 , C03C2217/734 , C03C2218/154 , G02F1/133302 , G02F1/133331 , G06F1/1652 , Y10T428/24355
Abstract: The present invention relates to a glass sheet including a first main surface and a second main surface opposing the first main surface, in which the glass sheet has an affected layer directly below the first main surface, in at least a part of the first main surface, an average element length RSm is from 2500 nm to 6000 nm, a root-mean-square height Sq is from 3 nm to 45 nm, and a skewness Ssk is a negative value.
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公开(公告)号:US11052634B2
公开(公告)日:2021-07-06
申请号:US16081198
申请日:2017-02-07
Applicant: AGC GLASS EUROPE SA , AGC INC. , AGC FLAT GLASS NORTH AMERICA, INC. , AGC VIDROS DO BRASIL LTDA.
Inventor: Yuki Aoshima , Hidefumi Odaka
Abstract: A laminated substrate for an electrochromic dimmer element includes
a glass substrate; and
a transparent conductive film.
The glass substrate includes a silicon oxide, an aluminum oxide, a boron oxide, an alkaline earth metal oxide, and an alkali metal oxide in a total amount of 90 mol % or more, and includes the alkali metal oxide in a total amount of 12 mol % or less.
The transparent conductive film includes an indium oxide film containing tin, and a tin oxide film containing at least one of tantalum, antimony and fluorine, in this order from a glass substrate side.
The indium oxide film is formed directly on the glass substrate, a refractive index and an extinction coefficient of the indium oxide film at a wavelength of 1.3 μm is less than 0.4, and greater than 0.4, respectively.
A film thickness of the tin oxide film is greater than 35 nm.-
公开(公告)号:US10453891B2
公开(公告)日:2019-10-22
申请号:US15666038
申请日:2017-08-01
Applicant: AGC Inc.
Inventor: Takeshi Tomizawa , Yuki Aoshima , Reo Usui , Hidefumi Odaka
IPC: H01L27/146 , B32B7/02 , B32B9/00 , H01B5/14 , H05K1/02 , H01L51/00 , C01G9/02 , C01G15/00 , C01G19/02 , C08F14/26 , C08G63/183 , C08G64/02
Abstract: A substrate with conductive film includes a base material; and a film of a conductive metal oxide arranged on an upper part of the base material. The film includes, by a top plan view, a first region and a second region, the second region is configured of a same material as the first region, and an electric resistance of the second region is higher than an electric resistance of the first region. The second region includes a part configured by a plurality of cellular sections surrounded by a plurality of fine cracks. In the part, each fine crack has a width of 1 nm to 50 nm, and each cellular section has a largest measure of less than 10 μm.
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