公开(公告)号：US20180218928A1

公开(公告)日：2018-08-02

申请号：US15811575

申请日：2017-11-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Eng Sheng PEH ,  Sriskantharajah THIRUNAVUKARASU ,  Jun-Liang SU ,  Shoju VAYYAPRON ,  Karthik ELUMALAI ,  Dimantha RAJAPAKSA ,  Arunkumar M Tatti

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/683 ,  H05B3/00

CPC classification number: H01L21/67115 ,  H01L21/67017 ,  H01L21/6838 ,  H01L21/68742 ,  H01L21/68757 ,  H05B3/0047

Abstract: Embodiments of methods and apparatus for correcting substrate deformity are provided herein. In some embodiments, a substrate support includes a base having an interior volume formed by walls extending upward from the base; a plurality of infrared lamps disposed within the interior volume; a support plate disposed above the plurality of infrared lamps, wherein the support plate includes a support surface to support a substrate; and a cover plate disposed atop the support plate and having a central opening corresponding to the support surface and an exhaust portion at a periphery of a top surface of the cover plate, wherein the exhaust portion includes a plurality of perforations fluidly coupling a space above the cover plate with an exhaust conduit formed in the cover plate. Embodiments of a showerhead assembly and processing equipment incorporating the inventive substrate support and showerhead assembly are additionally provided herein.

公开(公告)号：US10325790B2

公开(公告)日：2019-06-18

申请号：US15811575

申请日：2017-11-13

Applicant: APPLIED MATERIALS, INC.

Inventor： Eng Sheng Peh ,  Sriskantharajah Thirunavukarasu ,  Jun-Liang Su ,  Shoju Vayyapron ,  Karthik Elumalai ,  Dimantha Rajapaksa ,  Arunkumar M Tatti

IPC: H01L21/00 ,  H01L21/67 ,  H05B3/00 ,  H01L21/687 ,  H01L21/683

Abstract: Embodiments of methods and apparatus for correcting substrate deformity are provided herein. In some embodiments, a substrate support includes a base having an interior volume formed by walls extending upward from the base; a plurality of infrared lamps disposed within the interior volume; a support plate disposed above the plurality of infrared lamps, wherein the support plate includes a support surface to support a substrate; and a cover plate disposed atop the support plate and having a central opening corresponding to the support surface and an exhaust portion at a periphery of a top surface of the cover plate, wherein the exhaust portion includes a plurality of perforations fluidly coupling a space above the cover plate with an exhaust conduit formed in the cover plate. Embodiments of a showerhead assembly and processing equipment incorporating the inventive substrate support and showerhead assembly are additionally provided herein.