摘要:
A wavelength-selective transmissive glass has a light transmittance Tmore than 315 nm and 400 nm or less at a wavelength of more than 315 nm and 400 nm or less represented by the formula shown below of 1% or more in terms of a plate thickness of 6 mm and a light transmittance T315 nm or less at a wavelength of 315 nm or less represented by the formula shown below of 60% or less in terms of a plate thickness of 6 mm. Ak is a weighting factor at a wavelength k (nm) for calculating T (light transmittance) defined in ISO-9050:2003, and Tk is a transmittance at the wavelength k (nm) in terms of a plate thickness of 6 mm: Tmore than 315 nm and 400 nm or less=(Σk=more than 315400 Ak×Tk)/(Σk=more than 315400 Ak) T315 nm or less=(Σk=300315 Ak×Tk)/(Σk=300315 Ak).
摘要:
The present invention provides a glass substrate having high glass transition temperature and small compaction (C) in a heat treatment at a low temperature (150 to 300° C.), the glass substrate including SiO2, Al2O3, B2O3, MgO, CaO, SrO, BaO, ZrO2, Na2O, K2O, and Li2O, wherein each amount of these compounds is specifically limited, Al2O3+K2O is 7 to 27 mass %, Na2O+K2O is 11.5 to 22 mass %, MgO+CaO+SrO+BaO is 0.2 to 14 mass %, MgO+0.357Al2O3−0.239K2O−5.58 is −3.0 to 1.5, Na2O+0.272Al2O3+0.876K2O−16.77 is −2.5 to 2.5, a glass transition temperature is 500° C. or higher, and an average thermal expansion coefficient at 50 to 350° C. is 100×10−7/° C. or less.
摘要:
The present invention relates to an alkali-free glass having a strain point of 725° C. or higher, an average thermal expansion coefficient at from 50 to 300° C. of from 30×10−7 to 40×107/° C., a temperature T2 at which a glass viscosity is 102 dPa·s of 1,710° C. or lower, and a temperature T4 at which a glass viscosity is 104 dPa·s of 1,320° C. or lower, the alkali-free glass including, in terms of mol % on the basis of oxides, SiO2: 66 to 70, Al2O3: 12 to 15, B2O3: 0 to 1.5, MgO: more than 9.5 and 13 or less, CaO: 4 to 9, SrO: 0.5 to 4.5, BaO: 0 to 1, and ZrO2: 0 to 2, in which MgO+CaO+SrO+BaO is from 17 to 21, MgO/(MgO+CaO+SrO+BaO) is 0.4 or more, MgO/(MgO+CaO) is 0.4 or more, MgO/(MgO+SrO) is 0.6 or more, and the alkali-free glass does not substantially contain an alkali metal oxide.
摘要:
The present invention relates to a non-alkali glass substrate, having a strain point of 685° C. or higher and 750° C. or lower, an average thermal expansion coefficient at 50 to 350° C. of from 35×10−7 to 43×10−7/° C., a specific gravity of from 2.50 to 2.80, a photoelastic constant of 25 nm/MPa/cm or more and less than 29 nm/MPa/cm, and a temperature (T4) at which viscosity reaches 104 dPa·s of 1,250° C. or higher and lower than 1,350° C., and having a prescribed composition.
摘要:
The present invention relates to a non-alkali glass having a strain point of from 710° C. to lower than 725° C., an average thermal expansion coefficient at from 50 to 300° C. of from 30×107 to 43×10−7/° C., a temperature T2 at which glass viscosity reaches 102dPa.s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPd.s of 1320° C. or lower, and containing, indicated by mol % on the basis of oxides, SiO2 66 to 70, Al2O3 12 to 14, B2O3 exceeding 0 to 1.5, MgO exceeding 9.5 to 13 (or 5 to 9.5), CaO 4 to 9 (or 4 to 11), SrO 0.5 to 4.5, BaO 0 to 0.5 and ZrO 0 to 2.
摘要翻译:本发明涉及应变点为710℃以上且低于725℃,50〜300℃的平均热膨胀系数为30×107〜43×10的非碱玻璃 -7℃,玻璃粘度达到102dPa.s为1710℃以下的温度T2,玻璃粘度达到104dPd.s的温度T4为1320℃以下, 基于氧化物的摩尔%表示,SiO 2 66〜70,Al 2 O 3 12〜14,B 2 O 3超过0〜1.5,MgO超过9.5〜13(或5〜9.5),CaO 4〜9(或4〜11),SrO 0.5〜4.5,BaO 0〜0.5,ZrO 0〜2。
摘要:
To provide a glass plate which is hardly broken and which has a high infrared transmittance.A glass plate, which has a thickness of from 1 to 8 mm, has an infrared transmittance T3000 at a wavelength of 3,000 nm of at least 4%, an average thermal expansion coefficient a at from 50 to 350° C. of from 15 to 35×10−7/° C., and a glass composition comprising, as represented by mol% based on oxides, from 50 to 85% of SiO2, from 0.1 to 25% of Al2O3, from 0.1 to 20% of B2O3, from 0 to 20% in total of at least one member selected from MgO, CaO, SrO, BaO and ZnO, and from 0 to 20% in total of at least one member selected from Li2O, Na2O and K2O.
