公开(公告)号：US11851364B2

公开(公告)日：2023-12-26

申请号：US16254191

申请日：2019-01-22

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Junichiro Nishida ,  Kazuo Shirota ,  Hisashi Yagi ,  Masaki Takeuchi

IPC: C03C21/00 ,  C03B23/04 ,  C03B25/02 ,  C03C23/00 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C4/00

CPC classification number: C03C21/007 ,  C03B19/1469 ,  C03B23/04 ,  C03B25/025 ,  C03B32/00 ,  C03C3/06 ,  C03C4/0071 ,  C03C23/002 ,  C03C23/007 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2203/52

Abstract: A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250° C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450° C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400° C. for 5-10 hours.

公开(公告)号：US11719881B2

公开(公告)日：2023-08-08

申请号：US17856415

申请日：2022-07-01

Applicant: NKT Photonics

Inventor： Thomas Tanggaard Alkeskjold ,  Casper Laur Byg ,  Christian Jakobsen ,  Jens Kristian Lyngsøe ,  Kim G. Jespersen ,  Jeppe Johansen ,  Martin Dybendal Maack ,  Martin Erland Vestergaard Pedersen ,  Carsten L. Thomsen

IPC: G02B6/036 ,  C03B37/027 ,  C03B37/10 ,  C03C13/04 ,  C03C25/106 ,  C03C25/1065 ,  C03C25/607 ,  G02B6/02 ,  G02B6/14 ,  G02F1/365 ,  G02F1/35

CPC classification number: G02B6/03694 ,  C03B37/0279 ,  C03B37/02781 ,  C03B37/10 ,  C03C13/045 ,  C03C13/046 ,  C03C25/1061 ,  C03C25/1062 ,  C03C25/1068 ,  C03C25/607 ,  G02B6/02347 ,  G02B6/02357 ,  G02B6/02361 ,  G02B6/02395 ,  G02B6/14 ,  G02F1/365 ,  C03B2201/02 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2203/14 ,  C03B2203/23 ,  C03B2203/42 ,  C03C2201/02 ,  C03C2201/21 ,  C03C2201/22 ,  G02B6/02366 ,  G02F1/3528

Abstract: A Photonic Crystal Fiber (PCF) a method of its production and a supercontinuum light source comprising such PCF. The PCF has a longitudinal axis and includes a core extending along the length of said longitudinal axis and a cladding region surrounding the core. At least the cladding region includes a plurality of microstructures in the form of inclusions extending along the longitudinal axis of the PCF in at least a microstructured length section. In at least a degradation resistant length section of the microstructured length section the PCF includes hydrogen and/or deuterium. In at least the degradation resistant length section the PCF further includes a main coating surrounding the cladding region, which main coating is hermetic for the hydrogen and/or deuterium at a temperature below Th, wherein Th is at least about 50° C., preferably 50° C.

公开(公告)号：US09834468B2

公开(公告)日：2017-12-05

申请号：US14769382

申请日：2014-02-19

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: F21V9/00 ,  G02B5/02 ,  G02C7/10 ,  G02F1/361 ,  G03B11/00 ,  C03C3/06 ,  C03B19/14 ,  C03B32/00 ,  G02B1/00 ,  G02B1/02 ,  C03B32/02 ,  C03C4/04 ,  C03C15/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.

公开(公告)号：US20150376049A1

公开(公告)日：2015-12-31

申请号：US14766276

申请日：2014-02-04

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Stephan THOMAS ,  Klaus BECKER ,  Stefan OCHS

IPC: C03C3/06 ,  C03B25/02 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B25/02 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/52 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70958

Abstract: A blank of TiO2—SiO2 glass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc. The TiO2—SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920° C. and 970° C. a dependence expressed as the differential quotient dTzc/dTf of its zero crossing temperature Tzc on the fictive temperature Tf of less than 0.3.

Abstract translation: 用于EUV光刻的用于镜面基板的TiO 2 -SiO 2玻璃的空白对于适应以优化热膨胀系数的进展以及因此也是过零点温度Tzc的进展的需求很低。 TiO 2 -SiO 2玻璃具有在920℃和970℃之间的范围内的假想温度Tf的平均值。表示为其过零点温度Tzc的差分商dTzc / dTf对虚构温度Tf的依赖关系 小于0.3。

公开(公告)号：US20130095255A1

公开(公告)日：2013-04-18

申请号：US13439911

申请日：2012-04-05

Applicant: Raymond Nicholas Vrtis ,  Mark Leonard O'Neill ,  Jean Louise Vincent ,  Aaron Scott Lukas ,  Mary Kathryn Haas

Inventor： Raymond Nicholas Vrtis ,  Mark Leonard O'Neill ,  Jean Louise Vincent ,  Aaron Scott Lukas ,  Mary Kathryn Haas

IPC: B05D1/00

CPC classification number: B05D1/62 ,  C03C3/045 ,  C03C11/00 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/80 ,  C23C16/30 ,  C23C16/401 ,  C23C16/56 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02208 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/02348

Abstract: A chemical vapor deposition method for producing a porous organosilica glass film comprising: introducing into a vacuum chamber gaseous reagents including at least one precursor selected from the group consisting of an organosilane and an organosiloxane, and a porogen that is distinct from the precursor, wherein the porogen is a C4 to C14 cyclic hydrocarbon compound having a non-branching structure and a degree of unsaturation equal to or less than 2; applying energy to the gaseous reagents in the vacuum chamber to induce reaction of the gaseous reagents to deposit a preliminary film on the substrate, wherein the preliminary film contains the porogen; and removing from the preliminary film substantially all of the labile organic material to provide the porous film with pores and a dielectric constant less than 2.6.

