公开(公告)号：US20180067057A1

公开(公告)日：2018-03-08

申请号：US15683473

申请日：2017-08-22

申请人： ASML HOLDING N.V.

发明人： Yevgeniy Konstantinovich SHMAREV ,  Stanislav SMIRNOV

IPC分类号： G01N21/88 ,  G01N21/21 ,  G01N21/95 ,  G03F7/20

摘要： An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.

公开(公告)号：US20190179162A1

公开(公告)日：2019-06-13

申请号：US16217424

申请日：2018-12-12

申请人： ASML Holding N.V.

发明人： Douglas C. CAPPELLI ,  Stanislav SMIRNOV ,  Richard Carl ZIMMERMAN ,  Joshua ADAMS ,  Alexander Kenneth RAUB ,  Yevgeniy Konstantinovich SHMAREV

IPC分类号： G02B27/28 ,  G01N21/47 ,  G03F7/20

摘要： According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.

公开(公告)号：US20220179330A1

公开(公告)日：2022-06-09

申请号：US17438328

申请日：2020-02-28

申请人： ASML Holding N.V.

发明人： Stanislav SMIRNOV

IPC分类号： G03F9/00

摘要： A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence. The beam has a first polarization and a second polarization that is perpendicular to the first polarization. The first reflective element reflects the beam toward a second reflective element at a second angle of incidence causing the beam to impinge on the substrate. The first and second angles of incidence are selected to reduce variations of a ratio of intensities of the first polarization to the second polarization of the beam imparted by a property of a layer of at least one of the first and second reflective elements.

公开(公告)号：US20200326556A1

公开(公告)日：2020-10-15

申请号：US16913698

申请日：2020-06-26

申请人： ASML Holding N.V.

发明人： Douglas C. CAPPELLI ,  Stanislav SMIRNOV ,  Richard Carl ZIMMERMAN ,  Joshua ADAMS ,  Alexander Kenneth RAUB ,  Yevgeniy Konstantinovich SHMAREV

IPC分类号： G02B27/28 ,  G01N21/47 ,  G03F7/20 ,  G01N21/956

摘要： According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.

公开(公告)号：US20180045657A1

公开(公告)日：2018-02-15

申请号：US15664808

申请日：2017-07-31

申请人： ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

发明人： Stanislav SMIRNOV ,  Johannes Matheus Marie DE WIT ,  Teunis Willem TUKKER ,  Armand Eugene Albert KOOLEN

IPC分类号： G01N21/95 ,  G01N21/47

CPC分类号： G01N21/9515 ,  G01N21/47 ,  G02B21/10 ,  G02B27/0075 ,  G03F7/70616

摘要： An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.

公开(公告)号：US20170191944A1

公开(公告)日：2017-07-06

申请号：US15387610

申请日：2016-12-21

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Yevgeniy Konstantinovich SHMAREV ,  Stanislav SMIRNOV ,  Chien-Hung TSENG ,  Armand Eugene Albert KOOLEN

IPC分类号： G01N21/88 ,  G01N21/95 ,  G03F7/20 ,  G01N21/956

CPC分类号： G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/0638 ,  G03F7/70625 ,  G03F7/70641

摘要： An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.

公开(公告)号：US20160209755A1

公开(公告)日：2016-07-21

申请号：US14970247

申请日：2015-12-15

申请人： ASML Holding N.V.

发明人： Yevgeniy Konstantinovich SHMAREV ,  Stanislav SMIRNOV

IPC分类号： G03F7/20 ,  G02B27/10 ,  G02B5/04 ,  G01N21/47

CPC分类号： G03F7/70133 ,  G01N21/4738 ,  G01N2201/061 ,  G01N2201/06113 ,  G01N2201/068 ,  G02B5/04 ,  G02B27/106 ,  G03F7/70091 ,  G03F7/70191 ,  G03F7/70208

摘要： An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one light source and less than a depth of focus in the pupil plane of the objective optical system.

摘要翻译： 检查装置可以使用光瞳对称器来确定基板上的目标物的精确的OV测量，以减小检查装置对瞳孔平面中的照明束的不对称性和不均匀性的敏感度。 检查装置包括：（1）将照明光束分成子光束形成对称的照明光瞳的照明系统，（2）沿着不同的光分支引导子光束，（3）反转或旋转至少一个 子光束在二维中，并且沿着照明路径重新组合子光束以使强度分布对称化。 该照明系统被进一步配置成使得第一和第二子光束的光程差大于至少一个光源的时间相干长度，并且小于物镜光瞳面中的焦深 系统。