摘要:
The present invention relates to an alkali-free glass having a strain point of 680 to 735° C., an average thermal expansion coefficient at from 50 to 350° C. of from 30×10−7 to 43×10−7/° C., a temperature T2 at which glass viscosity reaches 102 dPa.s of 1,710° C. or lower, and a temperature T4 at which the glass viscosity reaches 104 dPa.s of 1,310° C. or lower, and containing, indicated by mol % on the basis of oxides, SiO2 63 to 74, Al2O3 11.5 to 16, B2O3 exceeding 1.5 to 5, MgO 5.5 to 13, CaO 1.5 to 12, SrO 1.5 to 9, BaO 0 to 1, and ZrO2 0 to 2, in which MgO+CaO+SrO+BaO is from 15.5 to 21, MgO/(MgO+CaO+SrO+BaO) is 0.35 or more, CaO/(MgO+CaO+SrO+BaO) is 0.50 or less, and SrO/(MgO+CaO+SrO+BaO) is 0.50 or less.
摘要翻译:本发明涉及应变点为680〜735℃,50〜350℃的平均热膨胀系数为30×10 -7〜43×10 -7 /°的无碱玻璃 玻璃粘度达到102dPa.s为1710℃或更低的温度T2,玻璃粘度达到104dPa.s为1310℃或更低的温度T4,并且含有 基于氧化物的摩尔%,SiO 2 63〜74,Al 2 O 3 11.5〜16,B 2 O 3超过1.5〜5,MgO 5.5〜13,CaO 1.5〜12,SrO 1.5〜9,BaO 0〜1,ZrO 2 0〜 其中MgO + CaO + SrO + BaO为15.5〜21,MgO /(MgO + CaO + SrO + BaO)为0.35以上,CaO /(MgO + CaO + SrO + BaO)为0.50以下,SrO / (MgO + CaO + SrO + BaO)为0.50以下。
摘要:
A glass substrate contains specific contents of SiO2, Al2O3, B2O3, MgO, CaO, SrO, BaO, ZrO2, Na2O, K2O and Li2O. The glass substrate has a glass transition temperature of 580 to 720° C., an average coefficient of thermal expansion at 50 to 350° C. of 65×10−7 to 85×10−7/° C., a compaction (C) of 15 ppm or less, a glass surface devitrification temperature Tc of 900 to 1,300° C., a glass internal devitrification temperature Td of 900 to 1,300° C., a temperature T4 at which a viscosity reaches 104 dPa·s of 1,100 to 1,350° C., a relationship (T4−Tc) of −50 to 350° C. and a relationship (T4−Td) of −50 to 350° C.
摘要:
The present invention relates to a non-alkali glass having a strain point of from 710° C. to lower than 725° C., an average thermal expansion coefficient at from 50 to 300° C. of from 30×10−7 to 43×10−7/° C., a temperature T2 at which glass viscosity reaches 102 dPa·s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPa·s of 1320° C. or lower, and containing, indicated by mol % on the basis of oxides, SiO2 66 to 70, Al2O3 12 to 14, B2O3 exceeding 0 to 1.5, MgO exceeding 9.5 to 13 (or 5 to 9.5), CaO 4 to 9 (or 4 to 11), SrO 0.5 to 4.5, BaO 0 to 0.5 and ZrO 0 to 2.
摘要翻译:本发明涉及应变点为710℃以上且低于725℃的无碱玻璃,50〜300℃的平均热膨胀系数为30×10 -7〜43 ×10-7 /℃,玻璃粘度达到102dPa·s的温度T2为1710℃以下,玻璃粘度达到104dPa·s的温度T4为1320℃以下, 以氧化物为基准的摩尔%表示,SiO 2 66〜70,Al 2 O 3 12〜14,B 2 O 3超过0〜1.5,MgO超过9.5〜13(或5〜9.5),CaO 4〜9(或4〜11) ),SrO 0.5〜4.5,BaO 0〜0.5,ZrO 0〜2。
摘要:
The present invention relates to an alkali-free glass substrate with a thickness of 0.4 mm or less, which has been reduced in thickness by 5 μm or more by a hydrofluoric acid (HF) etching treatment, in which the alkali-free glass substrate contains an alkali-free glass described below, and the alkali-free glass substrate after reduced in thickness has a specific modulus of 32 MNm/kg or more and a photoelastic constant of 31 nm/MPa/cm or less, the alkali-free glass having a strain point of 710° C. or higher, an average thermal expansion coefficient at 50 to 350° C. of from 30×10−7to 43×10−7/° C., a temperature T2 at which a glass viscosity reaches 102 dPa·s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPa·s of 1320° C. or lower.