公开(公告)号：US20180129139A1

公开(公告)日：2018-05-10

申请号：US15808874

申请日：2017-11-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Aiqin JIANG ,  Arie Jeffrey Den Boef ,  Kaustuve Bhattacharyya ,  Hans Van Der Laan ,  Bart Visser ,  Martin Jacobus Johan Jak

IPC: G03F7/20 ,  G05B19/406

CPC classification number: G03F7/70516 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70633 ,  G03F7/70683 ,  G05B19/406 ,  G05B2219/45028 ,  H01L22/12 ,  H01L22/20

Abstract: A method including obtaining a fit of data for overlay of a metrology target for a patterning process as a function of a stack difference parameter of the metrology target; and using, by a hardware computer, a slope of the fit (i) to differentiate a metrology target measurement recipe from another metrology target measurement recipe, or (ii) calculate a corrected value of overlay, or (iii) to indicate that an overlay measurement value obtained using the metrology target should be used, or not be used, to configure or modify an aspect of the patterning process, or (iv) any combination selected from (i)-(iii).