Abstract translation: 一种用于生产多孔有机硅玻璃膜的化学气相沉积方法，包括：向真空室中引入包含至少一种选自有机硅烷和有机硅氧烷的前体的气态试剂和与前体不同的致孔剂，其中 致孔剂是具有非支化结构和不饱和度等于或小于2的C 4至C 14环烃化合物; 向真空室中的气态试剂施加能量以诱导气态试剂在衬底上沉积初步膜的反应，其中预备膜含有致孔剂; 并从初步膜上去除基本上所有不稳定的有机材料，以提供具有小于2.6的孔隙和介电常数的多孔膜。

公开(公告)号：US20120213685A1

公开(公告)日：2012-08-23

申请号：US13459624

申请日：2012-04-30

Applicant: Ryusuke MORITA ,  Takuya NAKAGAWA ,  Kei IWATA ,  Masaaki TAKATA

Inventor： Ryusuke MORITA ,  Takuya NAKAGAWA ,  Kei IWATA ,  Masaaki TAKATA

IPC: C01B33/12 ,  C03B20/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  G03F1/50 ,  G03F7/70958 ,  Y02P40/57

Abstract: The present invention relates to an optical member for deep ultraviolet having a wavelength of 250 nm or shorter, containing a synthetic silica glass which does not substantially contain a halogen element, has a maximum OH group content of less than 10 ppm by weight, has contents of ODC (oxygen deficient centers) and E-prime center of each less than 1×1014 cm−3, does not substantially contain SiH and peroxy linkage, and has a fictive temperature of 1,050° C. or lower.

Abstract translation: 本发明涉及一种波长为250nm以下的深紫外线用光学构件，其含有基本上不含卤素元素的合成石英玻璃，其OH基含量的最大值小于10重量ppm，含有 的ODC（缺氧中心）和E-prime中心各自小于1×1014cm-3，基本上不含有SiH和过氧键，并且具有1050℃或更低的假想温度。

公开(公告)号：US08093165B2

公开(公告)日：2012-01-10

申请号：US12869035

申请日：2010-08-26

Applicant: Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa ,  Yuko Tachibana

Inventor： Akio Koike ,  Yasutomi Iwahashi ,  Shinya Kikugawa ,  Yuko Tachibana

IPC: C03C3/06 ,  C03B19/06 ,  C03B37/018 ,  C03B25/00

CPC classification number: C03B19/1453 ,  B82Y10/00 ,  B82Y40/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/076 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  C03C2203/54 ,  G03F1/24 ,  G03F7/70958 ,  Y02P40/57

Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.

Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。

公开(公告)号：US07994083B2

公开(公告)日：2011-08-09

申请号：US11521683

申请日：2006-09-15

Applicant: Brian Lee Harper ,  Kenneth Edward Hrdina ,  John Edward LaSala

Inventor： Brian Lee Harper ,  Kenneth Edward Hrdina ,  John Edward LaSala

IPC: C03C3/06 ,  C03B19/01 ,  C03B19/09 ,  C03B19/06 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  G03F7/708 ,  Y10S501/905

Abstract: Disclosed are methods for hydrogen loading silica glass and silica glass comprising loaded H2. The methods can lead to H2 gradient in the glass material. Alternatively, the method may involve the use of varying H2 partial pressure of H2 in the atmosphere. Both can result in expedited hydrogen loading process.

Abstract translation: 公开了负载二氧化硅玻璃和含有负载H2的石英玻璃的氢的方法。 这些方法可能导致玻璃材料中的H2梯度。 或者，该方法可以涉及在大气中使用H 2的变化的H 2分压。 两者都可以产生加速氢气加载过程。

公开(公告)号：US07964522B2

公开(公告)日：2011-06-21

申请号：US11891984

申请日：2007-08-14

Applicant: Lisa Anne Moore ,  Charlene Marie Smith

Inventor： Lisa Anne Moore ,  Charlene Marie Smith

IPC: C03C3/06 ,  C03C3/112 ,  C03B19/06 ,  C03B15/00 ,  C03B32/00 ,  C03B17/00

CPC classification number: C03B19/1461 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/061 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/40 ,  C03C2201/50 ,  Y02P40/57

Abstract: An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiments of the present invention has low polarization-induced birefringence, low LIWFD and low induced absorption at 193 nm.

Abstract translation: F掺杂石英玻璃，制造玻璃的方法，包括玻璃的光学构件和包括这种光学构件的光学系统。 玻璃材料包含0.1-5000ppm重量的氟。 根据本发明的某些实施方案的玻璃材料在193nm处具有低偏振诱发双折射，低LIWFD和低诱导吸收。

公开(公告)号：US07928026B2

公开(公告)日：2011-04-19

申请号：US11261005

申请日：2005-10-28

Applicant: Dana Craig Bookbinder ,  Kenneth Edward Hrdina ,  Glenn Eric Kohnke ,  Lisa Anne Moore ,  Susan Lee Schiefelbein ,  Charlene Marie Smith ,  Ulrich W H Neukirch

Inventor： Dana Craig Bookbinder ,  Kenneth Edward Hrdina ,  Glenn Eric Kohnke ,  Lisa Anne Moore ,  Susan Lee Schiefelbein ,  Charlene Marie Smith ,  Ulrich W H Neukirch

IPC: C03C3/06 ,  C03B32/00 ,  C03B15/00 ,  C03B17/00 ,  C03B19/00 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/54

Abstract: Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably exhibit low level of LIWFD, [SiH*] and/or [ODC].

Abstract translation: 在本申请中公开了具有低注射度依赖性透射率，特别是约193nm的合成二氧化硅玻璃及其制造方法。 当在约248nm激活时，该玻璃可期望地在290和390nm处表现出低水平的荧光。 玻璃可能期望显示低水平的LIWFD，[SiH *]和/或[ODC]。