公开(公告)号：US20170056935A1

公开(公告)日：2017-03-02

申请号：US14839857

申请日：2015-08-28

Applicant: APPLIED MATERIALS, INC.

Inventor： Ramesh GOPALAN ,  Yogita PAREEK ,  Jianqi WANG ,  Sio On LO ,  Kevin A. PAPKE

IPC: B08B3/08 ,  B08B3/10 ,  B08B3/12

CPC classification number: B08B3/102 ,  B08B3/10 ,  B08B3/12 ,  C11D7/08 ,  C11D11/0041 ,  C11D11/0047 ,  C11D11/007

Abstract: Embodiment disclosed herein generally relate to a method for removing aluminum fluoride contamination from semiconductor processing equipment. A method for cleaning semiconductor processing equipment is disclosed herein. The method includes maintaining a container of water at a temperature of between 50 degrees Celsius and 100 degrees Celsius and soaking a semiconductor processing equipment having surface contamination comprising aluminum fluoride in the water, wherein the semiconductor processing equipment is comprised of a material having a solubility directly related to the temperature of the water.

Abstract translation: 本文公开的实施方案一般涉及从半导体加工设备中除去氟化铝污染物的方法。 本文公开了一种用于清洁半导体处理设备的方法。 该方法包括将水容器保持在50摄氏度和100摄氏度之间的温度，并将具有包含氟化铝的表面污染物的半导体加工设备浸入水中，其中半导体加工设备由具有直接溶解度的材料构成 与水的温度有关。

公开(公告)号：US20150079336A1

公开(公告)日：2015-03-19

申请号：US14029108

申请日：2013-09-17

Applicant: Applied Materials, Inc.

Inventor： Jianqi WANG ,  William Ming-ye LU ,  Yukari NISHIMURA ,  Joseph F. SOMMERS ,  Sio On LO ,  Rajan BALESAN

IPC: B05C21/00

CPC classification number: B05C21/005 ,  C23C14/564 ,  C23C16/4404 ,  Y10T428/24165 ,  Y10T428/24479

Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

Abstract translation: 提供了一种处理室部件及其制造方法。 处理室部件以本文所述的方式制造，并且包括在腔室部件的表面上产生至少宏观纹理。 宏观纹理由在腔室部件的表面上以预定方向布置的多个工程特征限定。 在一些实施例中，工程特征防止形成在特征之间限定的视线表面，以增强沉积在腔室部件上的膜的保留。