公开(公告)号：US20150346610A1

公开(公告)日：2015-12-03

申请号：US14706780

申请日：2015-05-07

Applicant: Applied Materials Israel, Ltd.

Inventor： Aviram Tam ,  Lei Zhong

IPC: G03F7/20

CPC classification number: G03F7/70666 ,  G03F1/84 ,  G03F7/70558 ,  G03F7/70641

Abstract: An analysis system that includes a processor and an memory module; wherein the memory module is arranged to store aerial images of an area of a mask, each aerial image corresponds to focus value out of a set of different focus values; wherein the processor is arranged to find weak points by processing the aerial images using different printability thresholds; and wherein the processor is arranged to determine focus and exposure values for generating a Process Window Qualification (PWQ) wafer to be manufactured using the mask in response to focus and exposure values associated with the weak points.

Abstract translation: 包括处理器和存储器模块的分析系统; 其中所述存储器模块被布置成存储掩模区域的空间图像，每个空间图像对应于一组不同焦点值中的焦点值; 其中所述处理器被布置为通过使用不同的可打印性阈值处理所述空间图像来发现弱点; 并且其中所述处理器被布置为确定用于响应于与所述弱点相关联的焦点和曝光值，使用所述掩模来生成要制造的过程窗口鉴定（PWQ）晶片的焦点和曝光值。

公开(公告)号：US09678442B2

公开(公告)日：2017-06-13

申请号：US14706780

申请日：2015-05-07

Applicant: Applied Materials Israel, Ltd.

Inventor： Aviram Tam ,  Lei Zhong

IPC: G03F7/20 ,  G03F1/84

CPC classification number: G03F7/70666 ,  G03F1/84 ,  G03F7/70558 ,  G03F7/70641

Abstract: An analysis system that includes a processor and an memory module; wherein the memory module is arranged to store aerial images of an area of a mask, each aerial image corresponds to focus value out of a set of different focus values; wherein the processor is arranged to find weak points by processing the aerial images using different printability thresholds; and wherein the processor is arranged to determine focus and exposure values for generating a Process Window Qualification (PWQ) wafer to be manufactured using the mask in response to focus and exposure values associated with the weak points.

公开(公告)号：US09805909B1

公开(公告)日：2017-10-31

申请号：US15271105

申请日：2016-09-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Dror Shemesh ,  Lei Zhong

IPC: G01N23/22 ,  H01J37/244 ,  G01N23/225

CPC classification number: H01J37/244 ,  G01N23/203 ,  G01N23/2252 ,  G01N2223/053 ,  G01N2223/079 ,  G01N2223/102 ,  H01J2237/2445 ,  H01J2237/24592

Abstract: An inspection system that includes charged particle optics that irradiate a bottom of a hole with a charged particle beam propagated along an optical axis, an energy dispersive x-ray detector and a processor. The x-ray detector detects x-ray photons emitted from the bottom of the hole and generates detection signals indicative of the x-ray photons. The processor processes the detection signals to provide an estimate of the bottom of the hole.