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    TARGET CENTER POSITIONAL CONSTRAINT FOR PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING SYSTEMS
    1.
    发明申请
    TARGET CENTER POSITIONAL CONSTRAINT FOR PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING SYSTEMS 审中-公开
    物理气相沉积（PVD）处理系统的目标中心定位约束

    公开(公告)号：US20140061041A1

    公开(公告)日：2014-03-06

    申请号：US13778383

    申请日：2013-02-27

    Applicant: APPLIED MATERIALS, INC.

    Inventor： MARTIN LEE RIKER ,  KEITH A. MILLER ,  BALAMURUGAN RAMASAMY ,  KARTIK SHAH

    IPC: C23C14/34

    CPC classification number: C23C14/3407 ,  H01J37/3408 ,  H01J37/3497

    Abstract: Target assemblies for use in a substrate processing system are provided herein. In some embodiments, a target assembly for use in a substrate processing system may include a source material, a backing plate configured to support the source material on a front side of the backing plate, and a central support member to support the target assembly within the substrate processing system, wherein the central support member is coupled to a center portion of the backing plate and extends perpendicularly away from the backside of the backing plate.

    Abstract translation: 本文提供了用于基板处理系统的目标组件。 在一些实施例中，用于基板处理系统的目标组件可以包括源材料，被配置为将支撑材料支撑在背板的前侧上的背板和用于将目标组件支撑在背板内的中心支撑构件 衬底处理系统，其中中央支撑构件联接到背板的中心部分并且垂直地远离背板的背面延伸。

    COOLED PROCESS TOOL ADAPTER FOR USE IN SUBSTRATE PROCESSING CHAMBERS
    2.
    发明申请
    COOLED PROCESS TOOL ADAPTER FOR USE IN SUBSTRATE PROCESSING CHAMBERS 审中-公开
    冷却工艺工具适用于基板加工中心

    公开(公告)号：US20150354054A1

    公开(公告)日：2015-12-10

    申请号：US14713386

    申请日：2015-05-15

    Applicant: APPLIED MATERIALS, INC.

    Inventor： WILLIAM R. FRUCHTERMAN ,  MARTIN LEE RIKER ,  KEITH A. MILLER ,  ANTHONY INFANTE

    IPC: C23C14/34

    CPC classification number: C23C14/345 ,  H01J37/32522 ,  H01J37/3411 ,  H01J37/3447

    Abstract: Embodiments of cooled process tool adapters for use in substrate processing chambers are provided herein. In some embodiments, a cooled process tool adapter includes: an annular body surrounding a central opening; a coolant channel disposed in the annular body; one or more features to facilitate supporting a process tool within the central opening; an inlet and an outlet disposed in the annular body and fluidly coupled to the coolant channel; and a power connection coupled to the annular body having a terminal to couple the annular body to a bias power source.

    Abstract translation: 本文提供了用于基板处理室的冷却工艺工具适配器的实施例。 在一些实施例中，冷却的工艺工具适配器包括：围绕中心开口的环形主体; 设置在所述环形体中的冷却剂通道; 一个或多个特征以便于在中心开口内支撑加工工具; 设置在所述环形体中并与所述冷却剂通道流体耦合的入口和出口; 以及耦合到所述环形体的电源连接器，所述环形体具有用于将所述环形体耦合到偏置电源的端子。

    COLLIMATOR FOR USE IN SUBSTRATE PROCESSING CHAMBERS
    3.
    发明申请
    COLLIMATOR FOR USE IN SUBSTRATE PROCESSING CHAMBERS 有权
    用于基板加工中的聚合物

    公开(公告)号：US20160145735A1

    公开(公告)日：2016-05-26

    申请号：US14607273

    申请日：2015-01-28

    Applicant: APPLIED MATERIALS, INC.

    Inventor： MARTIN LEE RIKER

    IPC: C23C14/34 ,  C23C14/54

    CPC classification number: H01J37/34 ,  C23C14/046 ,  H01J37/3408 ,  H01J37/3447

    Abstract: Embodiments of collimators for use in substrate processing chambers are provided herein. In some embodiments, a collimator includes: a body having a central region, a peripheral region, and a transitional region disposed between the central and peripheral regions; a first plurality of apertures in the central region having a first aspect ratio; a second plurality of apertures in the peripheral region having a second aspect ratio less than the first aspect ratio; and a third plurality of apertures in the transitional region, wherein the third plurality of apertures are cut so the transitional region forms a conical shape surrounding the central region.

    Abstract translation: 本文提供了用于基板处理室的准直器的实施例。 在一些实施例中，准直器包括：具有中心区域，周边区域和设置在中心区域和外围区域之间的过渡区域的主体; 所述中心区域中的第一多个孔具有第一纵横比; 所述周边区域中的第二多个孔具有小于所述第一纵横比的第二纵横比; 以及所述过渡区域中的第三多个孔，其中所述第三多个孔被切割，使得所述过渡区域形成围绕所述中心区域的圆锥形状。

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