公开(公告)号：US20140273520A1

公开(公告)日：2014-09-18

申请号：US14182970

申请日：2014-02-18

Applicant: Applied Materials, Inc.

Inventor： Robert CHEBI ,  Alfredo GRANADOS ,  Zhao H. CENG ,  Jianqi WANG ,  Rajan BALESAN

IPC: H01L21/67 ,  H01L21/02

CPC classification number: H01L21/02118 ,  H01J37/321 ,  H01J37/32119 ,  H01J37/32522 ,  H01L21/67109

Abstract: Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of the processing chamber is also provided.

Abstract translation: 本文描述的实施例通常涉及用于减少聚合物在半导体处理室中的沉积的装置和方法。 提供加热器护套和热源，并且可以构造为保持处理室的均匀的温度分布。 还提供了一种维持处理室的电介质天花板的均匀温度分布的方法。

公开(公告)号：US20150079336A1

公开(公告)日：2015-03-19

申请号：US14029108

申请日：2013-09-17

Applicant: Applied Materials, Inc.

Inventor： Jianqi WANG ,  William Ming-ye LU ,  Yukari NISHIMURA ,  Joseph F. SOMMERS ,  Sio On LO ,  Rajan BALESAN

IPC: B05C21/00

CPC classification number: B05C21/005 ,  C23C14/564 ,  C23C16/4404 ,  Y10T428/24165 ,  Y10T428/24479

Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

Abstract translation: 提供了一种处理室部件及其制造方法。 处理室部件以本文所述的方式制造，并且包括在腔室部件的表面上产生至少宏观纹理。 宏观纹理由在腔室部件的表面上以预定方向布置的多个工程特征限定。 在一些实施例中，工程特征防止形成在特征之间限定的视线表面，以增强沉积在腔室部件上的膜的保留。