公开(公告)号：US20150357171A1

公开(公告)日：2015-12-10

申请号：US14707825

申请日：2015-05-08

Applicant: APPLIED MATERIALS, INC.

Inventor： XIANMIN TANG ,  JOUNG JOO LEE ,  GUOJUN LIU

IPC: H01J37/34 ,  C23C14/35 ,  H01L21/02

CPC classification number: H01J37/3447 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/345 ,  H01J37/3452 ,  H01J2237/3322 ,  H01L21/02104

Abstract: Methods and apparatus for improved metal ion filtering are provided herein. In some embodiments, a substrate processing apparatus includes: a chamber body and a chamber lid disposed on the chamber body defining a processing region within the chamber body beneath the lid; a collimator disposed in the processing region; a power source coupled to the collimator; and a first set of magnets disposed around the chamber body above the collimator and a second set of magnets disposed around the chamber body and below the collimator that together create a guidance magnetic field that is substantially orthogonal to the collimator.

Abstract translation: 本文提供了改进金属离子过滤的方法和装置。 在一些实施例中，基板处理装置包括：室主体和设置在室主体上的室盖，其限定盖体下方的室主体内的处理区域; 设置在处理区域中的准直器; 耦合到所述准直器的电源; 以及设置在准直器上方的腔室主体周围的第一组磁体和设置在腔室主体周围并在准直器下方的第二组磁体，其一起产生基本上与准直器正交的引导磁场。