公开(公告)号：US20180308660A1

公开(公告)日：2018-10-25

申请号：US15768486

申请日：2016-10-13

Applicant: ALD Vacuum Technologies GmbH

Inventor： Georg REITER ,  Matthias WAELZLEIN

IPC: H01J37/305 ,  H01J37/30

CPC classification number: H01J37/3053 ,  H01J37/3005 ,  H01J2237/2482 ,  H01J2237/30455 ,  H01J2237/30472 ,  H01J2237/3132

Abstract: In order to evaporate material, an electronic beam is guided over a melt surface in a periodic pattern by a detecting unit. Whether or not the actual pattern matches the target pattern specified by the deflecting unit is detected in principle on an image of the melt surface. In order to allow a better analysis of the image, the periodicity of the deflection pattern during the analysis of temporally successive images is taken into consideration.