公开(公告)号：US20230363997A1

公开(公告)日：2023-11-16

申请号：US18153467

申请日：2023-01-12

Applicant: AMOREPACIFIC CORPORATION

Inventor： Euidong SON ,  Insup KIL ,  Si Young CHO ,  Wonseok PARK ,  Yong Deog HONG

IPC: A61K8/49 ,  A61Q19/00

CPC classification number: A61K8/498 ,  A61Q19/005 ,  A61Q19/004

Abstract: The disclosure relates to the method for alleviating skin irritation or inhibiting sebum production, which includes administering a composition including a compound represented by Chemical Formula 1, a salt thereof, a stereoisomer thereof, a hydrate thereof, or a solvate thereof as an active ingredient to a subject in need of alleviating skin irritation or inhibiting sebum production, and specifically the composition can alleviate the irritation of the skin stimulated by ultraviolet rays, and more specifically, the composition can alleviate the skin irritation by reducing inflammatory factors in the cells of the skin stimulated by simultaneous stimulation of UVA and UVB ultraviolet rays, and in addition, specifically, it is possible to suppress the sebum production by inhibiting intracellular lipid synthesis with the composition, and more specifically, the sebum production of the skin can be suppressed by reducing the expression level of the factors related to intracellular lipid synthesis with the composition.