Coating printed circuit boards with tin or tin-lead alloy and tin-lead fluoborate plating baths
    1.
    发明授权
    Coating printed circuit boards with tin or tin-lead alloy and tin-lead fluoborate plating baths 失效
    涂层印刷电路板,镀锡或镀锡合金和铅笔浮子镀层

    公开(公告)号:US3859182A

    公开(公告)日:1975-01-07

    申请号:US32109273

    申请日:1973-01-04

    Applicant: ALLIED CHEM

    CPC classification number: C25D3/32 C25D3/60 H05K3/3473 Y10S205/92

    Abstract: The plating bath of the invention is an aqueous plating bath comprising, per liter of bath, from about 150 to about 700 grams of bath of fluoboric acid; from about 2 to about 15 grams of a plate modifying additive, preferably an amino acid chain compound; from about 15 to about 82 grams of metal selected from stannous tin or a mixture of stannous tin and lead, which mixture contains at least 5 weight percent tin, and from about 0.01 to about 1 gram of beta-naphtol. An electrically conductive substrate is plated with tin or a tin-lead alloy by immersing the substrate in the above plating bath at a temperature between about 50* and 100* F. and applying sufficient negative voltage to the substrate relative to an anode within the bath to cause a current density at the substrate of between about 7 and about 35 amperes per square foot.

    Thin film reactor
    2.
    发明授权
    Thin film reactor 失效
    薄膜反应器

    公开(公告)号:US3902857A

    公开(公告)日:1975-09-02

    申请号:US38784473

    申请日:1973-08-13

    Applicant: ALLIED CHEM

    CPC classification number: B01J19/247 B01J10/02

    Abstract: A process is disclosed which comprises the steps of introducing a stream of the organic liquid onto a plurality of rotating reacting surfaces, rotating the reacting surfaces at a velocity such that the organic liquid is continuously formed into a thin film on each reacting surface and is continuously moved as a thin film towards the periphery of each reacting surface by centrifugal force, depositing over each thin film a substantially undiluted stream of a gaseous medium, reacting the organic liquid and gaseous medium on said rotating reacting surfaces, maintaining the pressure during reaction at subatmospheric levels, moving the resulting reaction products in a radially outward direction along each reacting surface and collecting said reaction product. An apparatus for carrying out such process is also disclosed.

    Abstract translation: 公开了一种方法,其包括以下步骤:将有机液体流引入到多个旋转反应表面上,以使得有机液体在每个反应表面上连续形成薄膜的速度旋转反应表面,并连续地 通过离心力将薄膜移动到每个反应表面的周边,在每个薄膜上沉积基本上未稀释的气体介质流,使有机液体和气体介质在所述旋转反应表面上反应,保持在低于大气压的反应期间的压力 水平,使所得反应产物沿着每个反应表面沿径向向外的方向移动并收集所述反应产物。 还公开了一种用于执行这种处理的装置。

    Silicon semi-conductor wafer constraint
    4.
    发明授权
    Silicon semi-conductor wafer constraint 失效
    硅半导体波长约束

    公开(公告)号:US3861733A

    公开(公告)日:1975-01-21

    申请号:US36263473

    申请日:1973-05-21

    Applicant: ALLIED CHEM

    CPC classification number: B65G7/12 B08B11/02 Y10S206/832

    Abstract: A handle and retainer for engagement with a carrier for an article, said handle and retainer comprising at least two legs, means for changing the distance between the lower portion of said legs, means for engaging and disengaging the carrier which engaging and disengaging means operates upon the change in distance between the lower portion of the legs and at least one retaining bar for retaining the article in the carrier, which retaining bar is connected by one end to one of the legs, the other end of said retaining bar being unsecured.

    Abstract translation: 一种手柄和保持器,用于与用于物品的托架接合,所述手柄和保持器包括至少两个腿,用于改变所述腿部的下部之间的距离的装置,用于接合和脱离接合和分离装置的载体的装置 脚部的下部之间的距离的变化和用于将物品保持在托架中的至少一个保持杆的变化,该保持杆的一端连接到一个腿部,所述保持杆的另一端是不固定的。

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