公开(公告)号：US20170056935A1

公开(公告)日：2017-03-02

申请号：US14839857

申请日：2015-08-28

Applicant: APPLIED MATERIALS, INC.

Inventor： Ramesh GOPALAN ,  Yogita PAREEK ,  Jianqi WANG ,  Sio On LO ,  Kevin A. PAPKE

IPC: B08B3/08 ,  B08B3/10 ,  B08B3/12

CPC classification number: B08B3/102 ,  B08B3/10 ,  B08B3/12 ,  C11D7/08 ,  C11D11/0041 ,  C11D11/0047 ,  C11D11/007

Abstract: Embodiment disclosed herein generally relate to a method for removing aluminum fluoride contamination from semiconductor processing equipment. A method for cleaning semiconductor processing equipment is disclosed herein. The method includes maintaining a container of water at a temperature of between 50 degrees Celsius and 100 degrees Celsius and soaking a semiconductor processing equipment having surface contamination comprising aluminum fluoride in the water, wherein the semiconductor processing equipment is comprised of a material having a solubility directly related to the temperature of the water.

Abstract translation: 本文公开的实施方案一般涉及从半导体加工设备中除去氟化铝污染物的方法。 本文公开了一种用于清洁半导体处理设备的方法。 该方法包括将水容器保持在50摄氏度和100摄氏度之间的温度，并将具有包含氟化铝的表面污染物的半导体加工设备浸入水中，其中半导体加工设备由具有直接溶解度的材料构成 与水的温度有关。

公开(公告)号：US20140273520A1

公开(公告)日：2014-09-18

申请号：US14182970

申请日：2014-02-18

Applicant: Applied Materials, Inc.

Inventor： Robert CHEBI ,  Alfredo GRANADOS ,  Zhao H. CENG ,  Jianqi WANG ,  Rajan BALESAN

IPC: H01L21/67 ,  H01L21/02

CPC classification number: H01L21/02118 ,  H01J37/321 ,  H01J37/32119 ,  H01J37/32522 ,  H01L21/67109

Abstract: Embodiments described herein generally relate to an apparatus and methods for reducing the deposition of polymers in a semiconductor processing chamber. A heater jacket and heat sources are provided and may be configured to maintain a uniform temperature profile of the processing chamber. A method of maintaining a uniform temperature profile of a dielectric ceiling of the processing chamber is also provided.

Abstract translation: 本文描述的实施例通常涉及用于减少聚合物在半导体处理室中的沉积的装置和方法。 提供加热器护套和热源，并且可以构造为保持处理室的均匀的温度分布。 还提供了一种维持处理室的电介质天花板的均匀温度分布的方法。

公开(公告)号：US20240399504A1

公开(公告)日：2024-12-05

申请号：US18203727

申请日：2023-05-31

Applicant: Applied Materials, Inc.

Inventor： Yao-Hung YANG ,  Chih-Yang CHANG ,  Shannon WANG ,  Jianqi WANG

IPC: B23K26/352 ,  B23K26/122 ,  B23K26/70

Abstract: Methods for texturing a surface of a component which include partially submerging the component within a liquid such that a first portion of the component is not submerged in the liquid and a second portion of the component is submerged in the liquid; and contacting at least the first portion of the component with a laser beam at a power and for a period of time sufficient to texture the first portion of the component to a first surface roughness, wherein the second portion of the component is either not textured by the laser beam, or is textured to a lesser degree than the first portion of the component and has a second surface roughness which is less than the first surface roughness.

公开(公告)号：US20170299487A1

公开(公告)日：2017-10-19

申请号：US15487213

申请日：2017-04-13

Applicant: Applied Materials, Inc.

Inventor： Jianqi WANG ,  William Ming-ye LU ,  Yixing LIN ,  Kevin A. PAPKE

IPC: G01N15/02 ,  B08B3/12 ,  G01N15/14

CPC classification number: B08B3/12 ,  G01N1/38 ,  G01N2001/028 ,  G01N2001/383 ,  G01N2015/1486

Abstract: The implementations described herein generally relate to 30 nm in-line liquid particle count testing equipment which analyses and cleans semiconductor processing equipment. More specifically, the implementations described relate to a system for diluting, analyzing, and modifying fluids to enable the observation of the contents of the fluids. A dilution sampling tool is coupled with a liquid particle detector for reading the contents of an extraction solution containing particles from semiconductor processing equipment, such as a liner, a shield, a faceplate, or a showerhead, in a cleaning tank. As such, accurate liquid particle readings may be had which reduce oversaturation of the particle detector.

