公开(公告)号：US20240094622A1

公开(公告)日：2024-03-21

申请号：US18517796

申请日：2023-11-22

Applicant: AGC Inc.

Inventor： YUYA NAGATA ,  Daijiro Akagi ,  Kenichi Sasaki ,  Hiroaki Iwaoka

IPC: G03F1/24 ,  G03F1/26 ,  G03F1/52 ,  G03F1/80

CPC classification number: G03F1/24 ,  G03F1/26 ,  G03F1/52 ,  G03F1/80

Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The phase shift film contains Ir as a main component. A ratio of a maximum value of an intensity of a peak of diffracted light from the phase shift film in a 2θ range of 35° to 45° to an average value of an intensity of the diffracted light in a 2θ range of 55° to 60° measured using an XRD method with a CuKα ray, upon being irradiated with the EUV light with an incident angle of θ, is 1.0 or more and 30 or less. A refractive index and an extinction coefficient of the phase shift film to the EUV light are 0.925 or less, and 0.030 or more, respectively.