公开(公告)号：US09768081B2

公开(公告)日：2017-09-19

申请号：US14700361

申请日：2015-04-30

Applicant: SKYWORKS SOLUTIONS, INC.

Inventor： Kezia Cheng

IPC: H01L21/66 ,  H01J37/304 ,  H01J37/305 ,  G01N27/00 ,  H01L21/02 ,  C23C14/30 ,  C23C14/54

CPC classification number: H01L22/14 ,  C23C14/30 ,  C23C14/548 ,  G01N27/00 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/24475 ,  H01J2237/30472 ,  H01J2237/3132 ,  H01L21/02 ,  Y10T29/41

Abstract: An electrode system configured to be positioned within a vacuum chamber of an electron-beam metal evaporation and deposition apparatus including a metal slug from which metal is evaporated during operation of the electron-beam metal evaporation and deposition apparatus. The electrode system includes a substantially ring-shaped electrode formed of a conductive material and a plurality of insulating standoffs configured to support the substantially ring-shaped electrode in the vacuum chamber in a position substantially surrounding the metal slug.

公开(公告)号：US20170133191A1

公开(公告)日：2017-05-11

申请号：US15341699

申请日：2016-11-02

Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Inventor： Rainer Labitzke ,  Severin Dominok ,  Gösta Mattausch ,  Stefan Weiss

IPC: H01J29/98

CPC classification number: H01J29/98 ,  H01J37/24 ,  H01J2237/0206 ,  H01J2237/06366 ,  H01J2237/3132

Abstract: An apparatus for suppression of arcs in an electron beam generator including: a first module providing an operating voltage; a second module including a coil suitable for a voltage of at least 10 kV, and at least one free-wheeling diode connected in parallel to the coil; a third module including a first circuit component configured to detect a first actual value for electric voltage, and a first signal is producible when the first actual value falls below a first threshold value, a second circuit component by which a second actual value for electric current is detectable, and a second signal is generated when the second actual value exceeds a second threshold value, a control logic, which optionally links the first and second signals and a resultant output signal is producible; a semiconductor-based switch suitable for the voltage of at least 10 kV, which is opened based on the output signal.

公开(公告)号：US20150243567A1

公开(公告)日：2015-08-27

申请号：US14700361

申请日：2015-04-30

Applicant: SKYWORKS SOLUTIONS, INC.

Inventor： Kezia Cheng

IPC: H01L21/66 ,  C23C14/30 ,  C23C14/54 ,  G01N27/00

CPC classification number: H01L22/14 ,  C23C14/30 ,  C23C14/548 ,  G01N27/00 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/24475 ,  H01J2237/30472 ,  H01J2237/3132 ,  H01L21/02 ,  Y10T29/41

Abstract: An electrode system configured to be positioned within a vacuum chamber of an electron-beam metal evaporation and deposition apparatus including a metal slug from which metal is evaporated during operation of the electron-beam metal evaporation and deposition apparatus. The electrode system includes a substantially ring-shaped electrode formed of a conductive material and a plurality of insulating standoffs configured to support the substantially ring-shaped electrode in the vacuum chamber in a position substantially surrounding the metal slug.

Abstract translation: 一种被配置为位于电子束金属蒸发和沉积设备的真空室内的电极系统，该电子束金属蒸发和沉积设备包括在电子束金属蒸发和沉积设备的操作期间金属被蒸发的金属块。 电极系统包括由导电材料形成的基本上环形的电极和多个绝缘支座，其构造成在基本上围绕金属芯块的位置中支撑真空室中的基本环形电极。

公开(公告)号：US20130069622A1

公开(公告)日：2013-03-21

申请号：US13678765

申请日：2012-11-16

Applicant: SKYWORKS SOLUTIONS, INC.

