公开(公告)号：US10000860B1

公开(公告)日：2018-06-19

申请号：US15380771

申请日：2016-12-15

Applicant: APPLIED Materials, Inc.

Inventor： Serdar Aksu ,  Jung Gu Lee ,  Bart Sakry ,  Roey Shaviv

IPC: C25D5/18 ,  C25D3/38 ,  C25D7/12 ,  C25D5/34 ,  C25D5/16 ,  C25D17/00

Abstract: A method of electroplating on a workpiece having at least one sub-30 nm feature includes applying a first electrolyte chemistry to the workpiece, the chemistry including a metal cation solute species having a concentration in the range of about 50 mM to about 250 mM and a suppressor resulting in polarization greater than 0.75 V and reaching 0.75 V of polarization at a rate greater than 0.25 V/s, and applying an electric waveform, wherein the electric waveform includes a period of ramping up of current followed by a period of partial ramping down of current.

公开(公告)号：US20180171502A1

公开(公告)日：2018-06-21

申请号：US15380771

申请日：2016-12-15

Applicant: APPLIED Materials, Inc.

Inventor： Serdar Aksu ,  Jung Gu Lee ,  Bart Sakry ,  Roey Shaviv

IPC: C25D5/18 ,  C25D5/34 ,  C25D5/16

CPC classification number: C25D5/18 ,  C25D3/38 ,  C25D5/16 ,  C25D5/34 ,  C25D7/12 ,  C25D17/001

Abstract: A method of electroplating on a workpiece having at least one sub-30 nm feature includes applying a first electrolyte chemistry to the workpiece, the chemistry including a metal cation solute species having a concentration in the range of about 50 mM to about 250 mM and a suppressor resulting in polarization greater than 0.75 V and reaching 0.75 V of polarization at a rate greater than 0.25 V/s, and applying an electric waveform, wherein the electric waveform includes a period of ramping up of current followed by a period of partial ramping down of current.