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公开(公告)号：US12091739B2
公开(公告)日：2024-09-17
申请号：US16973097
申请日：2019-04-23
Applicant: ARCELORMITTAL
Inventor： Eric Silberberg , Sergio Pace , Remy Bonnemann
CPC classification number: C23C14/04 , C23C14/16 , C23C14/24 , C23C14/562
Abstract: A method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber, a coated substrate coated with at least one metal and a vacuum deposition facility for the method for continuously depositing on a running substrate.
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公开(公告)号：US12054821B2
公开(公告)日：2024-08-06
申请号：US16770850
申请日：2018-12-11
Applicant: ArcelorMittal
Inventor： Eric Silberberg , Bruno Schmitz , Sergio Pace , Remy Bonnemann , Didier Marneffe
CPC classification number: C23C14/24 , C23C14/14 , C23C14/562 , C23C14/564
Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:
a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,
a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.-
公开(公告)号：US12139784B2
公开(公告)日：2024-11-12
申请号：US16770872
申请日：2018-12-11
Applicant: ArcelorMittal
Inventor： Eric Silberberg , Bruno Schmitz , Sergio Pace , Remy Bonnemann , Didier Marneffe
Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including: a central casing including a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap including at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.
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公开(公告)号：US11492695B2
公开(公告)日：2022-11-08
申请号：US15734911
申请日：2019-04-23
Applicant: ArcelorMittal
Inventor： Eric Silberberg , Sergio Pace , Remy Bonnemann
Abstract: A Method for continuously depositing, on a running substrate, coatings formed from at least one metal inside a vacuum deposition facility including a vacuum chamber; a substrate coated with at least one metal on both sides of the substrate having an average thickness, wherein the coating is deposited homogenously such that the maximum thickness of the coating can exceed the average thickness of 15% maximum. A vacuum deposition facility also is provided.
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