Vacuum deposition facility and method for coating a substrate with transverse repartition chamber

    公开(公告)号:US12129542B2

    公开(公告)日:2024-10-29

    申请号:US16972176

    申请日:2019-06-11

    Applicant: ArcelorMittal

    CPC classification number: C23C14/562 C23C14/243

    Abstract: A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the substrate S run through along a given path P and a vapor jet coater 3 linking the evaporation pipe to the deposition chamber, wherein the vapor jet coater further includes a repartition chamber 31 including at least one reheater 33 positioned within the repartition chamber and a vapor outlet orifice 32 including a base opening linking the vapor outlet orifice to the repartition chamber, a top opening through which the vapor can exit in the deposition chamber and two sides converging toward each other in the direction of the top opening.

    Vacuum deposition facility and method for coating a substrate

    公开(公告)号:US12054821B2

    公开(公告)日:2024-08-06

    申请号:US16770850

    申请日:2018-12-11

    Applicant: ArcelorMittal

    CPC classification number: C23C14/24 C23C14/14 C23C14/562 C23C14/564

    Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:



    a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,
    a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.

    Apparatus and method for vacuum deposition

    公开(公告)号:US11319626B2

    公开(公告)日:2022-05-03

    申请号:US16318563

    申请日:2017-07-27

    Applicant: ArcelorMittal

    Abstract: A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.

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