MULTIPLE OBJECTIVES METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

    公开(公告)号:US20240012338A1

    公开(公告)日:2024-01-11

    申请号:US18253747

    申请日:2021-11-16

    CPC classification number: G03F7/70625 G03F9/7069 G03F7/706849

    Abstract: A metrology or inspection system, a lithographic apparatus, and a method are provided. The system includes an illumination system, an optical system, a first optical device, a second optical device, a detector, and a processor. The optical system is configured to split an illumination beam into a first sub-beam and a second sub-beam. The first optical device is configured to receive the first sub beam and direct the first sub-beam towards a first spot on a substrate. The substrate includes one or more target structures. The second optical device is configured to receive the second sub-beam and direct the second sub-beam towards a second spot on the substrate. The first spot is a different location than the second spot. The detector is configured to receive diffracted beams and to generate a detection signal. The processor is configured to determine a property of the one or more target structures.

    POLARIZATION SELECTION METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF

    公开(公告)号:US20230400782A1

    公开(公告)日:2023-12-14

    申请号:US18033530

    申请日:2021-10-14

    CPC classification number: G03F7/706849 G03F7/706845 G03F7/706847

    Abstract: An inspection system, a lithographic apparatus, and a method are provided. The inspection system includes an illumination system, an optical system, a shutter system, an objective system and a detector. The illumination system is configured to generate an illumination beam. The optical system is configured to split the illumination beam into a first sub-beam and a second sub-beam. The shutter system is configured to independently control a transmittance of the first sub-beam and the second subbeam. The objective system is configured to receive the first sub-beam and the second beam from the optical system and direct the first sub-beam and the second sub-beam towards a substrate having a target structure. The detector is configured to receive an image or a diffracted image of the target structure.

    SELF-REFERENCING INTERFEROMETER AND DUAL SELF-REFERENCING INTERFEROMETER DEVICES

    公开(公告)号:US20220221802A1

    公开(公告)日:2022-07-14

    申请号:US17614159

    申请日:2020-05-19

    Abstract: A self-referencing interferometer (SRI) system for an alignment sensor apparatus includes a first prism and a second prism. The first prism has an input surface for an incident beam. The second prism is coupled to the first prism and has an output surface for a recombined beam. The recombined beam includes a first image and a second image rotated by 180 degrees with respect to the first image. The first and second prisms are identical in shape. A dual self-referencing interferometer (DSRI) system for an alignment sensor apparatus includes a first prism assembly having an input surface for a first incident beam and a second incident beam, and a second prism assembly coupled to the first prism assembly and having an output surface for a first recombined beam and a second recombined beam. The first and second prism assemblies are identical in shape.

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