公开(公告)号：US20170298522A1

公开(公告)日：2017-10-19

申请号：US15516019

申请日：2015-09-30

Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH

Inventor： Liang HONG ,  Yuanhuan ZHENG ,  Siok Wei TAY

IPC: C23F3/06 ,  F16L9/02 ,  C09K13/08 ,  F16L58/00 ,  C09K13/06

CPC classification number: C23F3/06 ,  C09K13/06 ,  C09K13/08 ,  C10G9/16 ,  C10G75/02 ,  F16L9/02 ,  F16L58/00

Abstract: There is a formulation and a method for inhibiting carbon-based deposits on metal substrate. The method comprises the use of a formulation comprising at least one oxidizing agent and at least one etchant capable of forming free metal ions from the metal substrate, at least one sequestering agent having a ligand capable of forming a complex with the free metal ions and at least one chelating agent having a ligand capable of complexing with at least one surface metal atom.