公开(公告)号：US20250036020A1

公开(公告)日：2025-01-30

申请号：US18911231

申请日：2024-10-09

Applicant: AGC Inc.

Inventor： Wataru NISHIDA ,  Daijiro AKAGI ,  Hiroaki IWAOKA ,  Hiroshi HANEKAWA ,  Taiga FUDETANI ,  Masaru HORI ,  Takayoshi TSUTSUMI

IPC: G03F1/24 ,  G03F1/48 ,  G03F1/52 ,  G03F1/54

Abstract: A reflective mask blank includes: a substrate, a multilayer reflective film including molybdenum layers and silicon layers alternately and being configured to reflect EUV light, an intermediate film, a protective film, and an absorber film, in this order, in which the intermediate film includes silicon and nitrogen, an atomic weight ratio of a content of the nitrogen to a content of the silicon is 0.22 to 0.40 or 0.15 or less, the protective film includes one or more layers selected from the group consisting of a layer including rhodium and a layer including a rhodium-containing material, and the rhodium-containing material includes rhodium and one or more elements selected from the group consisting of boron, carbon, nitrogen, oxygen, silicon, titanium, zirconium, niobium, molybdenum, ruthenium, palladium, tantalum, and iridium.

公开(公告)号：US20240231215A9

公开(公告)日：2024-07-11

申请号：US18403811

申请日：2024-01-04

Applicant: AGC Inc.

Inventor： Wataru NISHIDA ,  Masaru HORI ,  Takayoshi TSUTSUMI

IPC: G03F1/24

CPC classification number: G03F1/24

Abstract: A reflective mask blank includes: a substrate; a Mo/Si multilayer reflection layer formed by alternately laminating a molybdenum (Mo) layer and a silicon (Si) layer on or above the substrate; an intermediate layer on or above the Mo/Si multilayer reflection layer; a barrier layer on or above the intermediate layer; a protective layer on or above the barrier layer; and an absorption layer on or above the protective layer.

公开(公告)号：US20240134267A1

公开(公告)日：2024-04-25

申请号：US18403811

申请日：2024-01-04

Applicant: AGC Inc.

Inventor： Wataru NISHIDA ,  Masaru HORI ,  Takayoshi TSUTSUMI

IPC: G03F1/24

CPC classification number: G03F1/24

Abstract: A reflective mask blank includes: a substrate; a Mo/Si multilayer reflection layer formed by alternately laminating a molybdenum (Mo) layer and a silicon (Si) layer on or above the substrate; an intermediate layer on or above the Mo/Si multilayer reflection layer; a barrier layer on or above the intermediate layer; a protective layer on or above the barrier layer; and an absorption layer on or above the protective layer.