-
公开(公告)号：US11442369B2
公开(公告)日：2022-09-13
申请号：US16763487
申请日：2018-11-07
发明人： Yang-Shan Huang , Pieter Cornelis Johan De Jager , Rob Reilink , Christiaan Louis Valentin , Jasper Leonardus Johannes Scholten , Antonie Hendrik Verweij , Edwin Van Horne
IPC分类号： G03F7/20
摘要： An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.
-
公开(公告)号：US11262663B2
公开(公告)日：2022-03-01
申请号：US17050240
申请日：2019-03-21
发明人： Peter Michel Silvester Maria Heijmans , Olof Martinus Josephus Fischer , Maarten Hartger Kimman , Edwin Van Horne , Antonie Hendrik Verweij
摘要： The present invention provides a tubular linear actuator, comprising: a tubular coil assembly comprising multiple tubular coils arranged next to each other in longitudinal direction of the tubular linear actuator and concentric with respect to a longitudinal axis of the tubular linear actuator, and a magnet assembly comprising a series of permanent magnets with alternating polarization direction extending in the longitudinal direction, wherein the magnet assembly is at least partially arranged in the coil assembly and movably with respect to the coil assembly, wherein the tubular coils comprise edge windings.
-
公开(公告)号：US11175596B2
公开(公告)日：2021-11-16
申请号：US16633419
申请日：2018-07-18
发明人： Han-Kwang Nienhuys , Ronald Peter Albright , Jacob Brinkert , Yang-Shan Huang , Hendrikus Gijsbertus Schimmel , Antonie Hendrik Verweij
摘要： Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.
-
公开(公告)号：US10656536B2
公开(公告)日：2020-05-19
申请号：US15308598
申请日：2015-04-23
发明人： Martinus Hendrikus Antonius Leenders , Niek Elout De Kruijf , Mircea Dusa , Martijn Houben , Johannes Gerardus Maria Mulder , Thomas Poiesz , Marco Adrianus Peter Van Den Heuvel , Paul Van Dongen , Justin Johannes Hermanus Gerritzen , Antonie Hendrik Verweij , Abraham Alexander Soethoudt
IPC分类号： B25B11/00 , G03F7/20 , H01L21/683
摘要： A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.
-
公开(公告)号：US11898601B2
公开(公告)日：2024-02-13
申请号：US17407778
申请日：2021-08-20
发明人： Siegfried Alexander Tromp , Antonie Hendrik Verweij , Abraham Alexander Soethoudt , Jan Pieter Van De Poel , Mark Constant Johannes Baggen
IPC分类号： F16C32/06 , H01L21/683 , F16C29/02 , G03F7/00 , G03F7/20
CPC分类号： F16C32/0611 , F16C29/025 , F16C32/0607 , G03F7/20 , G03F7/707 , G03F7/708 , H01L21/6831 , H01L21/6833
摘要： A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
-
公开(公告)号：US11098759B2
公开(公告)日：2021-08-24
申请号：US16735131
申请日：2020-01-06
发明人： Siegfried Alexander Tromp , Antonie Hendrik Verweij , Abraham Alexander Soethoudt , Jan Pieter Van De Poel , Mark Constant Johannes Baggen
IPC分类号： H01L21/683 , G03F7/20 , F16C32/06 , F16C29/02
摘要： A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
-
公开(公告)号：US10527092B2
公开(公告)日：2020-01-07
申请号：US15513086
申请日：2015-10-07
发明人： Siegfried Alexander Tromp , Antonie Hendrik Verweij , Abraham Alexander Soethoudt , Jan Pieter Van De Poel , Mark Constant Johannes Baggen
IPC分类号： F16C32/06 , G03F7/20 , F16C29/02 , H01L21/683
摘要： A support table, a method of loading a substrate, a lithographic apparatus and a method of manufacturing a device using a lithographic apparatus are disclosed. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a bottom surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localized build-up of pressure within the recess. The localized build-up of pressure provides a localized gas cushioning effect during the lowering of the substrate.
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.013 秒)
