Rotary vacuum-chuck with venturi formed at base of rotating shaft
    1.
    发明申请
    Rotary vacuum-chuck with venturi formed at base of rotating shaft 失效
    带有文丘里管的旋转式真空吸盘形成在旋转轴的底部

    公开(公告)号:US20030141673A1

    公开(公告)日:2003-07-31

    申请号:US10057114

    申请日:2002-01-25

    CPC classification number: H01L21/6838 B23B31/307 B25B11/005 Y10T279/11

    Abstract: In a first aspect, a rotary vacuum-chuck is provided that may hold a substrate such as a silicon wafer for rotation. The vacuum-chuck includes a hollow rotary shaft and a chuck mounted on the hollow rotary shaft and having a surface adapted to support a substrate. The chuck has one or more openings in fluid communication with the hollow rotary shaft. A venturi is formed near an end of the hollow rotary shaft to apply vacuum to the hollow rotary shaft and the openings in the chuck surface. No seal is required between the end of the hollow rotary shaft and a surrounding stationary block.

    Abstract translation: 在第一方面中,提供一种旋转式真空吸盘,其可以保持诸如硅晶片的基板旋转。 真空吸盘包括中空旋转轴和安装在中空旋转轴上并具有适于支撑基底的表面的卡盘。 卡盘具有与中空旋转轴流体连通的一个或多个开口。 在中空旋转轴的端部附近形成文丘里管,以向空心旋转轴和卡盘表面中的开口施加真空。 在空心旋转轴的端部和周围的固定块之间不需要密封。

    Rotary vacuum-chuck with water-assisted labyrinth seal

    公开(公告)号:US20030094773A1

    公开(公告)日:2003-05-22

    申请号:US09991097

    申请日:2001-11-16

    Inventor: Alexander Lerner

    CPC classification number: H01L21/67126 B25B11/005 Y10T279/11

    Abstract: A rotary vacuum-chuck mounts a substrate such as a silicon wafer for rotation. The vacuum-chuck includes a hollow rotary shaft and a chuck mounted on the hollow rotary shaft and having a surface adapted to support a substrate, the surface having one or more openings in fluid communication with the hollow rotary shaft. A vacuum generator evacuates the hollow rotary shaft and the one or more openings so as to vacuum chuck a substrate to the chuck surface. A labyrinthine gap is defined between a first member that rotates with the hollow rotary shaft and a second member that is stationary. A fluid in the labyrinthine gap provides a gas-tight seal between the first and second members.

    Planarization of metal layers on a semiconductor wafer through non-contact de-plating and control with endpoint detection
    3.
    发明申请
    Planarization of metal layers on a semiconductor wafer through non-contact de-plating and control with endpoint detection 失效
    通过非接触式去镀层和端点检测来控制半导体晶片上的金属层的平面化

    公开(公告)号:US20030073310A1

    公开(公告)日:2003-04-17

    申请号:US09981505

    申请日:2001-10-16

    Abstract: A non-contact apparatus and method for removing a metal layer from a substrate are provided. The apparatus includes a rotatable anode substrate support member configured to support a substrate in a face-up position and to electrically contact the substrate positioned thereon. A pivotally mounted cathode fluid dispensing nozzle assembly positioned above the anode substrate support member is also provided. A power supply in electrical communication with the anode substrate support member and the cathode fluid dispensing nozzle is provided, and a system controller configured to regulate at least one of a rate of rotation of the anode substrate support member, a radial position of the cathode fluid dispensing nozzle, and an output power of the power supply is provided. The method provides for the removal of a metal layer from a substrate by rotating the substrate in a face up position on a rotatable substrate support member. A cathode fluid dispensing nozzle is positioned over a central portion of the substrate and a metal removing solution is dispensed from the cathode fluid dispensing nozzle onto the central portion of the substrate. An electrical bias is applied between the substrate and the cathode fluid dispensing nozzle, which operates to deplate the metal layer below the fluid dispensing nozzle.

    Abstract translation: 提供了一种用于从基板去除金属层的非接触式设备和方法。 该装置包括可旋转的阳极基板支撑构件,其构造成将基板支撑在面朝上的位置并且电接触定位在其上的基板。 还提供了一种位于阳极基板支撑构件上方的枢转安装的阴极流体分配喷嘴组件。 提供与阳极基板支撑构件和阴极流体分配喷嘴电连通的电源,以及系统控制器,被配置为调节阳极基板支撑构件的旋转速率,阴极流体的径向位置 分配喷嘴,并且提供电源的输出功率。 该方法通过在可旋转的基板支撑构件上面向上的位置旋转基板来提供从基板移除金属层。 阴极流体分配喷嘴位于衬底的中心部分上方,金属去除溶液从阴极流体分配喷嘴分配到衬底的中心部分上。 在衬底和阴极流体分配喷嘴之间施加电偏压,其用于使流体分配喷嘴下方的金属层脱落。

    Single wafer dryer and drying methods
    4.
    发明申请
    Single wafer dryer and drying methods 有权
    单片干燥机和干燥方法

    公开(公告)号:US20030121170A1

    公开(公告)日:2003-07-03

    申请号:US10286404

    申请日:2002-11-01

    Abstract: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.

    Abstract translation: 在第一方面,提供一种适于处理晶片的模块。 模块包括具有一个或多个特征的处理部分,例如(1)可旋转晶片支撑件,用于从第一取向旋转输入晶片,其中晶片与负载端口对准至第二取向,其中晶片与 卸货港 (2)捕捉器,其适于在从所述处理部分卸载时与晶片被动接触和行进; (3)适于产生从其一侧到另一侧的层流空气流的封闭输出部分; (4)具有多个晶片接收器的输出部分; (5)浸没式流体喷嘴; 和/或(6)干燥气体导流板等。其它方面包括晶片处理的方法。

    Protective barrier for cleaning chamber
    5.
    发明申请
    Protective barrier for cleaning chamber 失效
    清洁室的防护屏障

    公开(公告)号:US20020134404A1

    公开(公告)日:2002-09-26

    申请号:US09816807

    申请日:2001-03-23

    CPC classification number: H01L21/67057 B08B3/12 B08B11/02 Y10S134/902

    Abstract: A method and apparatus is provided that may protect a fragile component (such as a quartz plate) positioned within a megasonic tank from impact by falling objects. The megasonic tank may include a barrier (such as one or more extended rollers, quartz bars, or a net) that is configured to protect the fragile component.

    Abstract translation: 提供了一种方法和装置,其可以保护位于兆声波箱内的易碎部件(例如石英板)免受掉落的物体的撞击。 兆声波箱可以包括被配置为保护脆弱部件的屏障(例如一个或多个延伸辊,石英条或网)。

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