公开(公告)号：US20240061348A1

公开(公告)日：2024-02-22

申请号：US18268847

申请日：2021-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Bram Antonius Gerardus LOMANS ,  Arie Jeffrey DEN BOEF ,  Hans BUTLER

IPC: G03F7/00

CPC classification number: G03F7/706843 ,  G03F7/7085

Abstract: A metrology apparatus for measuring a parameter of interest of a target on a substrate, the metrology apparatus including: m×n detectors, wherein m≥1 and n≥1; a first frame; and (n−1) second frames; and (m−1)×n intermediate frames, wherein each detector is connected to one of the intermediate or first or second frames via a primary positioning assembly; and each intermediate frame is connected to one of the first or second frames via a secondary positioning assembly.

公开(公告)号：US20250004390A1

公开(公告)日：2025-01-02

申请号：US18682038

申请日：2022-07-12

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Johan Maarten VAN DE WIJDEVEN ,  Michaël Johannes Christiaan RONDE ,  Bram Antonius Gerardus LOMANS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

IPC: G03F9/00 ,  G03F7/00

Abstract: The invention provides a method for positioning a sensor over a target on a moveable object, comprising the following steps: a. moving the object to move the target to a desired position, b. moving the sensor in a direction towards a measured momentary position of the target, c. when the sensor is over the target. moving the sensor along with the target to the desired position of the target.

公开(公告)号：US20250044236A1

公开(公告)日：2025-02-06

申请号：US18843138

申请日：2023-02-17

Applicant: ASML Netherlands B.V.

Inventor： Douglas C. CAPPELLI ,  Ferry ZIJP ,  Bram Antonius Gerardus LOMANS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  G02B7/18 ,  G02B7/182

Abstract: An inspection apparatus includes a radiation source, an optical system, and a detector. The radiation source is configured to generate a beam of radiation. The optical system is configured to receive and direct the beam along an optical axis and toward a target so as to produce scattered radiation from the target. The optical system includes a beam displacer. The beam displacer includes two or more reflective surfaces. The beam displacer is configured to receive the beam along the optical axis, perform reflections of the beam so as to displace the optical axis of the beam, move linearly in at least a first dimension to shift the displaced optical axis, and preserve an optical property of the beam such that the optical property is invariant to the linear movement. The detector is configured to receive the scattered radiation and to generate a measurement signal based on the scattered radiation.

公开(公告)号：US20230384694A1

公开(公告)日：2023-11-30

申请号：US18269387

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Abdullah ALIKHAN ,  Tammo UITTERDIJK ,  Johannes Bernardus Charles ENGELEN ,  Daniel KAMIENIECKI ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Thomas POIESZ ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Koos VAN BERKEL ,  Gregory James DIGUIDO ,  Anthony C. SOCCI, JR. ,  Iliya SIGAL ,  Bram Antonius Gerardus LOMANS ,  Michel Ben Isel HABETS

IPC: G03F7/00 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70708 ,  G03F7/7095 ,  G03F7/70783 ,  H01L21/6838 ,  H01L21/68757

Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.

公开(公告)号：US20230064193A1

公开(公告)日：2023-03-02

申请号：US17796641

申请日：2021-01-20

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Patrick WARNAAR ,  Vasco Tomas TENNER ,  Hugo Augustinus Joseph CRAMER ,  Bram Antonius Gerardus LOMANS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Ahmet Burak CUNBUL ,  Alexander Prasetya KONIJNENBERG

IPC: G06T7/00 ,  G01N21/47 ,  G03F7/20 ,  G06T5/00

Abstract: Disclosed is a method of measuring a periodic structure on a substrate with illumination radiation having at least one wavelength, the periodic structure having at least one pitch. The method comprises configuring, based on a ratio of said pitch and said wavelength, one or more of: an illumination aperture profile comprising one or more illumination regions in Fourier space; an orientation of the periodic structure for a measurement; and a detection aperture profile comprising one or more separated detection regions in Fourier space. This configuration is such that: i) diffracted radiation of at least a pair of complementary diffraction orders is captured within the detection aperture profile, and ii) said diffracted radiation fills at least 80% of the one or more separated detection regions. The periodic structure is measured while applying the configured one or more of illumination aperture profile, detection aperture profile and orientation of the periodic structure.