摘要:
The present invention relates to a process for the perpendicular orientation of nanodomains of block copolymers on a substrate by using a sublayer of random or gradient copolymers whose monomers differ at least in part from those present, respectively, in each of the blocks of the block copolymer.
摘要:
The invention relates to a process for producing a film of self-assembled block copolymers on a substrate, said process consisting in carrying out a simultaneous deposition of block copolymer and of random copolymer by means of a solution containing a blend of block copolymer and of random copolymer of different chemical nature and which are immiscible, then in carrying out an annealing treatment allowing the promotion of the phase segregation inherent in the self-assembly of block copolymers.