Inventor： Kezia Cheng

IPC: G01N27/00 ,  H01L21/02

CPC classification number: H01L22/14 ,  C23C14/30 ,  C23C14/548 ,  G01N27/00 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/24475 ,  H01J2237/30472 ,  H01J2237/3132 ,  H01L21/02 ,  Y10T29/41

Abstract: Disclosed herein are systems and methods for in-situ measurement of impurities on metal slugs utilized in electron-beam metal evaporation/deposition systems, and for increasing the production yield of a semiconductor manufacturing processes utilizing electron-beam metal evaporation/deposition systems. A voltage and/or a current level on an electrode disposed in a deposition chamber of an electron-beam metal evaporation/deposition system is monitored and used to measure contamination of the metal slug. Should the voltage or current reach a certain level, to the deposition is completed and the system is inspected for contamination.

Abstract translation: 本文公开了用于在电子束金属蒸发/沉积系统中使用的金属块上的杂质的原位测量的系统和方法，以及利用电子束金属蒸发/沉积系统提高半导体制造工艺的生产产量。 监测设置在电子束金属蒸发/沉积系统的沉积室中的电极上的电压和/或电流水平，以用于测量金属屑的污染。 如果电压或电流达到一定水平，完成沉积并检查系统是否有污染。

公开(公告)号：US20130032092A1

公开(公告)日：2013-02-07

申请号：US13642086

申请日：2011-04-20

Applicant: Juergen Hotz ,  Pavel Seserko ,  Joerg Wittich ,  Helmut Eberhardt ,  Manfred Kirschner ,  Wolfgang Rieth

Inventor： Juergen Hotz ,  Pavel Seserko ,  Joerg Wittich ,  Helmut Eberhardt ,  Manfred Kirschner ,  Wolfgang Rieth

IPC: C23C16/448

CPC classification number: C23C14/246 ,  C23C14/30 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/202 ,  H01J2237/3132

Abstract: An apparatus for coating substrates with a coating material is disclosed. The apparatus includes a frame, a crucible arrangement including a first crucible and a second crucible disposed offset from one another in a horizontal plane, where the crucible arrangement is disposed on the frame. At least one first shaft is associated with the first crucible and at least one second shaft is associated with the second crucible, where the at least one first and second shafts are disposed in the frame beneath the first and second crucibles, respectively. A first lifting device is associated with the at least one first shaft and a second lifting device is associated with the at least one second shaft, where the first and second lifting devices are disposed in the frame. The frame is linearly displaceable in the horizontal plane.

Abstract translation: 公开了一种用涂料涂覆基材的设备。 该装置包括框架，坩埚装置，其包括第一坩埚和在水平面上彼此偏移设置的第二坩埚，坩埚布置在框架上。 至少一个第一轴与第一坩埚相关联，并且至少一个第二轴与第二坩埚相关联，其中至少一个第一和第二轴分别设置在第一和第二坩埚下方的框架中。 第一提升装置与所述至少一个第一轴相关联，并且第二提升装置与所述至少一个第二轴相关联，其中第一和第二提升装置设置在框架中。 框架在水平面上可线性移位。

公开(公告)号：US20100242841A1

公开(公告)日：2010-09-30

申请号：US12414697

申请日：2009-03-31

Applicant: James W. Neal

Inventor： James W. Neal

IPC: C23C14/30

CPC classification number: C23C14/30 ,  C23C14/046 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/3132

Abstract: An electron beam vapor deposition apparatus includes a coating chamber including a coating zone for depositing a coating on a work piece. A coating device includes at least one crucible for presenting at least one source coating material. The coating device includes a first deposition mode of depositing the at least one source coating material and a second deposition mode of depositing the at least one source coating material. At least one electron beam source evaporates the at least one source coating material for deposit onto the work piece. A controller is configured to control a speed of movement of the work piece in the coating zone during the coating operation in response to the first deposition mode and the second deposition mode.