公开(公告)号：US20200230661A1

公开(公告)日：2020-07-23

申请号：US16735489

申请日：2020-01-06

Applicant: Applied Materials, Inc.

Inventor： Michael J. COUGHLIN ,  Jianqi WANG

IPC: B08B3/12 ,  B08B3/08

Abstract: In some embodiments, a sonic cleaning system includes a tank configured to receive a liquid that enables propagation of sonic waves and a cylindrical insert located within the tank. The cylindrical insert includes a first end having a first opening and a second end opposite the first end. The second end has a second opening. The cylindrical insert is configured suspend a workpiece between the first opening and the second opening. The sonic cleaning system includes a sonic transducer located within the cylindrical insert.

公开(公告)号：US20180105701A1

公开(公告)日：2018-04-19

申请号：US15784058

申请日：2017-10-13

Applicant: Applied Materials, Inc.

Inventor： Mats LARSSON ,  Yogita PAREEK ,  Jianqi WANG ,  Kevin A. PAPKE

IPC: C09D5/08 ,  B05D1/18 ,  C09D1/00 ,  H01L21/67 ,  H01J37/32

CPC classification number: C09D5/08 ,  B05D1/18 ,  C09D1/00 ,  H01J37/32495 ,  H01J2237/334 ,  H01L21/67069 ,  H01L21/6831

Abstract: Embodiments of the disclosure provide a chamber component for use in a plasma processing chamber apparatus. The chamber component may include a coating layer that provides a fluorine-rich surface. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes a body having an outer layer comprising yttria having a coating layer formed thereon, wherein the coating layer comprises a yttrium fluoride containing material.

公开(公告)号：US20180061617A1

公开(公告)日：2018-03-01

申请号：US15663124

申请日：2017-07-28

Applicant: Applied Materials, Inc.

Inventor： Jianqi WANG ,  Yogita PAREEK ,  Julia BAUWIN ,  Kevin A. PAPKE

IPC: H01J37/32 ,  H01L21/67 ,  C23C16/56 ,  C23C16/40

CPC classification number: H01J37/32504 ,  C23C16/40 ,  C23C16/56 ,  H01J37/32477 ,  H01J37/32495 ,  H01J2237/0213 ,  H01J2237/334 ,  H01L21/67069

Abstract: Implementations of the present disclosure provide a chamber component for use in a processing chamber. The chamber component includes a body for use in a plasma processing chamber, a barrier oxide layer formed on at least a portion of an exposed surface of the body, the barrier oxide layer having a density of about 2 gm/cm3 or greater, and an aluminum oxyfluoride layer formed on the barrier oxide layer, the aluminum oxyfluoride layer having a thickness of about 2 nm or greater.

公开(公告)号：US20170307310A1

公开(公告)日：2017-10-26

申请号：US15472691

申请日：2017-03-29

Applicant: Applied Materials, Inc.

Inventor： Jianqi WANG ,  Joung Woo LEE ,  Gia PHAM ,  Alex GERRARD ,  Robert C. MCINTOSH

IPC: F28F19/00 ,  H01L21/67 ,  F28F23/00

CPC classification number: F28F19/00 ,  C09K5/10 ,  F28F23/00 ,  H01L21/67098 ,  H01L21/67109 ,  H01L21/67253

Abstract: Implementations described herein generally relate to substrate processing equipment and more particularly to methods and compositions for temperature control of substrate processing equipment. In one implementation, a method of cooling a processing chamber component is provided. The method comprises introducing an inert purge gas into a supply reservoir containing a coolant and flowing the treated coolant to a processing chamber component to cool the processing chamber component. The coolant initially comprises deionized water and a water-soluble base.

公开(公告)号：US20150079336A1

公开(公告)日：2015-03-19

申请号：US14029108

申请日：2013-09-17

Applicant: Applied Materials, Inc.

Inventor： Jianqi WANG ,  William Ming-ye LU ,  Yukari NISHIMURA ,  Joseph F. SOMMERS ,  Sio On LO ,  Rajan BALESAN

IPC: B05C21/00

CPC classification number: B05C21/005 ,  C23C14/564 ,  C23C16/4404 ,  Y10T428/24165 ,  Y10T428/24479

Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

Abstract translation: 提供了一种处理室部件及其制造方法。 处理室部件以本文所述的方式制造，并且包括在腔室部件的表面上产生至少宏观纹理。 宏观纹理由在腔室部件的表面上以预定方向布置的多个工程特征限定。 在一些实施例中，工程特征防止形成在特征之间限定的视线表面，以增强沉积在腔室部件上的膜的保留。