公开(公告)号：US20230080970A1

公开(公告)日：2023-03-16

申请号：US17942277

申请日：2022-09-12

Applicant: ASM IP Holding B.V.

Inventor： YongJin Jeong ,  Juill Lee ,  DaeYoun Kim ,  HeeBum Chae

IPC: H01L21/68 ,  H01L21/67 ,  H01L21/687

Abstract: A substrate processing apparatus capable of solving a misalignment problem of chamber portions due to thermal deformation or a vacuum force during high-temperature processing includes a first plate; a second plate on the first plate; a position control unit configured to change a relative position of the second plate with respect to the first plate; and a support unit configured to permit movement of the second plate while supporting the second plate.

公开(公告)号：US20240377145A1

公开(公告)日：2024-11-14

申请号：US18654213

申请日：2024-05-03

Applicant: ASM IP Holding B.V.

Inventor： SungBae Kim ,  KwangMan Ko ,  Juill Lee

IPC: F28F3/12 ,  H01L21/67

Abstract: Disclosed is a heat shielding device which shields heat from a chamber wall to the outside by creating one or more gas insulating layers around a chamber heated to a high temperature, thereby reducing heat loss, power consumed when heating the chamber to a certain temperature, minimizing the effect of heat to another chamber and reducing safety problems such as burning of an operator.