Abstract translation: 电子束气相沉积设备包括涂覆室，其包括用于在工件上沉积涂层的涂层区域。 涂覆装置包括至少一个用于呈现至少一种源涂料的坩埚。 涂覆装置包括沉积至少一种源涂料的第一沉积模式和沉积所述至少一种源涂料的第二沉积模式。 至少一个电子束源蒸发至少一个源涂料以沉积到工件上。 控制器被配置为响应于第一沉积模式和第二沉积模式，在涂覆操作期间控制工件在涂覆区域中的移动速度。

公开(公告)号：US07764008B2

公开(公告)日：2010-07-27

申请号：US11709534

申请日：2007-02-22

Applicant: Cris Keith Kroneberger ,  Ping Chang

Inventor： Cris Keith Kroneberger ,  Ping Chang

IPC: H01J29/46

CPC classification number: H01J37/065 ,  H01J3/027 ,  H01J37/07 ,  H01J2237/06308 ,  H01J2237/3132

Abstract: An electron beam gun with an arched shaped beam former as an integral part of a massive cathode block which conducts heat away from the beam former and with a filament mounted to the cathode block for improved alignment.

Abstract translation: 一种具有拱形梁形成器的电子束枪，其作为大量阴极块的整体部分，其将热量从光束形成器传导出去，并将灯丝安装到阴极块，以改善对准。

公开(公告)号：US20070210691A1

公开(公告)日：2007-09-13

申请号：US11709534

申请日：2007-02-22

Applicant: Cris Kroneberger ,  Ping Chang

Inventor： Cris Kroneberger ,  Ping Chang

IPC: H01J29/46

CPC classification number: H01J37/065 ,  H01J3/027 ,  H01J37/07 ,  H01J2237/06308 ,  H01J2237/3132

Abstract: An electron beam gun with an arched shaped beam former as an integral part of a massive cathode block which conducts heat away from the beam former and with a filament mounted to the cathode block for improved alignment.

Abstract translation: 一种具有拱形梁形成器的电子束枪，其作为大量阴极块的整体部分，其将热量从光束形成器传导出去，并将灯丝安装到阴极块，以改善对准。

公开(公告)号：US20040211363A1

公开(公告)日：2004-10-28

申请号：US10754419

申请日：2004-01-08

Inventor： Robert William Bruce ,  John Douglas Evans SR.

IPC: C23C016/00

CPC classification number: C23C14/083 ,  C23C14/30 ,  C23C14/548 ,  H01J37/3053 ,  H01J2237/3132

Abstract: An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the shape and intensity of the electron beam pattern on the coating material and on a crucible containing the molten coating material.

Abstract translation: 电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。 电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。 在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。 通过涂层材料上的电子束图案和含有熔融涂层材料的坩埚的形状和强度，增强了EBPVD装置的操作。

公开(公告)号：US5820680A

公开(公告)日：1998-10-13

申请号：US839322

申请日：1997-04-17

Applicant: Kazuo Miyamoto ,  Humio Watanabe

Inventor： Kazuo Miyamoto ,  Humio Watanabe

IPC: C23C14/30 ,  H01J37/305 ,  C23C16/00

CPC classification number: H01J37/3053 ,  H01J2237/3132

Abstract: A vacuum evaporator is characterized in that hot-cathode filaments (7) are provided as the electron source around a tip of a rod evaporation material (4); the peripheries of the rod evaporation material (4) and the hot-cathode filaments (7) are disposed in parallel to a conductive cooling member (1) of a good heat conductive metal which is partly contacted with the atmosphere to decrease the dissipation of radiation heat produced from the hot-cathode filaments (7) and a tip (41) of the rod evaporation material (4) into a vacuum vessel a; heat absorbed by the conductive cooling member (1) is quickly conducted through the conductive cooling member and discharged to the atmosphere to prevent the temperature of the electron impact heating part from increasing and to prevent the increase of the gas discharge due to the heat dissipation from the electron impact heating part.

Abstract translation: 真空蒸发器的特征在于，将热阴极细丝（7）设置为围绕棒状蒸发材料（4）的尖端的电子源; 棒状蒸发材料（4）和热阴极丝（7）的周边平行于与大气部分接触的良好导热金属的导电性冷却部件（1），以减少辐射耗散 从热阴极细丝（7）和棒蒸发材料（4）的尖端（41）产生的热量进入真空容器a; 导电性冷却部件（1）吸收的热量迅速地通过导电性冷却部件导入并排放到大气中，以防止电子冲击加热部件的温度升高，并且防止由于散热而产生的气体放电 电子冲击加热部分。