公开(公告)号：US20010035361A1

公开(公告)日：2001-11-01

申请号：US09795480

申请日：2001-03-01

Applicant: Asahi Glass Company, Limited

Inventor： Hitoshi Mishiro ,  Shinya Kikugawa ,  Yoshiaki Ikuta

IPC: B65D085/38 ,  B65D085/48 ,  G03F009/00 ,  G02B027/46

CPC classification number: B65D25/14 ,  B65D25/107 ,  B65D43/164 ,  B65D85/38 ,  B65D2543/00194 ,  B65D2543/0099

Abstract: A container for accommodating an optical article made of synthetic quartz glass includes synthetic resin as a base material, and a coating film provided on a substantially entire area of at least an inner surface thereof, the coating film being substantially impermeable to a gas evolved from the synthetic resin as the basic material of the container.

Abstract translation: 用于容纳由合成石英玻璃制成的光学制品的容器包括合成树脂作为基材，以及设置在其至少内表面的大致整个区域上的涂膜，所述涂膜基本上不可透过从 合成树脂作为容器的基本材料。

公开(公告)号：US20030214704A1

公开(公告)日：2003-11-20

申请号：US10456688

申请日：2003-06-09

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Satoru Takaki ,  Kaname Okada ,  Shinya Kikugawa

IPC: G02B005/08

CPC classification number: G03F1/62 ,  G02B1/11 ,  G02B1/115 ,  G03F1/46 ,  G03F1/50 ,  G03F7/70958 ,  G03F7/70983

Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength null0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate

Abstract translation: 一种防反射基板，包括在155nm至200nm的波长范围内对紫外线和真空紫外线透明的基板和形成在基板的至少一侧上的单层，双层或三层抗反射膜，其中， 需要抗反射的紫外线或真空紫外线的波长区域的中心波长λ0处的防反射膜的折射率和物理厚度满足特定条件，以及用于半导体制造装置的光学部件和低反射防护薄膜的基板 这是紫外线和真空紫外线防反射基板

公开(公告)号：US20030095245A1

公开(公告)日：2003-05-22

申请号：US10299705

申请日：2002-11-20

Applicant: Asahi Glass Company, Limited

Inventor： Hitoshi Mishiro ,  Shinya Kikugawa ,  Kaname Okada ,  Takayuki Kawahara ,  Morio Terakado

IPC: G03B027/62

CPC classification number: G03F1/64 ,  G03F7/70983

Abstract: A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.

Abstract translation: 一种用于将防护薄膜组件附接到光掩模的结构，所述防护薄膜组件包括防护薄膜组件框架和附着到形成在所述防护薄膜框架中的开口部分的防护薄膜组件，其中所述防护薄膜组件框架表面中的与所述光掩模接触的部分具有 直接接触光罩而不插入胶粘剂。

公开(公告)号：US20030051507A1

公开(公告)日：2003-03-20

申请号：US10283055

申请日：2002-10-30

Applicant: Asahi Glass Company, Limited

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Akio Masui ,  Noriaki Shimodaira ,  Shuhei Yoshizawa

IPC: C03C015/00

CPC classification number: G03F7/70958 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C23/00 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  Y02P40/57

Abstract: A process for producing a synthetic silica glass optical component which contains at least 1null1017 molecules/cm3 and has an OH concentration of at most 200 ppm and substantially no reduction type defects, by treating a synthetic silica glass having a hydrogen molecule content of less than 1null1017 molecules/cm3 at a temperature of from 300 to 600null C. in a hydrogen gas-containing atmosphere at a pressure of from 2 to 30 atms.

Abstract translation: 通过处理氢分子含量小于1×10 17的合成石英玻璃，制造合成石英玻璃光学组件的方法，该方法含有至少1×10 17分子/ cm 3且具有至多200ppm的OH浓度且基本上没有还原型缺陷 分子/ cm3，温度为300-600℃，在氢气气氛中，压力为2-30atm。

公开(公告)号：US20030195107A1

公开(公告)日：2003-10-16

申请号：US10317068

申请日：2002-12-12

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Noriaki Shimodaira ,  Akio Masui ,  Shuhei Yoshizawa

IPC: C03C010/16 ,  C03C003/112

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cmnull1 (I2250) to the scattering peak intensity of 800 cmnull1 (I800), i.e. I2250/I800, of at most 1null10null4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2null10null3 cmnull1.

