公开(公告)号：US09678442B2

公开(公告)日：2017-06-13

申请号：US14706780

申请日：2015-05-07

Applicant: Applied Materials Israel, Ltd.

Inventor： Aviram Tam ,  Lei Zhong

IPC: G03F7/20 ,  G03F1/84

CPC classification number: G03F7/70666 ,  G03F1/84 ,  G03F7/70558 ,  G03F7/70641

Abstract: An analysis system that includes a processor and an memory module; wherein the memory module is arranged to store aerial images of an area of a mask, each aerial image corresponds to focus value out of a set of different focus values; wherein the processor is arranged to find weak points by processing the aerial images using different printability thresholds; and wherein the processor is arranged to determine focus and exposure values for generating a Process Window Qualification (PWQ) wafer to be manufactured using the mask in response to focus and exposure values associated with the weak points.

公开(公告)号：US09299135B2

公开(公告)日：2016-03-29

申请号：US13795584

申请日：2013-03-12

Applicant: APPLIED MATERIALS ISRAEL, LTD.

Inventor： Aviram Tam ,  Michael Ben-Yishai ,  Yaron Cohen

IPC: G06K9/00 ,  G06T7/00 ,  G03F1/84

CPC classification number: G06T7/0004 ,  G03F1/84 ,  G06T7/0002 ,  G06T2207/30108 ,  G06T2207/30148 ,  G06T2207/30164

Abstract: An inspection system, and a computer program product that stores instructions for: obtaining an aerial image of an area of the mask; wherein the aerial image represents an expected image to be formed on a photoresist of an object during a lithography process that involves illuminating the area of the mask, by a lithography tool; wherein the photoresist has a printability threshold; wherein the lithography process exhibits a process window that introduces allowable changes at pixels of the expected image that do not exceed an intensity threshold; and searching for at least one weak point at the area of the mask, which is either a local extremum point of the aerial image spaced apart from the printability threshold by a distance that does not exceed the intensity threshold or a crossing point of the printability threshold and being of a slope that is below a predefined threshold.

Abstract translation: 一种检查系统和一种计算机程序产品，其存储用于获得面罩区域的空中图像的指令; 其中所述空间图像表示在通过光刻工具照射所述掩模的区域的光刻工艺期间在物体的光致抗蚀剂上形成的预期图像; 其中所述光致抗蚀剂具有可印刷性阈值; 其中所述光刻工艺表现出在所述预期图像的不超过强度阈值的像素处引入允许变化的处理窗口; 并且在掩模的区域处搜索至少一个弱点，该区域是空间图像的与可印刷性阈值间隔距离不超过强度阈值的距离或可印刷性阈值的交叉点的区域极值点 并且处于低于预定阈值的斜率。

公开(公告)号：US20150346610A1

公开(公告)日：2015-12-03

申请号：US14706780

申请日：2015-05-07

Applicant: Applied Materials Israel, Ltd.

Inventor： Aviram Tam ,  Lei Zhong

IPC: G03F7/20

CPC classification number: G03F7/70666 ,  G03F1/84 ,  G03F7/70558 ,  G03F7/70641

Abstract: An analysis system that includes a processor and an memory module; wherein the memory module is arranged to store aerial images of an area of a mask, each aerial image corresponds to focus value out of a set of different focus values; wherein the processor is arranged to find weak points by processing the aerial images using different printability thresholds; and wherein the processor is arranged to determine focus and exposure values for generating a Process Window Qualification (PWQ) wafer to be manufactured using the mask in response to focus and exposure values associated with the weak points.

Abstract translation: 包括处理器和存储器模块的分析系统; 其中所述存储器模块被布置成存储掩模区域的空间图像，每个空间图像对应于一组不同焦点值中的焦点值; 其中所述处理器被布置为通过使用不同的可打印性阈值处理所述空间图像来发现弱点; 并且其中所述处理器被布置为确定用于响应于与所述弱点相关联的焦点和曝光值，使用所述掩模来生成要制造的过程窗口鉴定（PWQ）晶片的焦点和曝光值。

公开(公告)号：US20140270468A1

公开(公告)日：2014-09-18

申请号：US13795584

申请日：2013-03-12

Applicant: APPLIED MATERIALS ISRAEL, LTD.

Inventor： Aviram Tam ,  Michael Ben-Yishai ,  Yaron Cohen

IPC: G06T7/00

CPC classification number: G06T7/0004 ,  G03F1/84 ,  G06T7/0002 ,  G06T2207/30108 ,  G06T2207/30148 ,  G06T2207/30164

Abstract: An inspection system, and a computer program product that stores instructions for: obtaining an aerial image of an area of the mask; wherein the aerial image represents an expected image to be formed on a photoresist of an object during a lithography process that involves illuminating the area of the mask, by a lithography tool; wherein the photoresist has a printability threshold; wherein the lithography process exhibits a process window that introduces allowable changes at pixels of the expected image that do not exceed an intensity threshold; and searching for at least one weak point at the area of the mask, each weak point is a local extremum point of the aerial image that is spaced apart from the printability threshold by a distance that does not exceed the intensity threshold or is a crossing point of the printability threshold and being of a slope that is below a predefined threshold.

Abstract translation: 一种检查系统和一种计算机程序产品，其存储用于获得面罩区域的空中图像的指令; 其中所述空间图像表示在通过光刻工具照射所述掩模的区域的光刻工艺期间在物体的光致抗蚀剂上形成的预期图像; 其中所述光致抗蚀剂具有可印刷性阈值; 其中所述光刻工艺表现出在所述预期图像的不超过强度阈值的像素处引入允许变化的处理窗口; 并且在掩模的区域中搜索至少一个弱点，每个弱点是空间图像的局部极值点，其与可印刷性阈值间隔开不超过强度阈值的距离或者是交叉点 的可印刷性阈值并且具有低于预定阈值的斜率。