公开(公告)号：US10295916B2

公开(公告)日：2019-05-21

申请号：US15961399

申请日：2018-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Heine Melle Mulder ,  Andrey Sergeevich Tychkov ,  Willem Van Schaik

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

Abstract: Disclosed is a radiation source module and a radiation collector for the module with the radiation collector comprising a substrate coated with at least one reflective layer and a plurality of perforations within the reflective layer, with the plurality of holes forming vertices of a grid substantially covering the surface, and wherein the coating may comprise multiple layers.

公开(公告)号：US12007693B2

公开(公告)日：2024-06-11

申请号：US17600763

申请日：2020-04-03

Applicant: ASML Netherlands B.V. ,  Trumpf Lasersystems For Semiconductor Manufacturing GmbH

Inventor： Ruud Antonius Catharina Maria Beerens ,  Nico Johannes Antonius Hubertus Boonen ,  Stefan Michael Bruno Bäumer ,  Tolga Mehmet Ergin ,  Andreas Kristian Hopf ,  Derk Jan Wilfred Klunder ,  Martin Anton Lambert ,  Stefan Piehler ,  Manisha Ranjan ,  Frank Bernhard Sperling ,  Andrey Sergeevich Tychkov ,  Jasper Witte ,  Jiayue Yuan

IPC: G03F7/00 ,  H01S3/00 ,  H05G2/00

CPC classification number: G03F7/70033 ,  H01S3/0071 ,  H05G2/008

Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).

公开(公告)号：US11237491B2

公开(公告)日：2022-02-01

申请号：US17048834

申请日：2019-04-10

Applicant: ASML Netherlands B.V.

Inventor： Ramon Mark Hofstra ,  Andrey Sergeevich Tychkov ,  Francois Charles Dominique Deneuville ,  Gerardus Hubertus Petrus Maria Swinkels ,  Petrus Adrianus Theodorus Maria Ruijs

IPC: G03F7/20 ,  G02B27/14

Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.