Abstract translation: 一种用于光学用的合成石英玻璃，其用于通过在含有氟的紫外线区域至真空紫外线区域的范围内的光照射而使用，该散射峰强度比例为2250cm <上标> -1 >（I <下标> 2250 ）到800 cm <上标> -1>（I <下标> 800 ）的散射峰强度，即I <下标> 2250 / I 在激光拉曼光谱中，最多为1×10 <上标> -4>的<下标> 800 ，其吸光系数为245nm，最多为2×10 <上标> -3> cm -1>。

公开(公告)号：US20030035222A1

公开(公告)日：2003-02-20

申请号：US10206086

申请日：2002-07-29

Applicant: Asahi Glass Company, Limited

Inventor： Kaname Okada ,  Shinya Kikugawa

IPC: G02B013/14 ,  G02B027/14

CPC classification number: G03F1/64

Abstract: A pellicle comprising a box-shaped pellicle frame having top and bottom openings, and a pellicle sheet bonded to the pellicle frame to cover one of the openings of the pellicle frame, wherein the pellicle frame is made of quartz glass, a plurality of vent holes are formed as distributed on opposing side walls of the pellicle frame, and the size of the vent holes in the direction of the height of the pellicle frame is at most null of the height of the pellicle frame.

Abstract translation: 一种防护薄膜组件，包括具有顶部和底部开口的盒形防护薄膜框架，以及防粘膜框架结合到防护薄膜组件框架上以覆盖防护薄膜组件框架中的一个开口的防护薄膜组件框架，其中防护薄膜框架由石英玻璃制成，多个通气孔 被形成为分布在防护薄膜组件框架的相对侧壁上，并且防尘薄膜组件框架的高度方向上的通气孔的尺寸至少为防护薄膜组件框架的高度的3/5。

公开(公告)号：US20030025991A1

公开(公告)日：2003-02-06

申请号：US10138558

申请日：2002-05-06

Applicant: ASAHI GLASS COMPANY LIMITED

Inventor： Satoru Takaki ,  Kaname Okada ,  Shinya Kikugawa

IPC: G02B001/00 ,  G02B005/08 ,  G02B005/20 ,  F21V009/04 ,  F21V009/06 ,  G02B001/10

CPC classification number: G03F1/62 ,  G02B1/11 ,  G02B1/115 ,  G03F1/46 ,  G03F1/50 ,  G03F7/70958 ,  G03F7/70983

Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength null0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate

Abstract translation: 一种防反射基板，包括在155nm至200nm的波长范围内对紫外线和真空紫外线透明的基板和形成在基板的至少一侧上的单层，双层或三层抗反射膜，其中， 需要抗反射的紫外线或真空紫外线的波长区域的中心波长lambd0的抗反射膜的折射率和物理厚度满足特定条件，以及用于半导体制造装置的光学部件和低反射防护薄膜的基板 这是紫外线和真空紫外线防反射基板

公开(公告)号：US20020007907A1

公开(公告)日：2002-01-24

申请号：US09795329

申请日：2001-03-01

Applicant: Asahi Glass Company, Limited

Inventor： Hiroshi Arishima ,  Shinya Kikugawa ,  Hitoshi Mishiro

IPC: B32B031/00

CPC classification number: G03F1/62 ,  G03F1/64 ,  Y10T428/26 ,  Y10T428/265

Abstract: A pellicle formed by bonding a pellicle membrane composed of synthesized glass on a pellicle frame by an adhesive wherein a light shielding member for shielding ultra-violet rays irradiated to the adhesive is provided at a portion where the pellicle membrane is bonded to the pellicle frame, whereby the adhesive for bonding the pellicle membrane to the pellicle frame is prevented from being deteriorated due to the irradiation of ultra-violet rays for cleaning.

Abstract translation: 在防护薄膜组件框架上通过将防护薄膜组件的防护薄膜组合物粘贴在防护薄膜组件框架上的部分上，通过粘合剂将用于遮蔽紫外线的遮光部件粘接在粘合剂上的粘合剂形成的防护薄膜组件， 由此防止了用于将防护薄膜组件粘贴到防护薄膜组件框架上的粘合剂由于紫外线的照射被清洁而劣化。