公开(公告)号：US20200087790A1

公开(公告)日：2020-03-19

申请号：US16570317

申请日：2019-09-13

Applicant: APPLIED MATERIALS, INC.

Inventor： ALEXANDER LERNER ,  PRASHANTH KOTHNUR ,  ROEY SHAVIV ,  SATISH RADHAKRISHNAN

IPC: C23C16/455

Abstract: Embodiments of apparatus for supplying vaporized reactants to a reaction chamber are described herein. In some embodiments, a showerhead assembly for depositing multiple materials on a substrate includes a plurality of gas delivery portions, each gas delivery portion having an inlet, a wedge shaped body that defines a plenum, and a plurality of openings disposed on a bottom surface of the gas delivery portion, wherein each of the plenums are fluidly isolated from each other.

公开(公告)号：US20220351988A1

公开(公告)日：2022-11-03

申请号：US17867589

申请日：2022-07-18

Applicant: APPLIED MATERIALS, INC.

Inventor： ALEXANDER LERNER ,  ROEY SHAVIV ,  PHILLIP STOUT ,  JOSEPH M. RANISH ,  PRASHANTH KOTHNUR ,  SATISH RADHAKRISHNAN

IPC: H01L21/67 ,  C23C16/455 ,  C23C16/448 ,  C23C16/44

Abstract: Methods and apparatus for controlling a flow of process material to a deposition chamber. In embodiments, the apparatus includes a deposition chamber in fluid communication with one or more sublimators through one or more delivery lines, wherein the one or more sublimators each include an ampoule in fluid communication with the one or more delivery lines through an opening, and at least a first heat source and a second heat source, wherein the first heat source is a radiant heat source adjacent the ampoule and the second heat source is adjacent the opening, wherein the one or more delivery lines include one or more conduits between the deposition chamber and the one or more sublimators, and wherein the one or more conduits include one or more valves to open or close the one or more conduits, wherein the one or more valves in an open position prevents the flow of process material into the deposition chamber, and wherein the one or more valves in a closed position directs the flow of process material into the deposition chamber.

公开(公告)号：US20200048767A1

公开(公告)日：2020-02-13

申请号：US16533357

申请日：2019-08-06

Applicant: APPLIED MATERIALS, INC.

Inventor： PRASHANTH KOTHNUR ,  SATISH RADHAKRISHNAN ,  ALEXANDER LERNER ,  SERGEI KLIMOVICH ,  ROEY SHAVIV

IPC: C23C16/455 ,  B05B1/20 ,  B05B1/18

Abstract: Embodiments of a showerhead are described herein. In some embodiments, a showerhead assembly includes: a first gas delivery portion having a first body, a first inlet, and a plurality of first tubes extending from the first body and defining a first plenum, wherein each tube of the plurality of first tubes includes a plurality of first holes; and a second gas delivery portion having a second body, a second inlet, and a plurality of second tubes extending from the second body and defining a second plenum fluidly independent from the first plenum, wherein each tube of the plurality of second tubes includes a plurality of second holes, and wherein the plurality of first tubes are disposed in an alternating pattern with the plurality of second tubes across a width of the showerhead assembly and a heat sink disposed between the plurality of first tubes and the plurality of second tubes.

公开(公告)号：US20230092987A1

公开(公告)日：2023-03-23

申请号：US18072711

申请日：2022-12-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ALEXANDER LERNER ,  PRASHANTH KOTHNUR ,  ROEY SHAVIV ,  SATISH RADHAKRISHNAN

IPC: C23C16/455

Abstract: Embodiments of apparatus for supplying vaporized reactants to a reaction chamber are described herein. In some embodiments, a showerhead assembly for depositing multiple materials on a substrate includes a plurality of gas delivery portions, each gas delivery portion having an inlet, a wedge shaped body that defines a plenum, and a plurality of openings disposed on a bottom surface of the gas delivery portion, wherein each of the plenums are fluidly isolated from each other.

公开(公告)号：US20190382890A1

公开(公告)日：2019-12-19

申请号：US16442527

申请日：2019-06-16

Applicant: APPLIED MATERIALS, INC.

Inventor： ALEXANDER LERNER ,  ROEY SHAVIV ,  PHILLIP STOUT ,  JOSEPH M. RANISH ,  PRASHANTH KOTHNUR ,  SATISH RADHAKRISHNAN

IPC: C23C16/448 ,  H01L21/67 ,  C23C16/455

Abstract: Methods and apparatus for controlling a flow of process material to a deposition chamber. In embodiments, the apparatus includes a deposition chamber in fluid communication with one or more sublimators through one or more delivery lines, wherein the one or more sublimators each include an ampoule in fluid communication with the one or more delivery lines through an opening, and at least a first heat source and a second heat source, wherein the first heat source is a radiant heat source adjacent the ampoule and a second heat source is adjacent the opening, wherein the one or more delivery lines include one or more conduits between the deposition chamber and the one or more sublimators, and wherein the one or more conduits include one or more valves to open or close the one or more conduits, wherein the one or more valves in an open position prevents the flow of process material into the deposition chamber, and wherein the one or more valves in a closed position directs the flow of process material into the deposition chamber.